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1. 发明申请

WO1998010335A1 ALKYSULFONYLOXIMES FOR HIGH-RESOLUTION I-LINE PHOTORESISTS OF HIGH SENSITIVITY 审中-公开
标题翻译：用于高灵敏度高分辨率线性光电子的结晶聚合物
公开(公告)号：WO1998010335A1
公开(公告)日：1998-03-12
申请号：PCT/EP1997004566
申请日：1997-08-22
申请人： CIBA SPECIALTY CHEMICALS HOLDING INC. , DIETLIKER, Kurt , KUNZ, Martin , YAMATO, Hitoshi , DE LEO, Christoph
发明人： CIBA SPECIALTY CHEMICALS HOLDING INC.
IPC分类号： G03F07/004
CPC分类号： C07D333/22 , C07C309/65 , C07C309/66 , C07D333/24 , G03F7/0045
摘要： The invention describes the use of oxime alkyl sulfonate compounds of formula (1), wherein R is naphthyl, (2) or (3); R0 is either an R1-X group or R2; X is a direct bond, an oxygen atom or a sulfur atom; R1 is hydrogen, C1-C4alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C1-C4alkyl and C1-C4-alkyloxy; R2 is hydrogen or C1-C4alkyl; and R3 is straight-chain or branched C1-C12alkyl which is unsubstituted or substituted by one or more than one halogen atom; as photosentisitve acid generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.
摘要翻译：本发明描述了式（1）的肟烷基磺酸盐化合物（其中R是萘基，（2）或（3））的用途。 R0是R1-X基团或R2; X是直接键，氧原子或硫原子; R1是氢，C1-C4烷基或未取代或被选自氯，溴，C1-C4烷基和C1-C4-烷氧基的取代基取代的苯基; R2是氢或C1-C4烷基; 并且R 3是未被取代或被一个或多于一个卤素原子取代的直链或支链C 1 -C 12烷基; 作为化学放大光致抗蚀剂中的光敏酸发生剂，其可在碱性介质中显影并且对波长为340至390纳米的辐射敏感，并且对应于上述波长范围的正和负光致抗蚀剂。

2. 发明申请

WO1997007430A1 WATER-LESS LITHOGRAPHIC PLATES 审中-公开
标题翻译：无水平板
公开(公告)号：WO1997007430A1
公开(公告)日：1997-02-27
申请号：PCT/GB1996001974
申请日：1996-08-13
申请人： HORSELL GRAPHIC IMAGES LIMITED , BENNETT, Peter, Andrew, Reath , SMITH, Carole-Anne
发明人： HORSELL GRAPHIC IMAGES LIMITED
IPC分类号： G03F07/004
CPC分类号： G03F7/0752 , G03F7/0046 , Y10S430/108 , Y10S430/123
摘要： There is described a method of preparing a water-less lithographic plate which comprises a support having an oleophilic surface, there being coacted on the support a mixture which comprises as one component an ink-repellant and water-repellant polymer or a mixture of such polymers or a polymer precursor, and as the other essential component of the mixture a photosensitive or heat sensitive composition selected from a) an organic solvent soluble diazo composition which is either light or heat sensitive, b) a photopolymer together with a sensitiser which is either light or heat sensitive or c) a mixture of a free-radically polymerisable ethylenically unsaturated compound or compounds and a photoinitiator which is either heat or light sensitive, the ratio of ink-repellant polymer to photosensitive or heat sensitive composition a), b), or c) in the mixture being from 20-80 ink-repellant polymer to 80-20 photosensitive or heat sensitive composition by weight, imagewise acting on exposing the coated mixture, developping the acted on mixture with the appropriate developing solution depending on the composition a), b), c) used to remove the composition and the water-repellant polymer in the unacted-on areas to reveal the oleophilic surface of the support in the unacted-on areas of the plate and leaving the acted on areas of the plate.
摘要翻译：描述了一种制备无水平版印刷版的方法，该方法包括具有亲油表面的载体，其在载体上共同混合，该混合物包含斥水斥水聚合物或这种聚合物的混合物或聚合物前体，并且作为混合物的另一种基本组分，其选自a）有机溶剂可溶性重氮组合物，其为轻或热敏感的，b）光聚合物与敏化剂一起是光或热敏性，或c）可自由基聚合的烯键式不饱和化合物或化合物与光引发剂的混合物，其是热敏或光敏感的，斥墨聚合物与感光或热敏组合物a），b）或 c）在混合物中，重量为20-80％的斥墨聚合物至80-20感光或热敏组合物，成像作用于曝光根据组合物a），b），c）用于除去未反应的区域中的组合物和防水聚合物以显示出亲水性表面的组合物，用适当的显影液显影作用于混合物上支持板上的未触动区域，并留下板上的区域。

