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1. 发明申请

WO2015130189A1 METHOD AND APPARATUS FOR OXIDATION OF TWO-DIMENSIONAL MATERIALS 审中-公开
标题翻译：用于氧化二维材料的方法和装置
公开(公告)号：WO2015130189A1
公开(公告)日：2015-09-03
申请号：PCT/RU2014/000133
申请日：2014-02-28
申请人： NOKIA TECHNOLOGIES OY , BESSONOV, Alexander Alexandrovich
发明人： BESSONOV, Alexander Alexandrovich , KIRIKOVA, Marina Nikolaevna , PETUKHOV, Dmitrii Igorevich
IPC分类号： C04B35/515 , C03C17/22 , C04B35/547 , C04B35/58 , C04B35/581 , C04B35/583 , H01L21/02 , H01L21/67 , H01L33/00 , H01S5/343
CPC分类号： C04B41/0045 , C03C17/225 , C03C17/27 , C04B35/5154 , C04B35/547 , C04B35/58 , C04B35/581 , C04B35/583 , C04B41/009 , C04B41/80 , C04B2235/663 , H01L21/02565 , H01L21/02568 , H01L21/02614 , H01L21/67115
摘要： In accordance with an example embodiment of the present invention, a method is disclosed. The method comprises providing a two-dimensional object comprising a lll-V group material, e.g. Boron nitride (BN), Boron carbon nitride (BCN), Aluminium nitride (AIN), Gallium nitride (GaN), Indium Nitride (InN), Indium phosphide (InP), Indium arsenide (InAs), Boron phosphide (BP), Boron arsenide (BAs), and Gallium phosphide (GaP) and/or a Transition Metal Dichalcogenides (TMD) group material, e.g Molybdenum sulfide (MoS2), Molybdenum diselenide (MoSe2), Tungsten sulfide (WS2), Tungsten diselenide (WSe2), Niobium sulfide (NbS2), Vanadium sulfide (VS2,), and Tantalum sulfide(TaS2) into an environment comprising oxygen; and exposing at least one part of the two-dimensional object to photonic irradiation in said environment, thereby oxidizing at least part of the material of the exposed part of the two-dimensional object.
摘要翻译：根据本发明的示例性实施例，公开了一种方法。该方法包括提供包含III-V族材料的二维物体，例如。氮化硼（BN），氮化硼（BCN），氮化铝（AlN），氮化镓（GaN），氮化铟（InN），磷化铟（InP），砷化铟（InAs），磷化硼（BP）砷化物（BAs）和磷化镓（GaP）和/或过渡金属二硫属化物（TMD）组材料，例如硫化钼（MoS2），二硒化钼（MoSe2），硫化钨（WS2），二硒化钨（WSe2），铌硫化物（NbS2），硫化钒（VS2）和硫化钽（TaS2）转化为包含氧的环境; 以及将所述二维物体的至少一部分暴露于所述环境中的光子照射，从而氧化所述二维物体的暴露部分的材料的至少一部分。

2. 发明申请

WO2013126466A1 HEAT TREATED CERAMIC SUBSTRATE HAVING CERAMIC COATING AND HEAT TREATMENT FOR COATED CERAMICS 审中-公开
标题翻译：具有陶瓷涂层的热处理陶瓷基材和涂层陶瓷的热处理
公开(公告)号：WO2013126466A1
公开(公告)日：2013-08-29
申请号：PCT/US2013/026963
申请日：2013-02-20
申请人： APPLIED MATERIALS, INC. , SUN, Jennifer, Y. , DUAN, Ren-guan , KANUNGO, Biraja, R. , LUBOMIRSKY, Dmitry
发明人： SUN, Jennifer, Y. , DUAN, Ren-guan , KANUNGO, Biraja, R. , LUBOMIRSKY, Dmitry
IPC分类号： C03C1/00 , C04B41/50 , C23C28/00
CPC分类号： C04B41/87 , C04B41/0072 , C04B41/009 , C04B41/5025 , C04B41/5032 , C04B41/5042 , C04B41/5045 , C04B41/52 , C04B41/80 , C04B41/89 , Y10T428/249988 , Y10T428/265 , C04B35/00 , C04B35/10 , C04B41/4556
摘要： A ceramic article having a ceramic substrate and a ceramic coating with an initial porosity and an initial amount of cracking is provided. The ceramic article is heated to a temperature range between about 1000°C and about 1800°C at a ramping rate of about 0.1°C per minute to about 20°C per minute. The ceramic article is heat treated at one or more temperatures within the temperature range for a duration of up to about 24 hours. The ceramic article is then cooled at the ramping rate, wherein after the heat treatment the ceramic coating has a reduced porosity and a reduced amount of cracking.
摘要翻译：提供具有陶瓷基底和具有初始孔隙率和初始裂纹量的陶瓷涂层的陶瓷制品。陶瓷制品以约0.1℃/分钟至约20℃/分钟的升温速率加热至约1000℃至约1800℃的温度范围。陶瓷制品在一个或多个温度范围内在高达约24小时的持续时间内进行热处理。然后将陶瓷制品以升高速度冷却，其中在热处理后，陶瓷涂层具有降低的孔隙率和减少的开裂量。

