![Device for applying fluid](/ep/1992/03/18/EP0467118A3/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: Device for applying fluid
- 专利标题(中):涂抹液体的装置
- 申请号:EP91110558.3 申请日:1991-06-26
- 公开(公告)号:EP0467118A3 公开(公告)日:1992-03-18
- 发明人: Bard, Steven L. , Christensen, David N. , Glenning, John J. , Nicoletti, James A. , Urdanick, Mark W.
- 申请人: International Business Machines Corporation
- 申请人地址: Old Orchard Road Armonk, N.Y. 10504 US
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: Old Orchard Road Armonk, N.Y. 10504 US
- 代理机构: Schäfer, Wolfgang, Dipl.-Ing.
- 优先权: US554487 19900719
- 主分类号: B05C3/00
- IPC分类号: B05C3/00 ; B05C3/15 ; C23F1/08
摘要:
A device (10) for applying fluid (e.g., etchant) to a substrate (19) (e.g., thin metallic tape) wherein the device (19) includes a head member (11) having means (13) therein for directing a first fluid (15) (e.g, etchant) at an established first pressure against the substrate (19) and means (23) for directing a second fluid (25) (e.g., air) at an established second pressure equal to or greater than the first pressure (at the location of fluid intersection) and against the substrate (19) in the area proximate the first fluid so as to substantially contain and limit the first fluid (15) to impingement substantially only at the location against which the first fluid (15) is designed to strike. Preferably, two opposing head members (11, 11') are utilized, and these may serve to maintain the substrate (19) therebetween in a suspended state. Both head members (11, 11') are movable relative to each other during fluid application. As stated, the device is particularly suited to function as an etcher, but may also serve other purposes (e.g., coating, cleaning, rinsing, etc.).
摘要(中):
一种用于将流体(例如蚀刻剂)施加到基底(19)(例如,薄金属带)的装置(10),其中该装置(19)包括头部件(11),其中具有用于引导第一流体 在确定的第一压力下对衬底(19)施加第一压力(15)(例如蚀刻剂),以及用于以等于或大于第一压力的建立的第二压力引导第二流体(25)(例如空气)的装置(23) (在流体相交位置处)并抵靠在靠近第一流体的区域中的基底(19),以基本上容纳并限制第一流体(15)基本上仅在第一流体(15)抵靠的位置处撞击, 旨在罢工。 优选地,利用两个相对的头部构件(11,11'),并且这些头部构件可用于将衬底(19)保持在悬置状态。 在流体施加期间,两个头构件(11,11')都可相对于彼此移动。 如上所述,该装置特别适合用作蚀刻机,但也可以用于其他目的(例如,涂覆,清洁,冲洗等)。
公开/授权文献:
- EP0467118B1 Device for applying fluid 公开/授权日:1996-01-03
IPC结构图谱:
B | 作业;运输 |
--B05 | 一般喷射或雾化;对表面涂覆液体或其他流体的一般方法 |
----B05C | 一般对表面涂布液体或其他流体的装置 |
------B05C3/00 | 使工件与大量液体或其他流体在其内部相接触的容器 |