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    • 8. 发明申请
    • DECODING CIRCUIT FOR NON-BINARY GROUPS OF MEMORY LINE DRIVERS
    • 解码存储线驱动器非二进制组的电路
    • WO2006107409A3
    • 2007-04-19
    • PCT/US2006005067
    • 2006-02-14
    • SANDISKSCHEUERLEIN ROY EPETTI CHRISTOPHER JFASOLI LUCA G
    • SCHEUERLEIN ROY EPETTI CHRISTOPHER JFASOLI LUCA G
    • G11C11/34
    • G11C8/10G11C5/063G11C8/08G11C8/14
    • A decoding circuit for non-binary groups of memory line drivers is disclosed. In one embodiment, an integrated circuit is disclosed comprising a binary decoder and circuitry operative to perform a non-binary arithmetic operation, wherein a result of the non-binary arithmetic operation is provided as input to the binary decoder. In another embodiment, an integrated circuit is disclosed comprising a memory array comprising a plurality of array lines, a non-integral-power-of-two number of array line driver circuits, and control circuitry configured to select one of the array line driver circuits. The control circuitry can comprise a binary decoder and a pre-decoder portion that performs a non-binary arithmetic operation. The concepts described herein may be used alone or in combination.
    • 公开了一种用于非二进制组的存储器线驱动器的解码电路。 在一个实施例中,公开了一种集成电路,其包括二进制解码器和用于执行非二进制算术运算的电路,其中非二进制算术运算的结果被提供作为二进制解码器的输入。 在另一个实施例中,公开了一种集成电路,其包括存储器阵列,该存储器阵列包括多个阵列线,两个非整数倍数的阵列线驱动器电路,以及控制电路,被配置为选择阵列线驱动电路之一 。 控制电路可以包括执行非二进制算术运算的二进制解码器和预解码器部分。 本文所述的概念可以单独使用或组合使用。
    • 9. 发明申请
    • METHOD FOR REDUCING DIELECTRIC OVERETCH WHEN MAKING CONTACT TO CONDUCTIVE FEATURES
    • 在制造与导电特性接触时减少电介质覆盖物的方法
    • WO2006104817A3
    • 2006-11-23
    • PCT/US2006010520
    • 2006-03-21
    • SANDISK 3D LLCPETTI CHRISTOPHER J
    • PETTI CHRISTOPHER J
    • H01L21/768H01L27/102
    • H01L21/768H01L21/76801H01L21/76802H01L21/76829H01L23/5252H01L2924/0002H01L2924/00
    • In a first preferred embodiment of the present invention, conductive features (44) are formed on a first dielectric etch stop layer (40) , and a second dielectric material (48) is deposited over and between the conductive features. A via etch to the conductive features which is selective between the first and second dielectrics will stop on the dielectric etch stop layer, limiting overetch. In a second embodiment, a plurality of conductive features (64) is formed in a subtractive pattern and etch process, filled with a dielectric fill (68) , and then a surface formed coexposing the conductive features and dielectric fill. A dielectric etch stop layer (72) is deposited on the surface, then a third dielectric (74) covers the dielectric etch stop layer. When a contact (76) is etched through the third dielectric, this selective etch stops on the dielectric etch stop layer. A second etch makes contact to the conductive features .
    • 在本发明的第一优选实施例中,导电特征(44)形成在第一介电蚀刻停止层(40)上,并且第二电介质材料(48)沉积在导电特征之上并且在导电特征之间。 在第一和第二电介质之间选择性的导电特征的通孔蚀刻将停止在电介质蚀刻停止层上,限制过蚀刻。 在第二实施例中,多个导电特征(64)以消减图案和蚀刻工艺形成,填充有电介质填充物(68),然后形成为与导电特征和电介质填充物共同构成的表面。 电介质蚀刻停止层(72)沉积在表面上,则第三电介质(74)覆盖电介质蚀刻停止层。 当通过第三电介质蚀刻触点(76)时,该选择性蚀刻停止在电介质蚀刻停止层上。 第二蚀刻与导电特征接触。