发明公开
EP1466032A1 VOLATILE COPPER(II) COMPLEXES FOR DEPOSITION OF COPPER FILMS BY ATOMIC LAYER DEPOSITION
审中-公开
基本信息:
- 专利标题： VOLATILE COPPER(II) COMPLEXES FOR DEPOSITION OF COPPER FILMS BY ATOMIC LAYER DEPOSITION
- 专利标题（中）：FOR分离覆铜层VOLATILE铜（II）配合物USING ATOM FILMS的分离
- 申请号：EP03750016.2 申请日：2003-01-21
- 公开(公告)号：EP1466032A1 公开(公告)日：2004-10-13
- 发明人： BRADLEY, Alexander, Zak , THORN, David, Lincoln , THOMPSON, Jeffery, Scott
- 申请人： E.I. du Pont de Nemours and Company
- 申请人地址： 1007 Market Street Wilmington, DE 19898 US
- 专利权人： E.I. du Pont de Nemours and Company
- 当前专利权人： E.I. du Pont de Nemours and Company
- 当前专利权人地址： 1007 Market Street Wilmington, DE 19898 US
- 代理机构： Towler, Philip Dean
- 优先权： US349639P 20020118
- 国际公布： WO2003095701 20031120
- 主分类号： C23C16/18
- IPC分类号： C23C16/18 ; C07F1/08 ; C07C249/02 ; C07C249/16 ; C07C251/78 ; C07C251/16 ; C07C251/12
摘要：
The present invention relates to novel 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an Atomic Layer Deposition process. This invention also provides a process for making amino-imines and novel amino-imines.