
基本信息:
- 专利标题: 一种上流式反应器气液分配盘及其段间补氢装置
- 专利标题(英):Gas and liquid distribution plate of up-flow reactor and inter-segment hydrogen supplementation device thereof
- 申请号:CN201410318107.0 申请日:2014-07-04
- 公开(公告)号:CN104056579A 公开(公告)日:2014-09-24
- 发明人: 程振民 , 杨雨清 , 吴思操 , 黄子宾 , 石岩 , 罗文 , 周志明
- 申请人: 华东理工大学
- 申请人地址: 上海市徐汇区梅陇路130号
- 专利权人: 华东理工大学
- 当前专利权人: 华东理工大学
- 当前专利权人地址: 上海市徐汇区梅陇路130号
- 代理机构: 上海新天专利代理有限公司
- 代理人: 胡红芳
- 主分类号: B01J8/02
- IPC分类号: B01J8/02
The invention discloses a gas and liquid distribution plate of an up-flow reactor and an inter-segment hydrogen supplementation device thereof. Before flowing into a catalyst bed, gas and liquid flow along independent channels and do not make contact with each other. In the operation process, the liquid phase enters an end enclosure of the reactor from a feed pipe on the bottom of the rector, is uniformly distributed through a porous plate, penetrates through a gas distribution chamber along a plurality of parallel liquid rising pipes to flow upwards and flows out through small holes in the side surfaces of the tops of the liquid rising pipes; gas enters the gas distribution chamber from an inlet pipe on the side surface of the reactor and flows out from small holes in the side surfaces of gas rising pipes arranged on the top of the gas distribution chamber. The liquid is limited to flow in the liquid rising pipes, the gas distribution chamber is only filled with the gas and is not disturbed by the liquid, and therefore the situation that the gas distribution chamber is polluted by the liquid and needs to be cleaned frequently is avoided. The gas and the liquid are uniformly mixed at the top of the distribution plate and then enter the catalyst bed. The liquid phase continues flowing upwards, consumed hydrogen is supplemented through the inter-segment hydrogen supplementation device, and therefore a reaction can go on.
公开/授权文献:
- CN104056579B 一种上流式反应器气液分配盘及其段间补氢装置 公开/授权日:2016-04-20
IPC结构图谱:
B | 作业;运输 |
--B01 | 一般的物理或化学的方法或装置 |
----B01J | 化学或物理方法,例如,催化作用、胶体化学;其有关设备 |
------B01J8/00 | 在有流体和固体颗粒的情况下所进行的一般化学或物理的方法;这些方法所用的装置 |
--------B01J8/02 | .用静止颗粒,例如,在固定床内 |