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1. 发明申请

WO2005114101A8 METHOD OF MANUFACTURING AN OPTICAL ELEMENT 审中-公开
标题翻译：制造光学元件的方法
公开(公告)号：WO2005114101A8
公开(公告)日：2006-02-09
申请号：PCT/EP2004005194
申请日：2004-05-14
申请人： ZEISS CARL SMT AG , ARNOLD RALF , DOERBAND BERND , SCHILLKE FRANK , BEDER SUSANNE
发明人： ARNOLD RALF , DOERBAND BERND , SCHILLKE FRANK , BEDER SUSANNE
IPC分类号： G01B11/24 , B24B13/015 , B24B49/12
CPC分类号： G01B11/2441
摘要： A method of manufacturing an optical element (5) includes testing the optical element (5) by using an interferometer optics (1) generating a beam (13) of measuring light illuminating only a sub-aperture of the tested optical element (5). The interferometer optics (1) comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element (5). Further, a method of calibrating the interferometer optics (1) includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam (13) of measuring light generated by the interferometer optics (1) and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics (1).
摘要翻译：制造光学元件（5）的方法包括通过使用产生仅照射被测光学元件（5）的子孔径的光的光束（13）的干涉仪光学元件（1）来测试光学元件（5）。干涉仪光学器件（1）包括全息图。将子孔径测量的结果缝合在一起以获得关于光学元件（5）的整个表面的测量结果。此外，校准干涉仪光学器件（1）的方法包括使用校准光学器件执行干涉测量，所述校准光学器件具有仅覆盖光束（13）的全横截面的子孔径的测量由干涉仪光学器件产生的光的全息图（ 1）并且将子孔径测量结合在一起以获得指示干涉仪光学器件（1）的全部横截面的结果。

2. 发明申请

WO00044527A2 HIGH QUALITY OPTICALLY POLISHED ALUMINUM MIRROR AND PROCESS FOR PRODUCING 审中-公开
标题翻译：高质量光学抛光铝镜和生产工艺
公开(公告)号：WO00044527A2
公开(公告)日：2000-08-03
申请号：PCT/US2000/000508
申请日：2000-01-31
IPC分类号： B24B13/015 , B24B37/00 , G02B1/10 , B24B
CPC分类号： B24B37/00 , B24B13/015 , G02B5/0808
摘要： A new technical advancement in the field of precision aluminum optics permits high quality optical polishing of aluminum monolith, which, in the field of optics, offers numerous benefits because of its machinability, lightweight, and low cost. This invention combines diamond turning and conventional polishing along with india ink, a newly adopted material, for the polishing to accomplish a significant improvement in surface precision of aluminum monolith for optical purposes. This invention guarantees the precise optical polishing of typical bare aluminum monolith to surface roughness of less than about 30 angstroms rms and preferably about 5 angstroms rms while maintaining a surface figure accuracy in terms of surface figure error of not more than on-fifteenth of wave peak-to-valley.
摘要翻译：精密铝合金光学领域的新技术进步允许铝质材料的高质量光学抛光，其在光学领域由于其机械加工性，重量轻，成本低而具有许多优点。本发明结合了金刚石车削和常规抛光以及新采用的印刷油墨，用于抛光，以实现用于光学目的的铝整料的表面精度的显着提高。本发明保证了典型的裸铝整块材料的表面粗糙度的精确光学抛光，其表面粗糙度小于约30埃rms，优选约5埃rms，同时保持表面图形精度在表面图形误差方面不超过波峰的十五分之一 -to-山谷。