3. 发明申请

WO1994019724A1 NOVEL MATRIX RESIN FOR HIGH-TEMPERATURE STABLE PHOTOIMAGEABLE COMPOSITIONS 审中-公开
标题翻译：用于高温稳定可光成分的新型基体树脂
公开(公告)号：WO1994019724A1
公开(公告)日：1994-09-01
申请号：PCT/US1994001683
申请日：1994-02-15
申请人： HOECHST CELANESE CORPORATION
发明人： HOECHST CELANESE CORPORATION , DAMMEL, Ralph, R. , EVANS, Owen, B.
IPC分类号： G03F07/004
CPC分类号： G03F7/0233 , C08F8/00 , C08F12/22
摘要： The present invention relates to a novel matrix resin for high-temperature stable photoimageable compositions, in the form of a graft copolymer of monomeric or lower oligomeric hydroxyphenyl units grafted onto a polymer backbone containing reactive sites, to a process for its production and to its use as a matrix resin in photoimageable compositions either in a pure form or in admixture with other polymeric materials.
摘要翻译：本发明涉及一种用于高温稳定可光成像组合物的新型基质树脂，其形式为接枝到含有反应性位点的聚合物骨架上的单体或低级低聚羟苯基单元的接枝共聚物，其生产方法及其用途作为可光成像组合物中的基质树脂，以纯形式或与其它聚合物材料混合。

4. 发明申请

WO1998027461A1 A METHOD FOR REDUCING METAL ION CONTAMINANTS IN PHOTORESIST COMPOSITIONS CONTAINING AN ORGANIC POLAR SOLVENT BY ION EXCHANGE 审中-公开
标题翻译：用于通过离子交换减少含有机溶剂的光电组合物中的金属离子污染物的方法
公开(公告)号：WO1998027461A1
公开(公告)日：1998-06-25
申请号：PCT/EP1997007054
申请日：1997-12-16
申请人： CLARIANT INTERNATIONAL LTD.
发明人： CLARIANT INTERNATIONAL LTD. , RAHMAN, M., Dalil
IPC分类号： G03F07/004
CPC分类号： G03F7/004
摘要： The present invention provides methods for producing a photoresist composition with extremely low level of metals contamination utilizing cleaned cationic ion exchange resin and anionic ion exchange resin, wherein the photoresist composition contains a polar solvent. A method is also provided for producing semiconductor devices using such photoresist compositions.
摘要翻译：本发明提供了利用清洁的阳离子离子交换树脂和阴离子离子交换树脂制备具有极低金属污染水平的光致抗蚀剂组合物的方法，其中光致抗蚀剂组合物含有极性溶剂。还提供了一种用于制造使用这种光致抗蚀剂组合物的半导体器件的方法。

5. 发明申请

WO1993002395A1 PHOTOCURABLE COMPOSITIONS 审中-公开
标题翻译：可光成分
公开(公告)号：WO1993002395A1
公开(公告)日：1993-02-04
申请号：PCT/GB1992001284
申请日：1992-07-14
申请人： COATES BROTHERS PLC , IVORY, Nicholas, Eric , THATCHER, Wrenford, John , PALMER, Robert, Jones
发明人： COATES BROTHERS PLC
IPC分类号： G03F07/004
CPC分类号： G03F7/0047 , G03F7/027 , H05K3/0076
摘要： A photocurable film-forming composite comprises a suspension or dispersion in water of a liquid or solid organic photocurable component, in which composition the aqueous phase contains particulate solid material. The composition may be used to form patterned images upon subtrates by photoimaging techniques.
摘要翻译：光固化成膜复合材料包括在液体或固体有机光固化性组分的水中的悬浮液或分散体，其中水相的组成含有颗粒状固体材料。组合物可以用于通过光成像技术在底物上形成图案化图像。

