发明公开
EP4024132A1 ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN
有权
基本信息:
- 专利标题： ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN
- 申请号：EP20858884.8 申请日：2020-07-29
- 公开(公告)号：EP4024132A1 公开(公告)日：2022-07-06
- 发明人： TAKADA, Akira , GOTO, Akiyoshi , KOJIMA, Masafumi , USHIYAMA, Aina , SHIRAKAWA, Michihiro , KATO, Keita , OKA, Hironori , FUJITA, Mitsuhiro , SHIRAISHI, Yasuharu
- 申请人： FUJIFILM Corporation
- 申请人地址： JP Tokyo 106-8620 26-30, Nishiazabu 2-chome Minato-ku
- 代理机构： HGF
- 优先权： JP2019155791 20190828
- 国际公布： WO2021039252 20210304
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/038 ; G03F7/039 ; G03F7/20
摘要：
Provided is an actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern having excellent LWR performance. Furthermore, provided are a resin used in the actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern having excellent LWR performance, and a compound which is a monomer of the resin. In addition, provided are a resist film and a pattern forming method, each using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device, using the pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes a resin X including a repeating unit derived from a compound including two or more structural moieties consisting of an anionic moiety and a cationic moiety, and a polymerizable group, in which the compound generates an acid including an acidic moiety derived from the anionic moiety in the two or more structural moieties by irradiation with actinic rays or radiation.