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1. 发明申请

WO1990006206A1 MICROLASER BEAM MACHINE FOR THE TREATMENT OF THIN FILM OBJECTS, IN PARTICULAR, FOR ENGRAVING OR DEPOSITING MATERIAL BY CHEMICAL MEANS IN THE PRESENCE OF A REACTIVE GAS 审中-公开
标题翻译：用于处理薄膜物体的微型光束机器，特别是用于通过化学手段在反应性气体存在下雕刻或沉积材料
公开(公告)号：WO1990006206A1
公开(公告)日：1990-06-14
申请号：PCT/FR1989000607
申请日：1989-11-24
申请人： BERTIN & CIE
发明人： BERTIN & CIE , AUVERT, Geoffroy , GEORGEL, Jean-Claude , GUERN, Yves
IPC分类号： B23K26/12
CPC分类号： B23K26/123 , B23K26/12 , B23K26/126 , B23K26/127 , C23C16/047 , C23C16/483 , H01L21/67115
摘要： The machine, according to the invention, comprises an airtight chamber (10) in which is located a microscope objective (34) receiving a laser beam (36) through a transparent window of considerable thickness, and which contains a reactor (20) formed from an airtight box whose lid comprises a transparent window (56) of limited thickness under which is placed the thin film object (32) to be treated. Means (72, 80, 74) are provided, whereby air may be evacuated from the chamber (10) and the reactor (20) and a reactive gas may be introduced into the reactor. The invention can be chiefly applied to the treatment of electronic circuits, hybrid circuits and the like.

2. 发明申请

WO2017117041A1 USE OF REACTIVE FLUIDS IN ADDITIVE MANUFACTURING AND THE PRODUCTS MADE THEREFROM 审中-公开
标题翻译：反应性流体在添加剂制造中的用途及其制造的产品
公开(公告)号：WO2017117041A1
公开(公告)日：2017-07-06
申请号：PCT/US2016/068490
申请日：2016-12-23
申请人： MATHESON TRI-GAS, INC. , SHIMIZU, Hideharu , RAYNOR, Mark, W. , TEMPEL, Daniel, J. , YAO, Junpin , WAGG, Larry , WYSE, Carrie , TORRES, Robert
发明人： SHIMIZU, Hideharu , RAYNOR, Mark, W. , TEMPEL, Daniel, J. , YAO, Junpin , WAGG, Larry , WYSE, Carrie , TORRES, Robert
IPC分类号： B05D3/06 , B23K26/322
CPC分类号： B22F3/1055 , B22F2003/1056 , B22F2999/00 , B23K10/027 , B23K15/0086 , B23K15/0093 , B23K15/10 , B23K26/126 , B23K26/127 , B23K26/342 , B23K26/38 , B23K26/60 , B29C64/10 , B29C64/314 , B33Y10/00 , B33Y30/00 , C23C24/103 , Y02P10/295 , B22F3/101 , B22F2201/013 , B22F2201/02 , B22F2201/03 , B22F2201/04 , B22F2201/10 , B22F2201/30 , B22F2201/32
摘要： The present invention generally relates to methods and apparatuses adapted to perform additive manufacturing (AM) processes and the resulting products made therefrom, and specifically, to AM processes that employ an energy beam to selectively fuse a base material to produce an object. More particularly, the invention relates to methods and systems that use reactive fluids to actively manipulate the surface chemistry of the base material prior to, during and/or after the AM process.
摘要翻译：本发明总体上涉及适合于执行增材制造（AM）工艺的方法和设备以及由其制造的最终产品，并且具体地涉及采用能量束来选择性地熔合基材产生一个对象。更具体地说，本发明涉及在AM过程之前，过程中和/或之后使用反应流体主动操纵基体材料的表面化学性质的方法和系统。

3. 发明申请

WO1998010886A1 LASER REMOVAL OF FOREIGN MATERIALS FROM SURFACES 审中-公开
标题翻译：激光从表面去除外来材料
公开(公告)号：WO1998010886A1
公开(公告)日：1998-03-19
申请号：PCT/IL1997000271
申请日：1997-08-11
申请人： ORAMIR SEMICONDUCTOR EQUIPMENT LTD. , LIVSHITS, (BUYANER), Boris , GENUT, Menachem , TEHAR-ZAHAV, Ofer , ISKEVITCH, Eliezer
发明人： ORAMIR SEMICONDUCTOR EQUIPMENT LTD.
IPC分类号： B23K26/12
CPC分类号： H01L21/02046 , B23K26/12 , B23K26/1224 , B23K26/123 , B23K26/125 , B23K26/126 , B23K26/127 , H01L21/31138
摘要： Method of fast and complete laser removal of inorganic and organic foreign material, including particles down to sub-micron sizes and atomic contaminants, such as heavy metals and alkaline elements, from a substrate without any damage to the substrate, carried out by UV laser irradiation of the substrate surface in a reactive oxygen based gas, which comprises carrying out the removal process in the presence of gas containing F and/or Cl atoms in its molecules.
摘要翻译：通过紫外激光照射快速，完全地激光去除无机和有机异物，包括从底物到底物的亚微米尺寸和原子污染物（如重金属和碱性元素），而不损坏基底的原子污染物包括在其分子中含有F和/或Cl原子的气体的存在下进行去除过程。

