基本信息:
- 专利标题： LASER SPECTRAL ENGINEERING FOR LITHOGRAPHIC PROCESS
- 专利标题（中）：LASERSPEKTRALTECHNIK用于光刻工艺
- 申请号：EP02731433 申请日：2002-04-19
- 公开(公告)号：EP1386376A4 公开(公告)日：2006-06-28
- 发明人： KROYAN ARMEN , LALOVIC IVAN , FOMENKOV IGOR , DAS PALASH P , SANDSTROM RICHARD L , ALGOTS JOHN M , AHMED KHURSHID
- 申请人： CYMER INC
- 专利权人： CYMER INC
- 当前专利权人： CYMER INC
- 优先权： US85409701 2001-05-11; US91877301 2001-07-27
- 主分类号： G03F7/207
- IPC分类号： G03F7/207 ; G03F7/20 ; H01L21/027 ; H01S3/036 ; H01S3/038 ; H01S3/04 ; H01S3/041 ; H01S3/08 ; H01S3/097 ; H01S3/0971 ; H01S3/0975 ; H01S3/102 ; H01S3/104 ; H01S3/105 ; H01S3/1055 ; H01S3/11 ; H01S3/13 ; H01S3/134 ; H01S3/137 ; H01S3/139 ; H01S3/22 ; H01S3/223 ; H01S3/225 ; H01S3/10
摘要：
An integrated circuit lithograohy technique (pectral engineering) for bandwidth control of an electric discharge laser. A computer models lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism (104) adjusts the center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks to produce improved pattern resolution in photo resits film. Line narrowing equipment (106) is provided having at least one piezoelectric drive and a fast banwidth detection control system having a time response of less than about 2.0 millisecond. A wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser.