基本信息:
- 专利标题：
- 申请号：AT00116029 申请日：2000-07-26
- 公开(公告)号：AT393490T 公开(公告)日：2008-05-15
- 发明人： PADMABANDU GAMARALALAGE G , DAS PALASH P , WATSON TOM A , ZAMBON PAOLO
- 申请人： CYMER INC
- 专利权人： CYMER INC
- 当前专利权人： CYMER INC
- 优先权： US36820899 1999-08-04; US42029799 1999-10-18
- 主分类号： H01S3/134
- IPC分类号： H01S3/134 ; H01S3/225 ; G03F7/20 ; H01S3/036
摘要：
An excimer laser system with an automatic fluorine control system to permit precise control of the fluorine concentration within an F2 "sweet spot" in a gas discharge laser chamber. This is done with a computer control system which monitors laser parameters, determines DELTA E/ DELTA V, the change of pulse energy with voltage, and automatically and precisely controls the fluorine concentration based on DELTA E/ DELTA V without the need to actually measure the fluorine concentration. The present invention is especially useful in lithography environments in which photo resist having a wide range of sensitivity are used. The present invention permits operation of the laser at substantially maximum efficiency over a wide range of pulse energy outputs.
信息查询:
EspacenetIPC结构图谱:
| H | 电学 |
| --H01 | 基本电气元件 |
| ----H01S | 利用受激发射的器件 |
| ------H01S3/00 | 激光器，即利用受激发射对红外光、可见光或紫外线进行产生、放大、调制、解调或变频的器件 |
| --------H01S3/10 | .控制辐射的强度、频率、相位、极化或方向，例如开关、选通、调制或解调 |
| ----------H01S3/102 | ..由控制激活媒质，例如通过控制激励的方法或设备 |
| ------------H01S3/131 | ...由控制激活手段，例如通过控制激励方法或设备 |
| --------------H01S3/134 | ....在气体激光器中 |