基本信息:
- 专利标题： 防尘薄膜、其制造方法以及用该膜贴付的防尘薄膜组件
- 专利标题（英）：Dustproof pellicle film, manufacturing method thereof, and dustproof pellicle component with pellicle film attached
- 申请号：CN201210091249.9 申请日：2012-03-30
- 公开(公告)号：CN102736400A 公开(公告)日：2012-10-17
- 发明人： 関原一敏
- 申请人： 信越化学工业株式会社
- 申请人地址： 日本东京都
- 专利权人： 信越化学工业株式会社
- 当前专利权人： 信越化学工业株式会社
- 当前专利权人地址： 日本东京都
- 代理机构： 北京泛华伟业知识产权代理有限公司
- 代理人： 王勇
- 优先权： 2011-077976 20110331 JP
- 主分类号： G03F1/48
- IPC分类号： G03F1/48 ; G03F1/46
The invention provides a dustproof pellicle film suitable for photoetching engineering with irradiation of ultraviolet rays in the wavelength field of 350-450nm comprising i ray, h ray, and g ray, and advantaged by cheapness and good light resistance. The pellicle film is the dustproof pellicle film for a dustproof pellicle film component used in the photoetching engineering with irradiation of ultraviolet rays in the wavelength field of 350-450nm. The dustproof pellicle film is characterized in that, for the surface on at least an exposure light source side of a raw material dustproof pellicle film, the average transmittance of the ultraviolet rays in the wavelength field of 350-450nm is more than 90%, and an ultraviolet ray absorption layer is provided, and the average transmittance of the ultraviolet rays in the wavelength field of 200-300nm with respect to the ultraviolet ray absorption layer is less than 50%.
公开/授权文献:
- CN102736400B 防尘薄膜、其制造方法以及用该膜贴付的防尘薄膜组件 公开/授权日：2014-02-05