
基本信息:
- 专利标题: 抛光用环氧板改装结构
- 专利标题(英):Modified structure of polishing epoxy plate
- 申请号:CN201210083393.8 申请日:2012-03-27
- 公开(公告)号:CN102581737A 公开(公告)日:2012-07-18
- 发明人: 张全文
- 申请人: 赫得纳米科技(昆山)有限公司
- 申请人地址: 江苏省苏州市昆山市玉山镇都市路21号
- 专利权人: 赫得纳米科技(昆山)有限公司
- 当前专利权人: 赫得纳米科技(昆山)有限公司
- 当前专利权人地址: 江苏省苏州市昆山市玉山镇都市路21号
- 代理机构: 南京纵横知识产权代理有限公司
- 代理人: 董建林
- 主分类号: B24B29/02
- IPC分类号: B24B29/02
The invention discloses a modified structure of a polishing epoxy plate, which comprises an epoxy plate body. The epoxy plate body is arranged between an upper disc and a lower disc on polishing equipment, a plurality of cavities used for fixing products to be polished are arranged on the epoxy plate body, and at least one outwards extending cavity groove which expands outwards is arranged on the wall of each cavity. The cavities on the epoxy plate are improved, namely the outwards extending cavity grooves are arranged on the cavities of the epoxy plate, accordingly, workers take and place the products during operation conveniently, the cavities of the epoxy plate can be more effectively prevented from being collided with cavities of the products during polishing, rejected products are reduced, and yield of the products is increased. In addition, when products such as glass and the like are polished, effects that the products can be taken and placed conveniently, straight bodies of the products cannot become uneven due to the fact that the products are collided with the cavities of the epoxy plate during polishing by the aid of the modified structure. Besides, the modified structure is simple and reasonable in structure and is worthy of popularization and use.
公开/授权文献:
- CN102581737B 抛光用环氧板改装结构 公开/授权日:2015-03-18
IPC结构图谱:
B | 作业;运输 |
--B24 | 磨削;抛光 |
----B24B | 用于磨削或抛光的机床、装置或工艺;磨具磨损表面的修理或调节;磨削,抛光剂或研磨剂的进给 |
------B24B29/00 | 有或没有使用固体或液体抛光剂并利用柔软材料或挠性材料制作的工具进行工件表面抛光的机床或装置 |
--------B24B29/02 | .适用于特殊工件的 |