6. 发明申请

WO1992022855A1 PHOTOLITHOGRAPHICALLY PATTERNED FLUORESCENT COATING 审中-公开
标题翻译：光刻图形荧光涂层
公开(公告)号：WO1992022855A1
公开(公告)日：1992-12-23
申请号：PCT/US1992004926
申请日：1992-06-12
申请人： EASTMAN KODAK COMPANY
发明人： EASTMAN KODAK COMPANY , WEISS, Armin, Karl
IPC分类号： G03F07/004
CPC分类号： G03F7/0005 , G03F7/004
摘要： Fluorescent patterns are provided registratively oriented on a support by coating a liquid precursor of a photolithographically patternable composition, containing fluorescent compounds, on said support and patternwise exposing and developing the coating on the support.

7. 发明申请

WO1997043695A1 COMPOSITIONS AND PROCESSES FOR PHOTOGENERATION OF ACID 审中-公开
标题翻译：酸的光合成分和方法
公开(公告)号：WO1997043695A1
公开(公告)日：1997-11-20
申请号：PCT/US1997005034
申请日：1997-03-27
申请人： MINNESOTA MINING AND MANUFACTURING COMPANY
发明人： MINNESOTA MINING AND MANUFACTURING COMPANY , BUSMAN, Stanley, C. , ELLIS, Richard, J. , HAUBRICH, Jeanne, E. , RAMSDEN, William, D. , VAN THIEN, Tran , CUNY, George, D.
IPC分类号： G03F07/004
CPC分类号： G03F7/0045 , C09B57/007 , G03F7/0382 , G03F7/0392 , Y10S430/121 , Y10S430/127 , Y10S430/145 , Y10S430/146
摘要： Photochemical acid progenitors in combination with dihydroperimidine squarylium dyes have been found to be particularly effective at generating acid upon irradiation with near-infrared radiation. It has been found that dihydroperimidine squarylium dyes that are particularly useful in this invention have an oxidation potential greater than about 0.5 V relative to SCE as measured in dichloromethane.
摘要翻译：已经发现光化学酸性祖细胞与二氢嘧啶方菁染料的组合在用近红外辐射照射时产生酸是特别有效的。已经发现在本发明中特别有用的二氢嘧啶方酸菁染料相对于在二氯甲烷中测得的SCE，其氧化势大于约0.5V。

8. 发明申请

WO1997042548A1 LITHOGRAPHICAL PROCESS FOR PRODUCTION OF NANOSTRUCTURES ON SURFACES 审中-公开
标题翻译：的制备纳米结构的光刻SURFACES方法
公开(公告)号：WO1997042548A1
公开(公告)日：1997-11-13
申请号：PCT/EP1997002264
申请日：1997-05-03
申请人： STUDIENGESELLSCHAFT KOHLE MBH , REETZ, Manfred, T. , WINTER, Martin , DUMPICH, Günter , LOHAU, Jens
发明人： STUDIENGESELLSCHAFT KOHLE MBH
IPC分类号： G03F07/004
CPC分类号： G11B5/74 , G03F7/004 , G03F7/0042 , G11B5/855 , H01J2237/3175 , H01L21/288 , H01L21/76838 , H01L21/76892
摘要： The invention relates to a lithographical process for production of nanostructures on surfaces. Said process is characterised in that stabilised nanometer-scale transition-metal clusters or colloids of metals of the groups 4, 5, 6, 7, 8, 9, 10, 11 or 12 of the periodic system, their stabilised metal oxide or metal sulphide analogues, polynuclear metal carbonyl clusters with stochiometrically defined compositions, or polynuclear metal clusters with stochiometrically defined compositions or with bridges consisting of main group elements each in the form of a solution are applied to a surface in the form of a film which is illuminated selectively by an electron beam. After the non-illuminated parts of the film have been washed off, and then optionally annealed, defined structures are produced on the surface in the nanometer range.
摘要翻译：对于纳米结构的表面上生成，其特征在于，一种光刻方法，无论是稳定的纳米尺寸的过渡金属簇或周期表的4族，5，6，7，8，9，10，11或12族金属的胶体，其稳定化的金属氧化物或金属硫化物的类似物，与化学计量上所定义的组合物，或具有化学计量所定义的组合物或与由主族元素桥的组的多核金属簇多核金属羰基簇中，每个以溶液的形式，可被施加到表面上作为薄膜和此用电子束，其特征在于，洗去膜的未曝光部分之后，任选接着进行退火选择性曝光，生成在纳米范围内的表面上限定的结构。

