基本信息:
- 专利标题：
- 申请号：DE60121468 申请日：2001-12-21
- 公开(公告)号：DE60121468T2 公开(公告)日：2007-03-29
- 发明人： VOS RITA , MERTENS PAUL , FESTER ALBRECHT , DOLL OLIVER , KOLBESEN BERND
- 申请人： IMEC INTER UNI MICRO ELECTR , AIR PROD & CHEM
- 专利权人： IMEC INTER UNI MICRO ELECTR,AIR PROD & CHEM
- 当前专利权人： IMEC INTER UNI MICRO ELECTR,AIR PROD & CHEM
- 优先权： US25792800 2000-12-22
- 主分类号： B08B3/08
- IPC分类号： B08B3/08 ; C01B15/037 ; A61K6/00 ; C09K3/00 ; C09K15/30 ; C11D3/28 ; C11D3/39 ; C11D3/395 ; C11D11/00 ; D06L3/02 ; D21C9/08 ; H01L21/30 ; H01L21/304
摘要：
The present invention is related to a composition comprising an oxidizing compound and a complexing compound with the chemical formula wherein R1, R2, R3 and R4 are selected from the group consisting of H and any organic side chain. The oxidizing compound can be in the form of an aqueous solution. The complexing compound is for complexing metal ions. Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate
公开/授权文献:
- DE60121468D1 公开/授权日：2006-08-24
信息查询:
EspacenetIPC结构图谱:
| B | 作业；运输 |
| --B08 | 清洁 |
| ----B08B | 一般清洁；一般污垢的防除 |
| ------B08B3/00 | 使用液体或蒸气的清洁方法 |
| --------B08B3/04 | .与液体接触的清洁 |
| ----------B08B3/08 | ..具有化学作用或溶解作用的液体 |