3. 发明申请

WO2014197551A2 METHOD OF FORMING A RECESS IN A SUBSTRATE, ABRASIVE WHEEL, AND COVER 审中-公开
标题翻译：在基材，磨料轮和覆盖物中形成记忆的方法
公开(公告)号：WO2014197551A2
公开(公告)日：2014-12-11
申请号：PCT/US2014/040830
申请日：2014-06-04
申请人： 3M INNOVATIVE PROPERTIES COMPANY
发明人： SVENTEK, Bruce A. , NELSON, Mitchell L. , BAIRD, David G. , BRETSCHER, Kathryn R.
IPC分类号： B24B13/015 , B24B19/03 , B24B21/00 , B24D5/06 , B24D5/12 , C03B11/08 , C03C19/00
CPC分类号： B24B19/03 , B24B13/015 , B24B21/006 , B24D5/06 , B24D5/12 , C03C19/00
摘要： A method of forming a recess in a surface of a substrate includes: providing an abrasive article comprising a structured abrasive member disposed along a peripheral surface of a support member, frictionally contacting the structured abrasive layer with a surface of a substrate, longitudinally advancing the structured abrasive layer relative to the surface of the substrate; and rotating at least one of the abrasive article or the substrate relative to the other around a rotational axis perpendicular to the surface of the substrate such that the structured abrasive layer maintains contact with and abrades the surface of the substrate. The structured abrasive member comprises a structured abrasive layer comprising shaped abrasive composites secured to a backing, wherein the backing is proximate to the support member. The shaped abrasive composites comprise abrasive particles retained in a binder material. The present disclosure also provides an abrasive wheel comprises a structured abrasive member disposed on a peripheral surface of a support wheel and display covers including a spherically concave recess abutting a cylindrical passage.
摘要翻译：在基板的表面中形成凹部的方法包括：提供包括沿着支撑构件的外周表面设置的结构化研磨件的磨料制品，将结构化研磨层与基底表面摩擦接触，纵向推进结构化研磨层相对于基底的表面; 以及使所述研磨制品或所述基底中的至少一个相对于另一个围绕垂直于所述基底的表面的旋转轴线旋转，使得所述结构化研磨层保持与所述基底的表面接触并磨蚀所述基底的表面。结构化研磨件包括结构化研磨层，其包括固定到背衬的成形研磨复合材料，其中背衬靠近支撑构件。成形磨料复合材料包括保留在粘合剂材料中的磨料颗粒。本公开还提供了一种砂轮，其包括设置在支撑轮的外周表面上的结构化研磨构件和包括邻接圆柱形通道的球形凹槽的显示盖。

4. 发明申请

WO2006049825A3 PROCESS FOR MANUFACTURING OPTICAL AND SEMICONDUCTOR ELEMENTS 审中-公开
标题翻译：制造光学和半导体元件的工艺
公开(公告)号：WO2006049825A3
公开(公告)日：2006-07-27
申请号：PCT/US2005036639
申请日：2005-10-11
申请人： 3M INNOVATIVE PROPERTIES CO
发明人： OUDERKIRK ANDREW J , LUGG PAUL S , BENSON OLESTER JR , LEATHERDALE CATHERINE A , JOSEPH WILLIAM D
IPC分类号： B24B13/015 , B24B19/03 , G02B3/00 , H01L33/20 , H01L33/58
CPC分类号： B24D18/0009 , H01L33/20 , H01L33/58 , H01L2924/0002 , H01L2924/00
摘要： A method for fabricating an array of precisely shaped and located shaped elements utilizes a precisely shaped patterned abrasive to form channels in a workpiece. One or more patterned abrasives contact and abrade along one or more intersecting axes to define the shaped elements. The shaped elements may include optical elements, semiconductor elements, or both.
摘要翻译：用于制造精确成形和定位成形元件的阵列的方法利用精确成形的图案化磨料在工件中形成通道。一个或多个图案化磨料沿着一个或多个相交轴线接触和磨损以限定成形元件。成形元件可以包括光学元件，半导体元件或两者。

5. 发明申请

WO0032353A3 A POLISHING MACHINE AND METHOD 审中-公开
标题翻译：抛光机和方法
公开(公告)号：WO0032353A3
公开(公告)日：2000-08-10
申请号：PCT/GB9904014
申请日：1999-12-01
申请人： OPTICAL GENERICS LTD , BINGHAM RICHARD , RILEY DAVID CHARLES
发明人： BINGHAM RICHARD , RILEY DAVID CHARLES
IPC分类号： G02B3/00 , B24B1/00 , B24B7/22 , B24B7/24 , B24B13/00 , B24B13/01 , B24B13/015 , B24B13/02 , B24B17/10 , B24B29/00 , B24B37/04 , B24B41/00 , B24B41/04 , B24B47/12 , B24B51/00 , B24D3/06 , B24D3/28 , B24D3/34 , B24D9/04 , B24D11/00 , B24D13/14 , B24D13/20 , B24D18/00
CPC分类号： B24B13/00 , B24B1/00 , B24B7/228 , B24B7/24 , B24B7/241 , B24B13/01 , B24B13/015 , B24B13/02 , B24B17/10 , B24B29/00 , B24B41/002 , B24B41/04 , B24B47/12 , B24B51/00 , B24D3/06 , B24D3/28 , B24D3/342 , B24D9/04 , B24D11/001 , B24D13/14 , B24D13/147 , B24D13/20 , B24D18/0009 , Y10S451/90
摘要： A machine for abrading or polishing a workpiece (5) comprises a holding surface holding the workpiece, a head member (7) arranged along a rotation axis to rotate about the rotation axis, a working member (8) having a surface for abrading or polishing the workpiece (5) arranged on the head member on the rotational axis (h) for rotation about the rotation axis with the head member, a first driving arrangement for driving a head member and the working member mounted thereon to rotate about the rotation axis, a head mounting arrangement for mounting the head member, a second driving arrangement (700) for driving the head mounting arrangement to incline the rotation axis of the head member relative to a precession axis intersecting the rotation axis, and for moving the head member to inclined positions with the rotation axis precessed about the precession axis, and a third driving arrangement (800) for relatively moving the head mounting arrangement across the holding surface.
摘要翻译：一种用于研磨或抛光工件（5）的机器包括保持工件的保持表面，沿着旋转轴线布置以围绕旋转轴线旋转的头部构件（7），具有用于研磨或抛光的表面的工作构件（8）设置在头部构件上的工件（5），用于旋转轴线（h），用于围绕旋转轴线与头部构件一起旋转，用于驱动头部构件的第一驱动装置和安装在其上的工作构件围绕旋转轴线旋转，用于安装头部构件的头部安装装置，用于驱动头部安装装置以相对于与旋转轴线相交的进动轴倾斜头部构件的旋转轴线的第二驱动装置（700），以及用于将头部构件移动到倾斜围绕旋动轴线旋转的旋转轴线的位置以及用于相对移动头部安装装置横跨保持表面的第三驱动装置（800）。