4. 发明申请

WO1997017166A1 LASER STRIPPING IMPROVEMENT BY MODIFIED GAS COMPOSITION 审中-公开
标题翻译：改性气体组合物的激光剥离改进
公开(公告)号：WO1997017166A1
公开(公告)日：1997-05-15
申请号：PCT/IL1996000138
申请日：1996-11-04
申请人： ORAMIR SEMICONDUCTOR EQUIPMENT LTD. , LIVSHITS (BUYANER), Boris , GENUT, Menachem , TEHAR-ZAHAV, Ofer
发明人： ORAMIR SEMICONDUCTOR EQUIPMENT LTD.
IPC分类号： B23K26/12
CPC分类号： B23K26/123 , B23K26/125 , B23K26/126 , G03F7/42
摘要： A method and apparatus for accelerating a laser stripping process carried out in a reactive gas mixture, comprising carrying out the stripping process in the presence of an accelerating effective amount of NxOy gas.
摘要翻译：一种用于加速在反应性气体混合物中进行的激光剥离过程的方法和装置，包括在加速有效量的N x O y气体的存在下进行汽提过程。

5. 发明申请

WO1996006692A1 CLEAINING OF PRINTED CIRCUIT BOARDS 审中-公开
标题翻译：打印电路板的清除
公开(公告)号：WO1996006692A1
公开(公告)日：1996-03-07
申请号：PCT/US1995010928
申请日：1995-08-29
申请人： UVTECH SYSTEMS, INC.
发明人： UVTECH SYSTEMS, INC. , ELLIOTT, David, J. , HOLLMAN, Richard, F. , YANS, Francis, M. , SINGER, Daniel, K. , WHITTEN, George, D.
IPC分类号： B08B03/08
CPC分类号： B23K26/147 , B08B7/0042 , B08B7/0057 , B23K26/0661 , B23K26/0732 , B23K26/0738 , B23K26/12 , B23K26/1224 , B23K26/123 , B23K26/126 , B23K26/127 , B23K26/14 , B23K26/142 , G02F1/1333 , G03F7/42 , G11B7/26 , H01L21/4864 , H05K3/0055 , H05K3/26 , H05K3/288 , H05K2203/087 , H05K2203/107 , H05K2203/1105
摘要： Printed circuit boards (2) are cleaned in the course of fabrication by providing a flowing gas (10), including a reactant, and delivering pulsed radiation (6) to the surface of the printed circuit board in the presence of the flowing gas (10), such that the absorbed contamination is reacted and removed.
摘要翻译：印刷电路板（2）在制造过程中通过提供包括反应物的流动气体（10）和在流动气体（10）的存在下将脉冲辐射（6）输送到印刷电路板的表面而被清洁），使得吸收的污染物被反应和除去。

6. 发明申请

WO1995007152A1 SURFACE PROCESSING 审中-公开
标题翻译：表面加工
公开(公告)号：WO1995007152A1
公开(公告)日：1995-03-16
申请号：PCT/US1994009996
申请日：1994-09-02
申请人： UVTECH SYSTEMS, INC. , ELLIOTT, David, J. , HOLLMAN, Richard, F. , YANS, Francis, M. , SINGER, Daniel, K.
发明人： UVTECH SYSTEMS, INC.
IPC分类号： B08B03/00
CPC分类号： G11B23/505 , B08B7/0042 , B08B7/0057 , B23K26/06 , B23K26/0643 , B23K26/0648 , B23K26/066 , B23K26/0732 , B23K26/0738 , B23K26/12 , B23K26/123 , B23K26/125 , B23K26/126 , B23K26/127 , B23K26/14 , B23K26/1436 , B23K26/1438 , B23K26/1476 , C23G5/00 , G02F1/1333 , G02F2001/133357 , G03F7/2043 , G03F7/42 , G11B5/3163 , G11B5/41 , G11B7/26 , G11B23/0057 , H01L21/02046 , H01L21/02049 , H01L21/02052 , H01L21/31116 , H01L21/31138 , H01L21/4864 , H01L21/67028 , H05K3/26 , H05K3/288 , H05K2203/087 , H05K2203/107 , H05K2203/1105
摘要： Foreign material (10) on a surface of a substrate (12) is processed to form a reaction product (16), by the combination of providing a directed flow of a fluid (18), including a reactant, in the vicinity of the foreign material (10), and delivering a beam of radiation (14) to aid the reactant to react with the foreign material (10) to form the reaction product (16).
摘要翻译：处理基材（12）表面上的异物（10）以形成反应产物（16），通过在外部附近提供包含反应物的流体（18）的定向流动材料（10），并且传送辐射束（14）以帮助反应物与异物（10）反应以形成反应产物（16）。

