基本信息:
- 专利标题： SYSTEM AND METHOD FOR GAS PHASE DEPOSITION
- 申请号：EP15202296.8 申请日：2015-12-23
- 公开(公告)号：EP3184666B1 公开(公告)日：2018-06-13
- 发明人： IVANOV, Alexey , RICHTER, Johannes
- 申请人： Singulus Technologies AG
- 申请人地址： Hanauer Landstrasse 103 63796 Kahl am Main DE
- 专利权人： Singulus Technologies AG
- 当前专利权人： Singulus Technologies AG
- 当前专利权人地址： Hanauer Landstrasse 103 63796 Kahl am Main DE
- 代理机构： Vossius & Partner Patentanwälte Rechtsanwälte mbB
- 主分类号： C23C16/46
- IPC分类号： C23C16/46 ; C23C16/48
摘要：
System and method for gas phase deposition of at least one material to a substrate having a first and a second surface opposite to the first surface. The system comprises a holding member configured to hold the substrate, a deposition member configured to apply the at least one material to the substrate from at least one direction and a heater located at a distance from the substrate and being configured to apply heat to the substrate from the side of the first surface and from the side of the second surface of the substrate.
公开/授权文献:
- EP3184666A1 SYSTEM AND METHOD FOR GAS PHASE DEPOSITION 公开/授权日：2017-06-28