9. 发明申请

WO1994001805A1 POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH 审中-公开
标题翻译：正极活性辐射敏感混合物及其制备的记录材料
公开(公告)号：WO1994001805A1
公开(公告)日：1994-01-20
申请号：PCT/EP1993001430
申请日：1993-06-07
申请人： HOECHST AKTIENGESELLSCHAFT , WENGENROTH, Horst , RÖSCHERT, Horst , SPIESS, Walter , PAWLOWSKI, Georg , BUHR, Gerhard
发明人： HOECHST AKTIENGESELLSCHAFT
IPC分类号： G03F07/004
CPC分类号： G03F7/0758 , G03F7/0045 , G03F7/039
摘要： The invention relates to a radiation-sensitive mixture with: a) an at least swellable binder which is insoluble in water but soluble in an aqueous-alkaline solution; b) a compound which forms an acid under the effect of actinic radiation; and c) a compound containing at least one C-O-C or C-O-Si bond which can be dissociated by an acid; which also contains at least one compound with at least one nitrogen atom in an amine or amide bond in the proportion of 0.1 to 70 mol % in relation to the maximum quantity of acid which can theoretically be generated from compound b). The content of this compound with at lest one nitrogen atom in an amine or amide bond is preferably 0.5 to 50 and especially preferably 1 to 40 mol % in relation to the maximum quantity of acid which can be theoretically generated from compound b). The boiling point of the compound at normal pressure is over 100 C, preferably above 150 and especially preferably above 180 C. The mixture is particularly applicable to the production of electronic components. The invention also concerns a recording material with a substrate and a radiation-sensitive coating.
摘要翻译：本发明涉及一种辐射敏感混合物，其包含：a）不溶于水，但可溶于碱性水溶液且至少溶胀的粘合剂，b）在辐射作用下的成酸化合物光化和c）通过酸含有至少一个COC-键或CO-SI-解离的化合物，其特征在于它进一步包含0.1至70摩尔％，基于其可以是酸的最大量理论上由化合物b）产生至少一种在胺或酰胺键中具有至少一个氮原子的化合物。基于可能存在的酸的最大量，在胺或酰胺键中包含至少一个氮原子的化合物的含量优选为0.5至50摩尔％，并且更优选为1至40摩尔％。理论上由化合物b）制备。该化合物在常压下的沸点大于100℃，优选大于150℃，特别优选大于180℃ 该混合物尤其可用于制造电子元件。本发明还涉及一种具有载体和辐射敏感层的记录材料。

10. 发明申请

WO1993018437A1 PHOTORESISTS HAVING A LOW LEVEL OF METAL IONS 审中-公开
标题翻译：具有低水平金属离子的电影
公开(公告)号：WO1993018437A1
公开(公告)日：1993-09-16
申请号：PCT/US1993001749
申请日：1993-02-25
申请人： HOECHST CELANESE CORPORATION
发明人： HOECHST CELANESE CORPORATION , RAHMAN, M., Dalil , DURHAM, Dana, L.
IPC分类号： G03F07/004
CPC分类号： G03F7/004 , G03F7/0236
摘要： The present invention provides methods for producing photoresist compositions having a very low level of metal ions, utilizing specially treated ion exchange resins. A method is also provided for producing semiconductor devices using such photoresist compositions.
摘要翻译：本发明提供了利用特殊处理的离子交换树脂制备具有非常低水平的金属离子的光致抗蚀剂组合物的方法。还提供了一种用于制造使用这种光致抗蚀剂组合物的半导体器件的方法。

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