基本信息:
- 专利标题： Photo-assisted CVD
- 专利标题（中）：Photochemische Dampfabscheidung。
- 申请号：EP83302597.6 申请日：1983-05-09
- 公开(公告)号：EP0095275A2 公开(公告)日：1983-11-30
- 发明人： Allred, David , Reyes, Jaime , Walter, Lee , Ovshinsky, Stanford
- 申请人： ENERGY CONVERSION DEVICES, INC.
- 申请人地址： 1675 West Maple Road Troy Michigan 48084 US
- 专利权人： ENERGY CONVERSION DEVICES, INC.
- 当前专利权人： ENERGY CONVERSION DEVICES, INC.
- 当前专利权人地址： 1675 West Maple Road Troy Michigan 48084 US
- 代理机构： Davy, John Raymond
- 优先权： US377738 19820513
- 主分类号： C23C16/48
- IPC分类号： C23C16/48
摘要：
A process and apparatus (10) for depositing a film (22) from a gas involves introducing the gas to a deposition environment containing a substrate (14), heating the substrate (14), and irradiating the gas with radiation having a preselected energy spectrum, such that a film (22) is deposited onto the substrate (14). In a preferred embodiment, the energy spectrum of the radition is below or approximately equal to that required to photochemically decompose the gas. In another embodiment, the gas is irradiated through a transparent member (24) exposed at a first surface (58) thereof to the deposition environment, and a flow of substantially inert gaseous material is passed along the first surface (58) to minimize deposition thereon.
公开/授权文献:
- EP0095275B1 Photo-assisted CVD 公开/授权日：1987-04-08