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1. 发明申请

WO1992006227A1 PROCESS AND DEVICE FOR REGENERATING AND RECOVERING METALS FROM CHLORIDE-CONTAINING SOLUTIONS 审中-公开
标题翻译：用于从含氯化物溶液中再生和回收金属的工艺和装置
公开(公告)号：WO1992006227A1
公开(公告)日：1992-04-16
申请号：PCT/EP1991001903
申请日：1991-10-07
申请人： HANS HÖLLMÜLLER MASCHINENBAU GMBH & CO. , MATSCHINER, Hermann , HARTMANN, Bernd , REICHELT, Klaus , LIEBER, Hans-Wilhelm
发明人： HANS HÖLLMÜLLER MASCHINENBAU GMBH & CO.
IPC分类号： C23F01/46
CPC分类号： C23G1/36 , C22B15/0093 , C23F1/46 , Y02P10/236
摘要： A process and device are disclosed for regenerating and recovering metals from chloride-containing solutions, such as those resulting from etching, corroding and rinsing during surface treatments, in particular galvanoplastic treatments and printed circuit board production, and that contain copper and other metal ions. The metals are separated from the acid, chloride-containing solutions with dissolved hydrogen. For that purpose, the acid chloride-containing solution is treated with hydrogen under a pressure from 0.0 to 0.5 MPa, available in the dissolved state in the water at a concentration from 0.6 to 1,8 kg/m h at a temperature between 10 and 60 DEG C, preferably between 15 and 50 DEG C, so that the metals are precipitated in the form of metal particles. A loop-type bubble column is used to carry out the process, said column comprising a reaction vessel (1), a circulating pump for stably delivering the gas-liquid mixture, a gas dispersing machine (3) for sucking-in and dispersing the gaseous hydrogen, a solid matter separating equipment (4) integrated in the circulating stream and possibly a dosing pump (5) for continuously feeding the solutions to be regenerated.
摘要翻译：公开了用于从含氯化物溶液再生和回收金属的方法和装置，例如在表面处理期间由腐蚀，腐蚀和漂洗产生的金属，特别是电镀锌处理和印刷电路板生产，并且含有铜和其它金属离子。金属与含有溶解氢的含氯化物溶液分离。为此，将含酰基氯的溶液在0.0〜0.5MPa的压力下用氢气处理，溶解状态在水中以0.6〜1.8kg / m 3的浓度在温度 10至60℃，优选15至50℃，以使金属以金属颗粒的形式沉淀。使用环式鼓泡塔进行该方法，所述柱包括反应容器（1），用于稳定输送气液混合物的循环泵，用于吸入和分散的气体分散机（3）气态氢，集成在循环流中的固体物质分离设备（4）和可能的计量泵（5），用于连续地供给要再生的溶液。

2. 发明申请

WO1992012276A1 ALKALINE ETCHING OF ALUMINUM WITH MATTE FINISH AND LOW WASTE CAPABILITY 审中-公开
标题翻译：铝的碱性蚀刻具有良好的细度和低的废物能力
公开(公告)号：WO1992012276A1
公开(公告)日：1992-07-23
申请号：PCT/CA1991000455
申请日：1991-12-20
申请人： ECO-TEC LIMITED
发明人： ECO-TEC LIMITED , HUNTER, Robert, F. , HOHN, Phillip
IPC分类号： C23F01/46
CPC分类号： B44C1/227 , C23F1/36 , C23F1/46
摘要： A process for etching aluminum in caustic solution capable of providing a consistently uniform matte finish like that of the never dump process, but with little waste like the regeneration process. Etching is performed in a solution containing free sodium hydroxide and dissolved aluminum in a ratio between about 0.6 and 2.1 g/l and also containing an etch equalizing agent at a temperature above about 70 °C. Preferably, the etch solution is regenerated through a crystallization loop.