3. 发明申请

WO2011129779A2 HEAT TREATMENT METHOD FOR CARBON CRYSTALLIZING 审中-公开
标题翻译：碳结晶热处理方法
公开(公告)号：WO2011129779A2
公开(公告)日：2011-10-20
申请号：PCT/TR2010/000080
申请日：2010-04-16
申请人： AKCIN, Sevim Sunay
发明人： AKCIN, Sevim Sunay
IPC分类号： C04B41/80
CPC分类号： C04B41/0072 , C04B41/009 , C04B41/80 , C04B33/00 , C04B33/24

4. 发明申请

WO2010107678A1 SINTERING SUPPORT AND METHODS 审中-公开
标题翻译：烧结支持和方法
公开(公告)号：WO2010107678A1
公开(公告)日：2010-09-23
申请号：PCT/US2010/027275
申请日：2010-03-15
申请人： 3M INNOVATIVE PROPERTIES COMPANY , DITTMANN, Rainer, K. , HOESCHELER, Stefan
发明人： DITTMANN, Rainer, K. , HOESCHELER, Stefan
IPC分类号： C04B41/45 , C04B41/50 , C04B41/85 , F27D3/12
CPC分类号： C04B41/80 , C04B35/6281 , C04B35/62815 , C04B41/009 , C04B41/4584 , C04B2111/00836 , C04B2235/3246 , C04B2235/528 , C04B2235/5427 , C04B2235/72 , C04B2235/762 , F27D5/0043 , Y10T428/2982 , Y10T428/2991 , Y10T428/2993 , C04B41/0072 , C04B41/4535 , C04B41/4556 , C04B35/48
摘要： A sintering support comprising a fully stabilized zirconia outer surface; wherein the sintering support withstands sintering a ceramic part in contact with the outer surface without adhesion between the outer surface and the ceramic part, and methods of making and using the sintering support are disclosed.
摘要翻译：包含完全稳定的氧化锆外表面的烧结载体; 其中所述烧结载体承受烧结与外表面接触的陶瓷部分，而不会在外表面和陶瓷部件之间的粘附，以及制造和使用烧结载体的方法。

5. 发明申请

WO2006126278A1 ハニカム構造体审中-公开
标题翻译：蜂窝结构体
公开(公告)号：WO2006126278A1
公开(公告)日：2006-11-30
申请号：PCT/JP2005/009806
申请日：2005-05-27
申请人：イビデン株式会社 , 山田啓二
发明人：山田啓二
IPC分类号： B01D39/20
CPC分类号： F01N3/0222 , B28B23/0031 , C04B35/565 , C04B37/005 , C04B41/009 , C04B41/4572 , C04B41/80 , C04B2111/00793 , C04B2235/3826 , C04B2235/5436 , C04B2235/5445 , C04B2237/083 , C04B2237/365 , F01N3/035 , F01N13/18 , F01N2330/06 , F01N2330/30 , F01N2330/34 , F01N2450/02 , F01N2450/28 , F01N2510/0682 , Y10T428/24149 , Y10T428/24157 , C04B35/00 , C04B38/0006 , C04B41/0036 , C04B41/4535
摘要：本発明の目的は、例えば、内燃機関の排気通路を構成する配管に挿入して使用され、排気ガスが流入する側と、排気ガスが流出する側とを明確に区別することができるなどの多くの情報が付与されたハニカム構造体を提供することにあり、本発明は、多数の貫通孔が壁部を隔てて長手方向に並設された柱状のハニカム構造体であって、その外周表面及び／又は端面に、二次元コードにより、上記ハニカム構造体に関する情報が表示されていることを特徴とするハニカム構造体である。
摘要翻译：蜂窝结构体，例如插入到形成内燃机的排气路径的管道中，并且赋予蜂窝结构体多个信息，例如能够使蜂窝结构体被清楚分隔的信息进入废气流入的一侧和废气流动的一侧。蜂窝结构体为柱状，并且在其长度方向上具有大量通孔，并具有分隔部。与蜂窝结构体相关的信息通过二维码在身体的外周面和/或端面上显示。

