The invention discloses a rotary magnetron target and horizontal magnetron sputtering coating equipment. The rotary magnetron target comprises a target, a magnetic core and a magnet, wherein the magnetic core is arranged at the middle part of the target, at least one magnet is arranged at the periphery of the magnetic core, and one end facing the target, of the magnet, is conical. The horizontal magnetron sputtering coating equipment comprises a front pre-pumping chamber, a front rough-pumping chamber, a front fine-pumping chamber, a front buffering chamber, a coating chamber, a rear buffering chamber, a rear fine-pumping chamber, a rear rough-pumping chamber and a rear pre-pumping chamber which are sequentially connected, wherein one or more coating chambers are provided, and one rotary magnetron target is arranged in each coating chamber, and located above a workpiece. According to the rotary magnetron target, the tail end of the magnet is designed to be a tip, thus the distribution density of magnetic force lines on the surface of the target is enhanced, and the number of the sputtered target particles can be increased, and then the coating efficiency of the surface of the workpiece is increased. The rotary magnetron target is applied to the horizontal magnetron sputtering coating equipment, thus the coating efficiency of the workpiece can be effectively increased, and the production cycle of a whole process line is shortened, and then the production efficiency is increased.