3. 发明申请

WO1990003454A1 PROCESS AND INSTALLATION FOR ETCHING COPPER-CONTAINING WORK PIECES 审中-公开
标题翻译：蚀刻含铜工艺的过程和安装
公开(公告)号：WO1990003454A1
公开(公告)日：1990-04-05
申请号：PCT/EP1989001078
申请日：1989-09-18
申请人： HANS HÖLLMÜLLER MASCHINENBAU GMBH & CO. , DU PONT DE NEMOURS (DEUTSCHLAND) GMBH , HAAS, Rainer , CARUANA, Albert
发明人： HANS HÖLLMÜLLER MASCHINENBAU GMBH & CO. , DU PONT DE NEMOURS (DEUTSCHLAND) GMBH
IPC分类号： C23F01/46
CPC分类号： C23F1/46 , H05K3/067 , H05K3/068
摘要： Copper-containing work pieces, in particular copper-laminated printed circuit boards, are etched in an alkaline corrosive agent containing the copper-tetramine complex as active component. After etching, the work pieces are rinsed with an essentially neutral rinsing liquid which is an initiating solution of the regeneration salt required for regeneration of the corrosive agent. This regeneration salt contains essentially ammonium and chloride ions. Also disclosed is a regeneration installation connected to the etching machine, in which the pH of the corrosive agent is adjusted to the correct value and the corrosive agent is mixed with the neutral initiating solution from the rinsing operation.
摘要翻译：含铜工件，特别是铜层压印刷电路板，在含有铜 - 四胺络合物作为活性成分的碱性腐蚀剂中被蚀刻。在蚀刻之后，用基本上中性的冲洗液冲洗工件，冲洗液是腐蚀剂再生所需的再生盐的引发溶液。该再生盐基本上含有铵和氯离子。还公开了连接到蚀刻机的再生装置，其中腐蚀剂的pH被调节到正确的值，并且腐蚀剂与来自冲洗操作的中性引发溶液混合。

4. 发明申请

WO1996035827A1 METHOD OF RECYCLING WASTE ETCHING SOLUTION 审中-公开
标题翻译：回收废弃溶剂的方法
公开(公告)号：WO1996035827A1
公开(公告)日：1996-11-14
申请号：PCT/JP1995001673
申请日：1995-08-23
申请人： AIN CO., LTD. , AITECH CORPORATION , HOSODA, Shyuji , ONO, Kaoru , KASUYA, Yutaka , NAGAO, Minoru
发明人： AIN CO., LTD. , AITECH CORPORATION
IPC分类号： C23F01/46
CPC分类号： C23F1/46
摘要： A method of recycling a waste etching solution formed in the etching of a copper article with an ammonia-alkaline cupric chloride etchant, which comprises continuously treating the waste solution with an extractant capable of selectively extracting copper while preventing the etching velocity from being lowered as a result of the contamination of the regenerated etching solution with a large amount of the extractant. The method comprises the steps of mixing the waste solution with the extractant under agitation to effect extraction, separating the regenerated etching solution having a lowered copper concentration for recycling, subjecting the copper-containing extractant to back extraction to cause the copper contained in the extractant to migrate into an aqueous sulfuric acid-copper sulfate solution, and cleaning the extractant after the back extraction with a cleaning fluid such as water, warm water or dilute hydrochloric acid to remove sulfuric acid from the extractant.
摘要翻译：一种利用氨 - 碱性氯化铜蚀刻剂回收在铜制品的蚀刻中形成的废蚀刻溶液的方法，其包括用能够选择性提取铜的萃取剂连续处理废溶液，同时防止蚀刻速度降低为再生的蚀刻溶液用大量的萃取剂污染的结果。该方法包括以下步骤：在搅拌下将废溶液与萃取剂混合以进行萃取，分离具有降低的铜浓度的再生蚀刻溶液进行再循环，使含铜萃取剂反萃取，使萃取剂中所含的铜迁移到硫酸 - 硫酸铜水溶液中，并用清洗液如水，温水或稀盐酸清洗后提取物，以从萃取剂中除去硫酸。