7. 发明申请

WO2015034646A1 METHOD FOR FORMING THREE-DIMENSIONAL ANCHORING STRUCTURES ON A SURFACE BY PROPAGATING ENERGY THROUGH A MULTI-CORE FIBER 审中-公开
标题翻译：通过多芯纤维传播能量来形成表面三维锚固结构的方法
公开(公告)号：WO2015034646A1
公开(公告)日：2015-03-12
申请号：PCT/US2014/051169
申请日：2014-08-15
申请人： SIEMENS ENERGY, INC.
发明人： BRUCK, Gerald J. , KAMEL, Ahmed
IPC分类号： B23K26/00 , B23K26/06 , B23K26/08 , F01D5/28 , C23C28/00
CPC分类号： F01D5/326 , B23K20/10 , B23K26/0006 , B23K26/0078 , B23K26/0081 , B23K26/0084 , B23K26/0608 , B23K26/0613 , B23K26/0622 , B23K26/08 , B23K26/082 , B23K26/1224 , B23K26/123 , B23K26/126 , B23K2201/001 , B23K2203/02 , B23K2203/172 , B23K2203/50 , B23K2203/52 , F01D5/282 , F01D5/288 , F01D9/02 , F05D2220/32 , F05D2230/13 , F05D2230/90
摘要： A method for forming three-dimensional anchoring structures on a surface is provided. This method may result in a thermal barrier coating system exhibiting enhanced adherence for its constituent coatings. The method involves applying a first laser beam (20) through a first portion (7) of a multi-core fiber (4) to a surface (12) of a solid material (14) to form a liquefied bed (16) on the surface (12) of the solid material (14), then applying a pulse of laser energy (24) through a second portion (6) of the multi-core fiber (4) to a portion of the liquefied bed (16) to cause a disturbance, such as a splash (28) of liquefied material outside the liquefied bed (16). A three-dimensional anchoring structure (30) may thus be formed on the surface (12) upon solidification of the splash (28) of the liquefied material.
摘要翻译：提供了一种在表面上形成三维锚固结构的方法。该方法可以导致对其组成涂层表现出增强的粘附性的热障涂层系统。该方法包括将第一激光束（20）穿过多芯纤维（4）的第一部分（7）施加到固体材料（14）的表面（12）上，以形成液化床（14）的表面（12），然后将激光能量（24）的脉冲通过多芯纤维（4）的第二部分（6）施加到液化床（16）的一部分，以引起例如在液化床（16）外的液化物质飞溅物（28）的扰动。因此，液化材料的飞溅物（28）固化后，可以在表面（12）上形成三维锚固结构（30）。

8. 发明申请

WO2015004794A1 摩擦攪拌接合方法および摩擦攪拌接合装置审中-公开
标题翻译：用于摩擦焊接的方法和用于摩擦焊接的装置
公开(公告)号：WO2015004794A1
公开(公告)日：2015-01-15
申请号：PCT/JP2013/069094
申请日：2013-07-12
申请人：株式会社日立製作所
发明人：杉本　一等 , 平野　聡
IPC分类号： B23K20/12
CPC分类号： B23K20/24 , B23K20/122 , B23K20/233 , B23K20/26 , B23K26/126 , B23K2201/18 , B23K2203/04 , B23K2203/08 , B23K2203/14 , B23K2203/26 , H05B7/18
摘要：　非接合部材を接合する摩擦攪拌接合方法において、加熱熱源で前記非接合部材を加熱する工程と、加熱された前記非接合部材の表面を平滑部品で均す工程と、均された前記非接合部材の表面を回転工具で摩擦攪拌接合する工程とを備える。
摘要翻译：一种用于焊接非焊接部件的摩擦搅拌焊接方法，其中，所述方法包括使用加热源加热所述非焊接部件的步骤，使用平滑部件使所述加热的非焊接部件的表面平滑的工序，以及使用旋转工具摩擦搅拌焊接非焊接部件的平滑表面的步骤。