6. 发明申请

WO2022115553A1 TEXTURED GLASS-BASED ARTICLES WITH MULTIPLE HAZE LEVELS AND PROCESSES OF PRODUCING THE SAME 审中-公开
公开(公告)号：WO2022115553A1
公开(公告)日：2022-06-02
申请号：PCT/US2021/060752
申请日：2021-11-24
申请人： CORNING INCORPORATED
发明人： CANNON WILSON, Shunda, Denise , DAFIN, John, Martin , JIN, Yuhui , KAUFMAN, George, Karl , PIRAYESH, Hamidreza , ZAJICEK, Thomas, Christopher
IPC分类号： B24B7/24 , B24B13/015 , B24B37/04 , C03C15/00 , C03C19/00 , C03C21/00
摘要： A textured glass-based article with multiple haze levels is provided. The textured glass-based articles are produced by utilizing a combination of etching and mechanical polishing to produce the multiple haze levels.

7. 发明申请

WO2007014732A2 VERFAHREN UND VORRICHTUNG ZUM NACHBEARBEITEN VON GLASSCHEIBEN 审中-公开
标题翻译：方法和设备再调整玻璃的
公开(公告)号：WO2007014732A2
公开(公告)日：2007-02-08
申请号：PCT/EP2006/007551
申请日：2006-07-31
申请人： SCHOTT AG , PLAPPER, Volker , OTTERMANN, Clemens , KÖHR, Thomas , SPEIT, Burkhardt , CLAUSS, Michael
发明人： PLAPPER, Volker , OTTERMANN, Clemens , KÖHR, Thomas , SPEIT, Burkhardt , CLAUSS, Michael
IPC分类号： B24B7/24 , B24B13/015
CPC分类号： C03C19/00 , B24B7/224 , B24B7/242 , B24B13/015 , B24B37/04
摘要： Der Erfindung liegt die Aufgabe zugrunde, verbesserte Glassubstrate insbesondere für die Fertigung von TFT-Anzeigen bereitzustellen. Dazu sieht die Erfindung ein Verfahren zur Nachbehandlung von Flachglas-Substraten, insbesondere von Flachglas-Substraten für die Flachbildschirm-Fertigung vor, wobei das Substrat eine Fläche von zumindest 3,2 m 2 , vorzugsweise eine Fläche von zumindest 3,6 m 2 aufweist, wobei das Substrat auf einer Fläche von zumindest 3,2 m 2 , vorzugsweise einer Fläche von zumindest 3,6 m 2 durch Materialabtrag von wenigstens einer Seite nachbehandelt wird.
摘要翻译：本发明具有提供改进的玻璃基板，特别是用于TFT显示器的制造的目的。为此，本发明提供了的平坦的玻璃基板的处理的方法，特别是扁平的玻璃基板用于平板生产之前，具有至少3.2米^{2 ，优选的区域中的表面区域中的基材的至少 3.6米^{2 ，所述衬底上方的至少3.2米^{2 ，优选至少3.6米的区域^{2 是通过从至少一个侧面去除材料处理。}}}}