6. 发明申请

WO0203427A3 SEMICONDUCTOR PROCESSING EQUIPMENT HAVING IMPROVED PARTICLE PERFORMANCE 审中-公开
标题翻译：具有改进的粒子性能的半导体处理设备
公开(公告)号：WO0203427A3
公开(公告)日：2002-04-11
申请号：PCT/US0120284
申请日：2001-06-25
申请人： LAM RES CORP , BOSCH WILLIAM FREDERICK
发明人： BOSCH WILLIAM FREDERICK
IPC分类号： C04B41/00 , C04B41/80 , C23C16/44 , H01L21/00 , C23C16/50
CPC分类号： C04B41/009 , C04B41/0054 , C04B41/80 , C23C16/4404 , H01J37/321 , C04B41/53 , C04B35/565 , C04B35/515
摘要： A ceramic part having a surface exposed to the interior space, the surface having been shaped and plasma conditioned to reduce particles thereon by contacting the shaped surface with a high intensity plasma. The ceramic part can be made by sintering or machining a chemically deposited material. During processing of semiconductor substrates, particle contamination can be minimized by the ceramic part as a result of the plasma conditioning treatment. The ceramic part can be made of various materials such as alumina, silicon dioxide, quartz, carbon, silicon, silicon carbide, silicon nitride, boron nitride, boron carbide, aluminum nitride or titanium carbide. The ceramic part can be various parts of a vacuum processing chamber such as a liner within a sidewall of the processing chamber, a gas distribution plate supplying the process gas to the processing chamber, a baffle plate of a showerhead assembly, a wafer passage insert, a focus ring surrounding the substrate, an edge ring surrounding an electrode, a plasma screen and/or a window.
摘要翻译：具有暴露于内部空间的表面的陶瓷部件，该表面已经成形并经等离子体处理以通过使成形表面与高强度等离子体接触来减少其上的颗粒。陶瓷部件可以通过烧结或加工化学沉积的材料制成。在处理半导体衬底期间，由于等离子体调节处理，陶瓷部件可以使颗粒污染最小化。陶瓷部件可以由诸如氧化铝，二氧化硅，石英，碳，硅，碳化硅，氮化硅，氮化硼，碳化硼，氮化铝或碳化钛等各种材料制成。陶瓷部分可以是真空处理室的不同部分，例如处理室侧壁内的衬里，将处理气体供给处理室的气体分配板，喷头组件的挡板，晶片通道插入件，围绕衬底的聚焦环，围绕电极的边缘环，等离子体屏幕和/或窗口。