5. 发明申请

WO1995024518A1 ELECTROLYSIS PROCESS FOR REGENERATING A FERRIC CHLORIDE OR SULPHATE SOLUTION, IN PARTICULAR FOR SPRAY ETCHING STEEL 审中-公开
标题翻译：电解法再生铁III氯化物或铁III氯化物溶液的，尤其是用于钢的喷雾蚀刻
公开(公告)号：WO1995024518A1
公开(公告)日：1995-09-14
申请号：PCT/DE1995000294
申请日：1995-03-06
申请人： MIB METALLURGIE UND OBERFLÄCHENTECHNIK UND INNOVATION IN BERLIN GMBH & CO. , LANDAU, Uwe , HERRMANN, Sigrid
发明人： MIB METALLURGIE UND OBERFLÄCHENTECHNIK UND INNOVATION IN BERLIN GMBH & CO.
IPC分类号： C23F01/46
CPC分类号： C23G1/36 , C23F1/46
摘要： An electrolysis process for regenerating a ferric chloride or sulphate solution (etchant), in particular for spray etching steel, is disclosed. The etchant to be regenerated continuously flows through the anode chamber (17) of an electrolytic cell (10) whose cathode chamber (14) is filled with a diluted conductive acid. Anode and cathode chambers (12 and 14) are separated by a cation exchange membrane (16) through which Fe(II) ions, excess Fe(III) and dissolved non-ferrous metals, in particular nickel and chromium ions, reach the cathode chamber (14), while Fe(II) ions are oxidised into FE(III) ions at the anode. The metals accumulated in the catholyte preferably precipitate as a powder in the cathode chamber (14) or are electrolytically precipitated in a subsequent electrolytic cell whose cathode and anode chambers are separated by an anion exchange membrane. This process allows the etchant to be continuously regenerated in a closed circuit, ensures the depletion of non-ferrous metals and excess iron, as well as the electrolytic precipitation of the depleted metal ions.
摘要翻译：这是用于再生氯化铁或硫酸铁溶液（泡菜），找到特别是用于钢的使用喷雾蚀刻中描述的电解过程。媒染剂，以通过阳极室（17）连续地再生通过电解池（10），其阴极空间（14）填充有稀释，高导电性酸。阳极室和阴极室（12和14）是由一个阳离子交换膜（16）分开的，通过它的Fe-II-离子，铁III-过量和溶解的非铁金属，在阴极室特别是镍和铬离子（14）被转移，而在阳极的Fe-II离子的Fe-III离子被氧化。中阴极电解液的金属富集优选沉积在阴极室（14），为粉末或在下游电解槽的阴极和阳极室由阴离子交换膜隔开，电解沉积。该方法允许在闭合回路中的污渍的连续再生，保证有色金属和铁过剩和耗尽的金属离子的电解沉积的耗尽。

6. 发明申请

WO1991014800A1 DEVICE FOR THE ELECTROLYTIC REGENERATION OF AN ETCHING AGENT CONTAINING CHLORIDE AND METALLIC IONS 审中-公开
标题翻译：用于含氯化物和金属离子的蚀刻剂的电解再生装置
公开(公告)号：WO1991014800A1
公开(公告)日：1991-10-03
申请号：PCT/EP1991000340
申请日：1991-02-23
申请人： HANS HÖLMÜLLER MASCHINENBAU GMBH & CO. , ROBERT BOSCH GMBH , REITH, Heribert , LANDER, Hans
发明人： HANS HÖLMÜLLER MASCHINENBAU GMBH & CO. , ROBERT BOSCH GMBH
IPC分类号： C23F01/46
CPC分类号： C23F1/46
摘要： A device for electrolytic regeneration of an etching agent containing chloride and metallic ions comprises an electrolysis chamber (2) where the actual electrolytic process for separating the metal with which the etching agent is enriched takes place. A first anode (14) and a first cathode (7), which are supplied by an individual direct current source (10), serve exclusively for this purpose. Independently, a second anode (24) and a second cathode (25), preferably in the form of parallel rods, serve for the anodic decomposition of water and hence the evolution of oxygen and hydrogen ions to compensate the pH increase due to oxidation of the etching agent in the etching machine. The second anode (24) and the second cathode (25) are connected electrically to an individual, independent direct current source (32) and are fitted by both their nature and their adjustment for the sole purpose of adjusting the pH.

