基本信息:
- 专利标题： FOUR KHz GAS DISCHARGE LASER
- 专利标题（中）：四KHZ气体放电激光器
- 申请号：EP01975156.9 申请日：2001-05-23
- 公开(公告)号：EP1339519A2 公开(公告)日：2003-09-03
- 发明人： NEWMAN, Peter, C. , DUFFEY, Thomas, P. , PARTLO, William, N. , SANDSTROM, Richard, L. , MECHER, Paul, C. , JOHNS, David, M. , SAETHRE, Robert, B. , FLEUROV, Vladimir, B. , NESS, Richard, M. , RETTIG, Curtis, L. , SHANNON, Robert, A. , UJAZDOWSKI, Richard, C. , ROKNI, Shahryar , PAN, Xiaojiang, J. , KULGEYKO, Vladimir , SMITH, Scott, T. , ANDERSON, Stuart, L. , ALGOTS, John, M. , SPANGLER, Ronald, L. , Fomenkov, Igor V.
- 申请人： Cymer, Inc.
- 申请人地址： 16750 Via del Campo Court San Diego, CA 92127-1712 US
- 专利权人： Cymer, Inc.
- 当前专利权人： Cymer, Inc.
- 当前专利权人地址： 16750 Via del Campo Court San Diego, CA 92127-1712 US
- 代理机构： Grünecker, Kinkeldey, Stockmair & SchwanhäusserAnwaltssozietät
- 优先权： US597812 20000619; US684629 20001006; US768753 20010123; US771789 20010129; US794782 20010227; US834840 20010413; US854097 20010511
- 国际公布： WO01098012 20011227
- 主分类号： B23H1/00
- IPC分类号： B23H1/00
摘要：
The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.