
基本信息:
- 专利标题: EMI SHIELD FOR HIGH FREQUENCY LAYER TRANSFERRED DEVICES
- 申请号:EP15828974 申请日:2015-07-31
- 公开(公告)号:EP3178108A4 公开(公告)日:2018-07-04
- 发明人: STUBER MICHAEL
- 申请人: QUALCOMM INC
- 专利权人: QUALCOMM INC
- 当前专利权人: QUALCOMM INC
- 优先权: US201414454204 2014-08-07
- 主分类号: H01L21/30
- IPC分类号: H01L21/30 ; H01L21/683 ; H01L21/762 ; H01L21/78 ; H01L23/552 ; H01L23/64 ; H01L23/66 ; H01L25/16
摘要:
Various methods and devices that involve EMI shields for radio frequency layer transferred devices are disclosed. One method comprises forming a radio frequency field effect transistor in an active layer of a semiconductor on insulator wafer. The semiconductor on insulator wafer has a buried insulator side and an active layer side. The method further comprises bonding a second wafer to the active layer side of the semiconductor on insulator wafer. The method further comprises forming a shield layer for the semiconductor device. The shield layer comprises an electrically conductive material. The method further comprises coupling the radio frequency field effect transistor to a circuit comprising a radio frequency component. The method further comprises singulating the radio frequency field effect transistor, radio frequency component, and the shield layer into a die. The shield layer is located between a substrate of the radio frequency component and the radio frequency field effect transistor.
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
--------H01L21/02 | .半导体器件或其部件的制造或处理 |
----------H01L21/027 | ..未在H01L21/18或H01L21/34组中包含的为进一步的光刻工艺在半导体之上制作掩膜 |
------------H01L21/18 | ...器件有由周期表第Ⅳ族元素或含有/不含有杂质的AⅢBⅤ族化合物构成的半导体,如掺杂材料 |
--------------H01L21/30 | ....用H01L21/20至H01L21/26各组不包含的方法或设备处理半导体材料的 |