7. 发明申请

WO1990005797A1 INSTALLATION FOR ETCHING OBJECTS 审中-公开
标题翻译：搪瓷对象安装
公开(公告)号：WO1990005797A1
公开(公告)日：1990-05-31
申请号：PCT/EP1989001345
申请日：1989-11-10
申请人： HANS HÖLLMÜLLER MASCHINENBAU GMBH & CO. , HAAS, Rainer
发明人： HANS HÖLLMÜLLER MASCHINENBAU GMBH & CO.
IPC分类号： C23F01/46
CPC分类号： C23F1/46 , C23F1/08
摘要： An installation for etching objects comprises at least one etching machine (1) in which metal is etched from the treated objects (7) and the etching reagent is enriched with metal. The etching reagent is regenerated in several electrolytic cells (5A, 5B, 5C) by removal of metal. For adaptation to different instantaneous etching capacities (loads) of the machine, the electrolytic cells (5A, 5B, 5C) are connected in succession by a device which integrates the quantity of enriched etching reagent removed from the etching machine (1) over a given time. A given limit value for this integral is assigned to each electrolytic cell (5A, 5B, 5C); when this limit value is exceeded, the corresponding electrolytic cell (5A, 5B, 5C) is activated. In this way, the total output of the electrolytic cells in service at any given time is adapted to the instantaneous load of the etching machine.
摘要翻译：用于蚀刻对象的装置包括至少一个蚀刻机（1），其中从被处理物体（7）蚀刻金属，并且蚀刻剂富含金属。蚀刻剂通过去除金属在几个电解槽（5A，5B，5C）中再生。为了适应机器的不同的瞬时蚀刻能力（负载），电解槽（5A，5B，5C）依次通过将从蚀刻机（1）去除的富集腐蚀试剂的量积聚在给定的时间。该积分的给定极限值被分配给每个电解槽（5A，5B，5C）; 当超过该极限值时，相应的电解槽（5A，5B，5C）被激活。以这种方式，在任何给定时间使用的电解池的总输出适应于蚀刻机的瞬时负载。

8. 发明申请

WO1990005796A1 INSTALLATION FOR ETCHING OBJECTS 审中-公开
标题翻译：搪瓷对象安装
公开(公告)号：WO1990005796A1
公开(公告)日：1990-05-31
申请号：PCT/EP1989001344
申请日：1989-11-10
申请人： HANS HÖLLMÜLLER MASCHINENBAU GMBH & CO. , HAAS, Rainer
发明人： HANS HÖLLMÜLLER MASCHINENBAU GMBH & CO.
IPC分类号： C23F01/46
CPC分类号： C23F1/08 , C23F1/46
摘要： An installation for etching objects comprises at least one etching machine in which metal is etched from the treated objects and the etching reagent is enriched with metal. The etching reagent is regenerated in at least one electrolytic cell (5) by removal of metal. Two buffer tanks (3, 4) are located in the lines (28, 35) which connect the etching machine (1) to the electrolytic cell. A first control circuit (15, 16, 17, 19, 23, 26) maintains the density of the etching reagent in the etching machine essentially constant. To this end, the depleted etching reagent is conveyed from the first buffer tank (3) to the etching machine (1) and the enriched etching agent is conveyed from the etching machine (1) to the second buffer tank (4). A second control circuit (40, 43, 44) maintains an essentially constant density in the electrolytic cell (5); to this end, enriched etching reagent is conveyed from the second buffer tank (4) to the electrolytic cell and an equivalent quantity of depleted etching reagent is conveyed from the electrolytic cell (5) to the first buffer tank (3). The two control circuits operate independently of each other.
摘要翻译：用于蚀刻对象的装置包括至少一个蚀刻机，其中从被处理物体蚀刻金属并且蚀刻剂富含金属。蚀刻剂通过去除金属在至少一个电解池（5）中再生。两个缓冲罐（3,4）位于将蚀刻机（1）连接到电解槽的管线（28,35）中。第一控制电路（15,16,17,19,23,26）保持蚀刻机中蚀刻剂的密度基本恒定。为此，耗尽的蚀刻试剂从第一缓冲罐（3）输送到蚀刻机（1），富集的蚀刻剂从蚀刻机（1）输送到第二缓冲罐（4）。第二控制电路（40,43,44）在电解池（5）中保持基本恒定的密度; 为此，富集的蚀刻剂从第二缓冲罐（4）输送到电解槽，并且等量的耗尽的蚀刻剂从电解槽（5）输送到第一缓冲罐（3）。两个控制电路彼此独立地工作。