9. 发明申请

WO2014056479A3 METHOD FOR NANO-STUCTURING POLMER MATERIALS USING PULSED LASER RADIATION IN A REACTIVE ATMOSPHERE 审中-公开
标题翻译：在活性大气中用脉冲激光辐照纳米结构聚合物材料的方法
公开(公告)号：WO2014056479A3
公开(公告)日：2014-06-05
申请号：PCT/DE2013000584
申请日：2013-10-10
申请人： EADS DEUTSCHLAND GMBH
发明人： BRANDL ERHARD , KURTOVIC ANTE , MERTENS TOBIAS
IPC分类号： B23K26/00 , B23K26/12
CPC分类号： B29C59/16 , A61F2002/0081 , A61L27/34 , A61L2400/18 , B23K26/0006 , B23K26/0078 , B23K26/0622 , B23K26/126 , B23K2203/16 , B23K2203/42 , B23K2203/50 , B23K2203/52
摘要： The invention relates to a method for producing a surface comprising a solid polymer material, said surface having surface structures with measurements in the sub-micro range. According to the invention, the non-treated surface on which the structures are to be produced and which can be reached by the laser radiation, is scanned once or several times using pulsed laser radiation in a reactive gas atmosphere in such a manner that adjacent light flecks of the laser radiation are next to each other without an interspace or overlap and a defined range of a predetermined relation between method parameters is maintained, siad surfaces being therefor chemically modified.
摘要翻译：在用于生产具有亚微米表面纹理特征的固体聚合物材料表面的方法中，要在其上形成结构并且适于激光照射的未处理表面变得与脉冲激光束气体气氛扫描一次或多次，使得激光束的相邻光点邻接无间隙或重叠，并且满足工艺参数之间的预定关系的一定范围，由此表面被化学改性。

10. 发明申请

WO1996006694A1 SURFACE MODIFICATION PROCESSING OF FLAT PANEL DEVICE SUBSTRATES 审中-公开
标题翻译：平板设备基板的表面改性处理
公开(公告)号：WO1996006694A1
公开(公告)日：1996-03-07
申请号：PCT/US1995011002
申请日：1995-08-29
申请人： UVTECH SYSTEMS, INC.
发明人： UVTECH SYSTEMS, INC. , ELLIOTT, David, J. , HOLLMAN, Richard, F. , YANS, Francis, M. , SINGER, Daniel, K.
IPC分类号： B08B03/08
CPC分类号： H01L21/02046 , B08B7/0042 , B08B7/0057 , B23K26/066 , B23K26/0732 , B23K26/0738 , B23K26/12 , B23K26/123 , B23K26/126 , B23K26/14 , B23K26/142 , B23K26/1462 , G02F1/1333 , G03F7/42 , H01L21/02049 , H01L21/4864 , H05K3/26 , H05K3/288 , H05K2203/087 , H05K2203/107 , H05K2203/1105
摘要： A method for performing surface processing of flat panel display substrates at various points during manufacturing. Such processing is required, for example, to remove photoresist after a photolithography step. Cleaning of glass substrates at the beginning of the manufacturing sequence is also required. Some layers of the device, for example color filters and polyimide alignment layers, may be patterned by this method by the use of a mask (54) in the surface processing. A high intensity pulsed beam of radiation (18) is swept across the surface to be processed (21), while a reactive gas (24) is flowed across the surface where the beam strikes it. In a cleaning or material removal process, the beam of radiation (18) causes the material to react with the gas, resulting in gaseous products (26) which are drawn away from the surface. In a curing process, for polyimide or spin-on dielectric, for example, the beam of radiation (60) causes the polymer to cross-link, while the flowing gas (64) assists in the reaction and removal of species which are released in the cross linking process. Processing of a substrate (74) can be accomplished by translating the substrate (74) under a beam (60) which is larger than the width of the substrate. Processing may be accomplished by multiple scans of the surface or by scanning with multiple beams.
摘要翻译：一种用于在制造过程中在各个点执行平板显示器基板的表面处理的方法。需要这样的处理，例如，在光刻步骤之后去除光致抗蚀剂。还需要在制造顺序开始时清洁玻璃基板。可以通过在表面处理中使用掩模（54）的这种方法来对器件的一些层，例如滤色器和聚酰亚胺取向层进行构图。高强度脉冲的辐射束（18）扫过待处理表面（21），而反应气体（24）流过横梁撞击的表面。在清洁或材料去除过程中，辐射束（18）使材料与气体反应，导致气体产物（26）从表面拉出。在固化过程中，例如，对于聚酰亚胺或旋涂电介质，辐射束（60）使聚合物交联，而流动的气体（64）有助于反应和去除被释放的物质交联过程。可以通过将衬底（74）在大于衬底的宽度的光束（60）下方平移来实现衬底（74）的处理。处理可以通过表面的多次扫描或通过用多个波束扫描来完成。

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