基本信息:
- 专利标题： 层叠体、有机半导体制造用套组及有机半导体制造用光阻组合物
- 专利标题（英）：Laminate, organic-semiconductor manufacturing kit, and resist composition for manufacturing organic semiconductor
- 申请号：CN201480058649.7 申请日：2014-10-29
- 公开(公告)号：CN105683835A 公开(公告)日：2016-06-15
- 发明人： 水谷一良 , 岩井悠 , 小山一郎 , 加持义贵
- 申请人： 富士胶片株式会社
- 申请人地址： 日本国东京都
- 专利权人： 富士胶片株式会社
- 当前专利权人： 富士胶片株式会社
- 当前专利权人地址： 日本国东京都
- 代理机构： 中科专利商标代理有限责任公司
- 代理人： 刘文海
- 优先权： 2013-227037 2013.10.31 JP
- 国际申请： PCT/JP2014/078698 2014.10.29
- 国际公布： WO2015/064602 JA 2015.05.07
- 进入国家日期： 2016-04-25
- 主分类号： G03F7/038
- IPC分类号： G03F7/038 ; B32B27/00 ; G03F7/004 ; G03F7/039 ; G03F7/11 ; H01L21/027 ; H01L21/3065
This invention provides the following: a laminate that allows the formation of a good organic semiconductor pattern; an organic-semiconductor manufacturing kit for manufacturing said laminate; and a resist composition for manufacturing an organic semiconductor, said resist composition being used in the aforementioned organic-semiconductor manufacturing kit. This laminate comprises an organic semiconductor film, a protective film on top of said organic semiconductor film, and a resist film on top of said protective film. The resist film comprises a photosensitive resin composition that contains the following: a photoacid generator (A) that generates an organic acid having a pKa of -1 or lower; and a resin (B) that reacts with the acid generated by the photoacid generator such that the rate of solution of said resin with respect to a developer that contains an organic solvent decreases.
公开/授权文献:
- CN105683835B 层叠体、有机半导体制造用套组及有机半导体制造用光阻组合物 公开/授权日：2019-11-26