基本信息:
- 专利标题： Laser-based system for the total repair of photomasks
- 专利标题（中）：基于激光的系统，用于全面修复光刻胶
- 申请号：EP85303091 申请日：1985-05-01
- 公开(公告)号：EP0165685A3 公开(公告)日：1988-01-27
- 发明人： Young, Peter L. , Oprysko, Modest M.
- 申请人： GOULD INC.
- 专利权人： GOULD INC.
- 当前专利权人： GOULD INC.
- 优先权： US622368 19840620
- 主分类号： G03F01/00
- IPC分类号： G03F01/00
摘要：
A low power laser-based system for repairing clear and opaque defects in a photomask. The system includes a laser source for providing a beam having a wavelength between 0.40 µm and 2.0 µm. The beam is coupled to a computer controlled scanning device which scans the beam across a defective area of the photomask to repair the defect by thermal deposition of micron-size films on the defect or by laser-induced degradation of a polymer coating the defect. Excess metal is removed from the photomask surface via laser vaporization.