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    • 10. 发明申请
    • VERSATILE SEMI-TOROIDAL PROCESSING FURNACE WITH AUTOMATIC AND RECONFIGURABLE WAFER EXCHANGE
    • 具有自动和可重新构造的换热器的多功能半导体加工炉
    • WO2006017163A2
    • 2006-02-16
    • PCT/US2005/024237
    • 2005-07-09
    • DIAMOND SEMICONDUCTOR, INC.BAYNE, Christopher, J.
    • BAYNE, Christopher, J.
    • A21B1/22A21B1/00A21B2/00
    • H01L21/67178H01L21/67742H01L21/67754H01L21/67757
    • The present invention comprises a fully automated, fabrication compliant furnace with the advantages of the horizontal most of the advantages of the vertical furnace. One embodiment of the present invention is that it implements a multi-degree motion robot arm to move wafers from a loading area to a WIP station where the wafer are then loaded into wafer boats on a rotating cantilever system or directly onto a specialized and reconfigurable paddle designed to hold wafers: The wafers may be loaded in the horizontal processing position as well as the vertical processing position. Multiple levels of the semi-toroidal horizontal processors allow for multiple batches of wafers to be loaded, processed, cooled, and unloaded by the robot arm. The present invention reduces the footprint of the traditional horizontal or vertical furnaces, increases capacity and throughput, and allows for direct tube transfer.
    • 本发明包括一种完全自动化,制造兼容的炉,具有垂直炉的水平大部分优点的优点。 本发明的一个实施例是其实现多程度运动机器人臂以将晶片从装载区域移动到WIP站,其中晶片然后在旋转的悬臂系统上装载到晶片舟皿中或直接装载到专门的和可重新配置的桨 设计用于保持晶片:晶片可以装载在水平处理位置以及垂直处理位置。 半环形水平处理器的多个级别允许多个批次的晶片由机器人手臂装载,加工,冷却和卸载。 本发明减少了传统的卧式或立式炉的占地面积,增加了容量和产量,并且允许直接的管传送。