7. 发明申请

WO01043243A2 LASER SYSTEM WITH CONTROLLABLE PULSE DURATION 审中-公开
标题翻译：具有可控脉冲持续时间的激光系统
公开(公告)号：WO01043243A2
公开(公告)日：2001-06-14
申请号：PCT/DE2000/004314
申请日：2000-12-04
IPC分类号： B23K26/06 , B23K26/067 , C04B41/00 , C04B41/80 , H01S3/23 , H01S3/00
CPC分类号： B23K26/067 , B23K26/0604 , B23K26/0613 , C04B41/0036 , C04B41/009 , C04B41/80 , C04B2111/00844 , C04B41/0072 , C04B41/4578 , C04B35/00
摘要： The invention relates to a laser system, with controllable pulse duration, which comprises a generator device (10), with at least one pulsed laser (22), formed in such a way that said laser creates a first laser beam (16) and a second beam (18), spatially separate from the above first beam; a displacing device (12) formed in such a way that said device temporally shifts the second beam (18) with respect to the first beam (16); and a combining device (14), formed in such a way that said device combines both spatially separate laser beams (16, 18) in one output beam (20). Said laser system is particularly suitable for use in a method for the production of a crystalline ceramic layer by laser-annealing, whereby the temperature profile in the ceramic layer can be adjusted by controlling the pulse duration of the output beam of said laser system.
摘要翻译：本发明涉及一种具有可控的脉冲持续时间，其包括至少一个脉冲激光器（22）的激光系统，具有生成装置（10）和被设计为使得它产生第一激光束（16），并且该空间上分离的第二激光束中的一个（18）; 位移装置（12），其被设计为使得其相对于第一激光束（16）及时地移动第二激光束（18）; 和合并装置（14），其被布置成将两个空间分离的激光束（16,18）合并在输出光束（20）中。此激光系统是特别适合于在用于制造由合适的激光退火，并且在该陶瓷层的温度分布的结晶陶瓷层的方法中使用，通过控制该激光系统的输出束的脉冲持续时间进行调整。

8. 发明申请

WO1998020181A1 PROCESS FOR PLASMA SPRAYING CERAMIC RESIDUES 审中-公开
标题翻译：等离子喷涂陶瓷残留物的工艺
公开(公告)号：WO1998020181A1
公开(公告)日：1998-05-14
申请号：PCT/US1997020043
申请日：1997-10-31
申请人： MOLTEN METAL TECHNOLOGY, INC.
发明人： MOLTEN METAL TECHNOLOGY, INC. , DEKANICH, Steven, John , FORESTER, Johnny, Page
IPC分类号： C23C04/12
CPC分类号： C04B33/1325 , B01D39/2075 , B01D67/0072 , B01D69/12 , B01D71/02 , B01D2323/26 , B01D2325/022 , B09C1/06 , C03B19/01 , C03B19/1045 , C04B18/026 , C04B33/1321 , C04B35/62204 , C04B35/653 , C04B38/00 , C04B41/0054 , C04B41/009 , C04B41/80 , C04B2111/00405 , C04B2111/00793 , C04B2235/5436 , C04B2235/5463 , C04B2235/72 , C21B3/06 , C23C4/10 , G21F9/30 , G21F9/302 , Y02P10/212 , Y02P40/69 , Y02W30/543 , Y02W30/91 , C04B41/4598 , C04B41/5093 , C04B35/00 , C04B18/04
摘要： A method for preparing useful ceramic-containing articles from ceramic phase residues formed as a by-product of a treatment process producing a molten ceramic slag. The method is particularly useful in converting ceramic phase residues containing hazardous or radioactive substances into useful articles. The ceramic phase residue is converted to particulate form of appropriate size for feeding to a plasma arc sprayer, injected into the hot plasma jet. The resulting molten ceramic spray is caused to impinge on a solid surface to form a solid or porous ceramic article or coating, or is quenched so as to form a particulate ceramic material. Alternatively, a contaminated particulate material such as soil, may be sized and fed directly to the sprayer. A method for making ceramic filters or filter membranes using plasma arc spraying is also disclosed.
摘要翻译：作为产生熔融陶瓷渣的处理工艺的副产物形成的陶瓷相残留物制备有用的含陶瓷制品的方法。该方法特别适用于将含有危险或放射性物质的陶瓷相残余物转化为有用物品。将陶瓷相残余物转化为适当尺寸的颗粒形式，供给等离子体电弧喷雾器，注入热等离子体射流。使得到的熔融陶瓷喷雾物撞击在固体表面上以形成固体或多孔陶瓷制品或涂层，或被骤冷以形成颗粒陶瓷材料。或者，污染的颗粒材料如土壤可以被定尺寸并直接供给到喷雾器中。还公开了使用等离子体电弧喷涂制造陶瓷过滤器或过滤膜的方法。

