基本信息:
- 专利标题： Photomask and method of testing it
- 专利标题（中）：照片及其测试方法
- 申请号：EP82302777 申请日：1982-05-28
- 公开(公告)号：EP0066466A3 公开(公告)日：1983-03-09
- 发明人： Kobayashi, Kenichi
- 申请人： FUJITSU LIMITED
- 专利权人： FUJITSU LIMITED
- 当前专利权人： FUJITSU LIMITED
- 优先权： JP8253881 19810601
- 主分类号： G03F01/00
- IPC分类号： G03F01/00
摘要：
A photomask (1) for use in the manufacture of a semiconductor device comprises a pattern (P 1 , P 2 ) to be tested and for use in forming the semiconductor device and an additional synchronisation pattern (S 1 to S 8 ). The synchronisation pattern is used to obtain a synchronisation pulse (E 1 , E z , E s , E 6 ) during scanning of the photomask (1) for synchronising a scanning signal (S 9 ) obtained from the pattern (P 1 , P 2 ) to be tested with a reference signal (S 10 ) based on reference pattern data stored on a magnetic tape (7).