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    • 1. 发明申请
    • INFRARED EXTERNAL PHOTOEMISSIVE DETECTOR
    • 红外外部光电检测探测器
    • WO2011094558A3
    • 2011-12-01
    • PCT/US2011022948
    • 2011-01-28
    • UNIV HOWARDBATES CLAYTON W JR
    • BATES CLAYTON W JR
    • H01L31/109H01L31/09
    • H01L31/035209H01J1/34H01J31/49H01L31/108
    • An infrared external photoemissive detector can have an n-p heterojunction comprising an n-type semiconductor layer and a p-layer; the n-layer semiconductor comprising doped silicon embedded with nanoparticles forming Schottky barriers; and the p-layer is a p-type diamond film. The nanoparticles can be about 20 - 30 atomic percentage metal particles (such as silver) having an average particle size of about 5 - 10 nm. The p-layer can have a surface layer that has a negative electron affinity. The n-layer can be in the range of about 3 µm to 10 µm thick, and preferably about 3 µm thick. The doped silicon can be doped with elements selected from the list consisting of phosphorus and antimony.
    • 红外外部光发射检测器可以具有包括n型半导体层和p层的n-p异质结; 所述n层半导体包括嵌入有形成肖特基势垒的纳米颗粒的掺杂硅; 并且p层是p型金刚石膜。 纳米颗粒可以是平均粒径为约5-10nm的约20-30原子百分比的金属颗粒(例如银)。 p层可以具有负电子亲和力的表面层。 n层可以在约3μm至10μm厚的范围内,并且优选地约3μm厚。 掺杂的硅可以掺杂选自由磷和锑组成的列表中的元素。