9. 发明申请

WO1996041902A1 AMMONIACAL METAL SOLUTION RECYCLING PROCESS 审中-公开
标题翻译：一种用于处理含氨的金属溶液
公开(公告)号：WO1996041902A1
公开(公告)日：1996-12-27
申请号：PCT/EP1996002385
申请日：1996-06-03
申请人： HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN , KEHL, Ralf , SCHWAB, Werner
发明人： HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN
IPC分类号： C23F01/46
CPC分类号： C23F1/46 , C22B3/0017 , C22B15/0089 , Y02P10/234 , Y02P10/236 , Y10S423/14
摘要： A process is disclosed for recycling loaded aqueous solutions, in particular etching solutions that contain ammonia, at least one ammonium salt and metal ions in the dissolved form, and that result from the treatment of substrates that contain valuable metals, in particular copper-containing electronic components.
摘要翻译：本发明涉及的特别是含有氨蚀刻溶液以用于后处理负载，水性溶液的方法，至少一种铵盐和以溶解形式的金属离子，并且在基片的处理的wertmetallhaltiger，特别是含有铜的电子子组件被发生。

10. 发明申请

WO1993009267A1 PROCESS FOR REGENERATING AN AMMONIACAL ETCHING AGENT AND DEVICE FOR IMPLEMENTING IT 审中-公开
标题翻译：用于再生非金属蚀刻剂的方法和用于实施其的装置
公开(公告)号：WO1993009267A1
公开(公告)日：1993-05-13
申请号：PCT/EP1992002469
申请日：1992-10-29
申请人： HANS HÖLLMÜLLER MASCHINENBAU GMBH & CO. , MATSCHINER, Hermann , MÖBIUS, Andreas , HARTMANN, Bernd
发明人： HANS HÖLLMÜLLER MASCHINENBAU GMBH & CO.
IPC分类号： C23F01/46
CPC分类号： C23F1/46
摘要： During the etching process, the metal etched off is deposited in the etching agent and must be removed in an electrolytic cell (11) to regenerate the etching agent. In an ammoniacal environment undesired nitrates are thereby formed. According to the invention, they are reduced by the addition of a reducing agent (26, 27, 28) to gaseous nitrogen, ammonia or other reaction products which are either volatile or present in the etching agent in any case. Suitable reducing agents are especially hydrazine, hydrazine compounds, formaldehyde or hydrogen.
摘要翻译：在蚀刻过程中，蚀刻掉的金属沉积在蚀刻剂中，并且必须在电解槽（11）中除去以再生蚀刻剂。在氨气环境中，由此形成不希望的硝酸盐。根据本发明，通过在任何情况下向还原剂（26,27,28）中添加挥发性或存在于蚀刻剂中的气态氮，氨或其它反应产物而减少它们。合适的还原剂特别是肼，肼化合物，甲醛或氢。

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