9. 发明申请

WO1997038810A1 METHOD OF MANUFACTURING A SINTERED STRUCTURE ON A SUBSTRATE 审中-公开
标题翻译：在基板上制造烧结结构的方法
公开(公告)号：WO1997038810A1
公开(公告)日：1997-10-23
申请号：PCT/IB1997000281
申请日：1997-03-21
申请人： PHILIPS ELECTRONICS N.V. , PHILIPS NORDEN AB
发明人： PHILIPS ELECTRONICS N.V. , PHILIPS NORDEN AB , NOTENBOOM, Gerardus, Johannes, Antonius, Maria
IPC分类号： B22F03/105
CPC分类号： H05K3/125 , B22F3/1055 , B29C64/00 , B29C67/04 , B33Y10/00 , B33Y70/00 , C03C17/25 , C03C17/256 , C03C2217/212 , C03C2218/113 , C03C2218/32 , C04B41/0036 , C04B41/80 , H01L21/4867 , H05K3/4664 , Y02P10/295
摘要： The invention relates to a method of manufacturing a sintered structure on a substrate. To this end, a particle-charged liquid is provided on the substrate by means of a (multiple print head) ink jet printer. Subsequently, the liquid is evaporated and the particles contained therein are sintered layer-by-layer. Said layer-by-layer laser sintering enables 3-dimensional products having a relatively high dimensional accuracy to be manufactured. Preferably, evaporation of the liquid also takes place by means of (the same or) a laser. The liquid preferably comprises particles of glass, ceramics or metal compounds in the form of a sol-gel solution or a colloidal sol.
摘要翻译：本发明涉及在基板上制造烧结结构的方法。为此，通过（多打印头）喷墨打印机在基板上提供带粒子的液体。随后，蒸发液体，其中包含的颗粒被逐层烧结。所述逐层激光烧结使得能够制造具有相对较高尺寸精度的三维产品。优选地，液体的蒸发也通过（相同或）激光进行。液体优选包含溶胶 - 凝胶溶液或胶态溶胶形式的玻璃，陶瓷或金属化合物的颗粒。

10. 发明申请

WO1996010724A1 MASKING ELEMENT FIXTURE 审中-公开
标题翻译：屏蔽元件
公开(公告)号：WO1996010724A1
公开(公告)日：1996-04-11
申请号：PCT/US1995012232
申请日：1995-09-22
申请人： MATERIALS RESEARCH CORPORATION
发明人： MATERIALS RESEARCH CORPORATION , KOSHAK, Daniel, R.
IPC分类号： F27D05/00
CPC分类号： C04B41/009 , C04B35/52 , C04B41/0072 , C04B41/80 , C23C14/3414 , F27D5/0062
摘要： A fixture (10) for holding a plurality of masking elements (28, 30) while the masking elements are being baked to remove impurities is disclosed. The masking elements (28, 30) are used to mask dies used for forming sputtering targets used to deposit thin films on a substrate. The fixture (10) includes a housing (12) having first and second end walls (22, 24) connected between first and second side walls (18, 20) wherein the first and second end and side walls form an interior aperture (16). In addition, the fixture (10) includes several slots (26) which are formed in the first and second side walls (18, 20) wherein each of the slots (26) are suitable for holding a single masking element (28, 30). In particular, the interior aperture (16) is of a sufficient size and the slots (26) are positioned such that suitable air circulation is provided between each of the masking elements (28, 30) to expose the masking elements to a predetermined temperature suitable for removing the impurities from the masking elements. Furthermore, the fixture (10) includes openings (32) formed in the end walls (22, 24) which enable handling of the fixture and provide additional air circulation.
摘要翻译：公开了一种用于在掩蔽元件被烘烤以除去杂质的同时保持多个掩模元件（28,30）的夹具（10）。掩模元件（28,30）用于掩模用于形成用于在衬底上沉积薄膜的溅射靶的模具。固定装置（10）包括具有连接在第一和第二侧壁（18,20）之间的第一和第二端壁（22,24）的壳体（12），其中第一和第二端壁形成内孔（16）。另外，固定装置（10）包括形成在第一和第二侧壁（18,20）中的多个槽（26），其中每个槽（26）适于保持单个掩模元件（28,30）。特别地，内部孔（16）具有足够的尺寸并且狭槽（26）被定位成使得在每个掩蔽元件（28,30）之间提供合适的空气循环，以将掩模元件暴露于适当的预定温度用于从掩蔽元件去除杂质。此外，固定装置（10）包括形成在端壁（22,24）中的开口（32），其能够处理固定装置并提供额外的空气循环。

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