8. 发明申请

WO2004048037A3 SPRING-LOADED CONTOUR FOLLOWING END EFFECTORS FOR LAPPING/POLISHING 审中-公开
标题翻译：用于拉丝/抛光的末端效应弹簧载荷
公开(公告)号：WO2004048037A3
公开(公告)日：2004-08-19
申请号：PCT/US0337451
申请日：2003-11-21
申请人： BOEING CO
发明人： WOOD JEFFREY H , BENDER ROBERT E
IPC分类号： B24B13/015 , B24B19/26 , B24B27/00 , B24B37/00 , B25J15/00 , B25J17/02 , B25J19/00
CPC分类号： B25J19/0091 , B24B13/015 , B24B19/26 , B24B27/0038 , B24B37/00 , B25J11/0065 , B25J15/0019 , B25J17/0275
摘要： End effectors are provided for performing surface lapping using a robot. The end effectors allow orthogonal surface contact in order to maintain optimum pressure applied by the robot. One or more end effectors include a base, a plate, a lapping pad attached to the plate, and a pivot joint. The pivot joint allows the plate to pivot about two substantially orthogonal axes. The base is attached to an arm of a robot. The end effector includes a component for absorbing applied pressure, such as a spring-loaded shaft or a pneumatic shaft. In an aspect of the invention, the two axes are substantially parallel to the planar surface.
摘要翻译：提供终结效应器用于使用机器人进行表面研磨。末端执行器允许正交表面接触，以保持由机器人施加的最佳压力。一个或多个端部执行器包括底座，板，连接到板的研磨垫和枢转接头。枢转关节允许板绕两个基本上正交的轴线枢转。基座连接到机器人的手臂。末端执行器包括用于吸收施加的压力的部件，例如弹簧加载的轴或气动轴。在本发明的一个方面，两个轴线基本上平行于平面。

9. 发明申请

WO2004048031A2 CONTOUR FOLLOWING END EFFECTORS FOR LAPPING/POLISHING 审中-公开
标题翻译：轮廓跟随最终效果器进行打磨/抛光
公开(公告)号：WO2004048031A2
公开(公告)日：2004-06-10
申请号：PCT/US0337450
申请日：2003-11-21
申请人： BOEING CO
发明人： WOOD JEFFREY H , BENDER ROBERT E
IPC分类号： B24B13/015 , B24B19/26 , B24B27/00 , B24B37/00 , B25J15/00 , B25J17/02 , B24B
CPC分类号： B24B13/015 , B24B19/26 , B24B27/0038 , B24B37/00 , B25J11/0065 , B25J15/0019 , B25J17/0275
摘要： End effectors are provided for performing surface lapping using a robot. The end effectors allow orthogonal surface contact in order to maintain optimum pressure applied by the robot. The end effectors include a base, a plate having a planar surface, a lapping pad that attaches to the planar surface of the plate, and a pivot-joint. The pivot-joint allows the plate to pivot about two axes. The base is attached to an arm of the robot. The two axes are substantially parallel to the planar surface.
摘要翻译：提供末端执行器用于使用机器人执行表面研磨。末端执行器允许正交表面接触以保持机器人施加的最佳压力。末端执行器包括底座，具有平坦表面的板，连接到板的平坦表面的研磨垫以及枢转接头。枢转接头允许板围绕两个轴线枢转。底座连接在机器人的手臂上。两个轴基本上平行于平面。

10. 发明申请

WO2007120163A3 USE OF CMP FOR ALUMINUM MIRROR AND SOLAR CELL FABRICATION 审中-公开
标题翻译：使用CMP对铝镜和太阳能电池制造
公开(公告)号：WO2007120163A3
公开(公告)日：2008-02-28
申请号：PCT/US2006024789
申请日：2006-06-22
申请人： CABOT MICROELECTRONICS CORP
发明人： BRUSIC VLASTA , JENKINS RICHARD , THOMPSON CHRISTOPHER
IPC分类号： B24B13/015 , B24B37/04 , B24D13/04
CPC分类号： C09G1/02 , B24B13/015 , B24B29/02 , B24B37/044 , B24B37/24 , C09K3/1454 , H01L31/054
摘要： The invention is directed to a method of polishing a surface of a substrate comprising aluminum, comprising contacting a surface of the substrate with a polishing pad and a polishing composition comprising an abrasive, an agent that oxidizes aluminum, and a liquid carrier, and abrading at least a portion of the surface to remove at least some aluminum from the substrate and to polish the surface of the substrate, wherein the abrasive is in particulate form and is suspended in the liquid carrier.
摘要翻译：本发明涉及一种抛光包含铝的基材的表面的方法，包括使基材的表面与抛光垫接触，以及抛光组合物，其包含研磨剂，氧化铝的试剂和液体载体，并在至少一部分表面以从衬底去除至少一些铝并抛光衬底的表面，其中磨料是颗粒形式并悬浮在液体载体中。

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