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    • 6. 发明授权
    • Light weight workload management server integration
    • 轻量级工作负载管理服务器集成
    • US09262210B2
    • 2016-02-16
    • US13538854
    • 2012-06-29
    • Brian K. CaufieldYong LiXiaoyan Pu
    • Brian K. CaufieldYong LiXiaoyan Pu
    • G06F9/46G06F9/48G06F9/50
    • G06F9/4843G06F9/505G06F2209/503
    • A method, computer program product and system for workload management for an Extract, Transform, and Load (ETL) system. A priority of each workload in a set of workloads is determined using a priority rule. In response to determining that the priority of a workload to be checked has a highest priority, it is indicated that the workload has the highest priority. It is determined whether at least one logical resource representing an ETL metric is available for executing the workload. In response to determining that the workload has the highest priority and that the at least one logical resource is available, it is determined that the workload is runnable.
    • 一种用于提取,转换和加载(ETL)系统的工作负载管理的方法,计算机程序产品和系统。 使用优先级规则确定一组工作负载中的每个工作负载的优先级。 响应于确定要检查的工作负载的优先级具有最高优先级,则指示工作负载具有最高优先级。 确定表示ETL度量的至少一个逻辑资源是否可用于执行工作负载。 响应于确定工作负载具有最高优先级并且至少一个逻辑资源可用,则确定工作负载是可运行的。
    • 8. 发明授权
    • Process for preparing tantalum powder for capacitors
    • 电容器钽粉制备工艺
    • US08673052B2
    • 2014-03-18
    • US12818379
    • 2010-06-18
    • Wenfeng ShiXueqing ChenYong LiXudong XiTao Guo
    • Wenfeng ShiXueqing ChenYong LiXudong XiTao Guo
    • B22F9/20B22F1/00
    • C01G35/00B22F9/20B22F2998/10B22F2999/00C01P2004/03C01P2004/62C01P2006/10C01P2006/12C01P2006/40H01G9/0029H01G9/0525B22F2201/013B22F2201/20B22F2201/10B22F1/0096
    • The present invention provides a process for preparing a tantalum powder with high specific capacity, which process comprising the steps of, in sequence, (1) a first reduction step: mixing tantalum oxide powder and a first reducing agent powder homogenously, and then carrying out reduction reaction in hydrogen and/or inert gas or vacuum atmosphere to obtain a tantalum suboxides powder; (2) a second reduction step: mixing the tantalum suboxides powder obtained from the step (1), in which impurities have been removed, and a second reducing agent powder homogenously, and then carrying out reduction reaction in hydrogen and/or inert gas or vacuum atmosphere to obtain a tantalum powder having high oxygen content; (3) a third reduction step: mixing the tantalum powder having high oxygen content obtained from the step (2), in which impurities have been removed, with a third reducing agent powder homogenously, and then carrying out reduction reaction in hydrogen and/or inert gas or vacuum atmosphere to obtain a tantalum metal powder suitable for capacitors; wherein after each reduction step, the oxidation product of reducing agent and the residual reducing agent are removed from the reaction product.
    • 本发明提供一种制备高比容量的钽粉的方法,该方法包括以下步骤:(1)第一还原步骤:均匀混合氧化钽粉末和第一还原剂粉末,然后进行 在氢气和/或惰性气体或真空气氛中还原反应,得到低氧化钽粉末; (2)第二还原步骤:将其中除去杂质的步骤(1)获得的低密度氧化钡粉末和均质的第二还原剂粉末混合,然后在氢气和/或惰性气体中进行还原反应,或 真空气氛,得到氧含量高的钽粉末; (3)第三还原步骤:将已经除去杂质的步骤(2)获得的具有高氧含量的钽粉末与第三还原剂粉末均匀混合,然后在氢气和/或 惰性气体或真空气氛,得到适合电容器的钽金属粉末; 其中在每个还原步骤之后,从反应产物中除去还原剂和剩余还原剂的氧化产物。
    • 9. 发明授权
    • Accurately estimating install time
    • 准确估计安装时间
    • US08661431B2
    • 2014-02-25
    • US13342567
    • 2012-01-03
    • Rand K. BarthelYong LiEduardo N. Spring
    • Rand K. BarthelYong LiEduardo N. Spring
    • G06F19/00G06F7/00G06F17/00G06F12/00G06F9/44G06F9/445G06F9/46
    • G06F8/61G06F8/65G06F8/658G06F17/30289G06Q10/04
    • Timing parameters that influence an install time interval for installing a product on computing machines in a test environment in accordance with an installation configuration option are identified. A test value of the timing parameter and a test value of the install time are determined for each of the computing machines. The test values of the timing parameter and the install time determined for the sample computing machines are analyzed to determine an install time calculation expression for the installation configuration option. For installation in accordance with the installation configuration option in a normal operating environment, a current value of each of the timing parameters of the predetermined install time calculation expression for the installation configuration option. The install time interval in the normal operating environment is estimated based on the current value of the timing parameters and the install time calculation expression.
    • 确定影响根据安装配置选项在测试环境中在计算机上安装产品的安装时间间隔的定时参数。 为每个计算机确定定时参数的测试值和安装时间的测试值。 对样本计算机确定的时序参数和安装时间的测试值进行分析,以确定安装配置选项的安装时间计算表达式。 为了在正常运行环境中按照安装配置选项进行安装,可以根据安装配置选项的预定安装时间计算表达式的每个时序参数的当前值。 基于定时参数和安装时间计算表达式的当前值来估计正常操作环境中的安装时间间隔。