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1. 发明申请

WO2018128963A1 183 NM CW LASER AND INSPECTION SYSTEM 审中-公开
公开(公告)号：WO2018128963A1
公开(公告)日：2018-07-12
申请号：PCT/US2018/012031
申请日：2018-01-02
申请人： KLA-TENCOR CORPORATION
发明人： CHUANG, Yung-Ho Alex , LU, Xiaoxu , ZHANG, Baigang , FIELDEN, John , DRIBINSKI, Vladimir
IPC分类号： H01S3/109 , H01S3/23 , H01S3/16 , H01L21/66
摘要： A laser assembly generates continuous (CW) laser output light in the range of approximately 181 nm to approximately 185 nm by generating fourth harmonic light from first fundamental CW light having a first fundamental wavelength between 1 µm and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and then mixing the fifth harmonic light with second fundamental or signal CW light having a second wavelength between 1.26 µm and 1.82 µm. The fifth harmonic light is generated using an external cavity that circulates first fundamental CW light through a first nonlinear crystal, and by directing the fourth harmonic light through the first nonlinear crystal. The laser output light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.

2. 发明申请

WO2015142677A1 AN IMAGE SENSOR, AN INSPECTION SYSTEM AND A METHOD OF INSPECTING AN ARTICLE 审中-公开
标题翻译：图像传感器，检查系统和检查方法
公开(公告)号：WO2015142677A1
公开(公告)日：2015-09-24
申请号：PCT/US2015/020610
申请日：2015-03-13
申请人： KLA-TENCOR CORPORATION
发明人： CHUANG, Yung-Ho Alex , ZHANG, Jingjing , FIELDEN, John
IPC分类号： H01L27/146 , H01L21/66
CPC分类号： H01L27/14632 , G01N21/8806 , G01N21/9501 , G01N2201/061 , G01N2201/0638 , G01N2201/12 , H01L27/14609 , H01L27/1461 , H01L27/14612 , H01L27/1462 , H01L27/1464 , H01L27/14643 , H01L27/14645 , H01L27/14647 , H01L27/14681 , H01L27/14685 , H01L27/14687 , H01L27/14689 , H01L27/14698 , H01L27/14825 , H01L27/14831 , H01L27/14856 , H01L31/028 , H01L31/107 , H01L31/1804
摘要： A high sensitivity image sensor comprises an epitaxial layer of silicon that is intrinsic or lightly p doped (such as a doping level less than about 1013 cm-3). CMOS or CCD circuits are fabricated on the front-side of the epitaxial layer. Epitaxial p and n type layers are grown on the backside of the epitaxial layer. A pure boron layer is deposited on the n-type epitaxial layer. Some boron is driven a few nm into the n-type epitaxial layer from the backside during the boron deposition process. An anti-reflection coating may be applied to the pure boron layer. During operation of the sensor a negative bias voltage of several tens to a few hundred volts is applied to the boron layer to accelerate photo-electrons away from the backside surface and create additional electrons by an avalanche effect. Grounded p-wells protect active circuits as needed from the reversed biased epitaxial layer.
摘要翻译：高灵敏度图像传感器包括硅的外延层，其是固有的或轻掺杂的（例如掺杂水平小于约1013cm-3）。 CMOS或CCD电路制造在外延层的前侧。外延p和n型层生长在外延层的背面。在n型外延层上沉积纯硼层。在硼沉积过程中，一些硼从背面被驱动到几nm的n型外延层中。可以将抗反射涂层施加到纯硼层。在传感器的操作期间，将数十至几百伏的负偏压施加到硼层，以加速光电子远离背面，并通过雪崩效应产生额外的电子。接地的p阱可以根据需要从反向偏置的外延层保护有源电路。

3. 发明申请

WO2014127100A1 193NM LASER AND INSPECTION SYSTEM 审中-公开
标题翻译： 193NM激光和检测系统
公开(公告)号：WO2014127100A1
公开(公告)日：2014-08-21
申请号：PCT/US2014/016198
申请日：2014-02-13
申请人： KLA-TENCOR CORPORATION
发明人： CHUANG, Yung-Ho Alex , ARMSTRONG, J.Joseph , DENG, Yujun , LIOU, Justin Dianhuan , DRIBINSKI, Vladimir , FIELDEN, John
IPC分类号： H01S3/109 , H01S3/13
CPC分类号： H01S3/302 , G01N21/9501 , G02B17/0892 , G02F1/353 , G02F1/395 , G02F2001/354 , H01S3/005 , H01S3/0092 , H01S3/067 , H01S3/06754 , H01S3/10053 , H01S3/11 , H01S3/16 , H01S3/1643 , H01S3/1666 , H01S3/23 , H01S3/2308
摘要： An improved solid-state laser for generating sub-200nm light is described. This laser uses a fundamental wavelength between about 1030nm and 1065nm to generate the sub-200nm light. The final frequency conversion stage of the laser creates the sub-200nm light by mixing a wavelength of approximately 1109nm with a wavelength of approximately 234nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.
摘要翻译：描述了用于产生亚200nm光的改进的固态激光器。该激光器使用约1030nm和1065nm之间的基本波长来产生亚200nm的光。激光的最终变频阶段通过将约1109nm的波长与约234nm的波长混合而产生亚200nm的光。通过适当选择非线性介质，可以通过几乎非关键的相位匹配来实现这种混合。这种混合导致高转换效率，良好的稳定性和高可靠性。

4. 发明申请

WO2014089020A1 SEMICONDUCTOR INSPECTION AND METROLOGY SYSTEM USING LASER PULSE MULTIPLIER 审中-公开
标题翻译：使用激光脉冲放大器的半导体检测和计量系统
公开(公告)号：WO2014089020A1
公开(公告)日：2014-06-12
申请号：PCT/US2013/072774
申请日：2013-12-03
申请人： KLA-TENCOR CORPORATION
发明人： CHUANG, Yung-Ho Alex , LIOU, Justin Dianhuan , ARMSTRONG, J., Joseph , DENG, Yujun
IPC分类号： H01L21/66
CPC分类号： H01S3/005 , C23C16/00 , G02B17/00 , G02B17/0848 , G02B27/00 , G02B27/108 , H01S3/00 , H01S3/10
摘要： A pulse multiplier includes a beam splitter and one or more mirrors. The beam splitter receives a series of input laser pulses and directs part of the energy of each pulse into a ring cavity. After circulating around the ring cavity, part of the pulse energy leaves the ring cavity through the beam splitter and part of the energy is recirculated. By selecting the ring cavity optical path length, the repetition rate of an output series of laser pulses can be made to be a multiple of the input repetition rate. The relative energies of the output pulses can be controlled by choosing the transmission and reflection coefficients of the beam splitter. This pulse multiplier can inexpensively reduce the peak power per pulse while increasing the number of pulses per second with minimal total power loss.
摘要翻译：脉冲倍增器包括分束器和一个或多个反射镜。分束器接收一系列输入激光脉冲并将每个脉冲的能量的一部分引导到环形腔中。在环形腔周围循环后，部分脉冲能量通过分束器离开环形空腔，部分能量被再循环。通过选择环腔光路长度，可以将输出系列激光脉冲的重复率设为输入重复率的倍数。可以通过选择分束器的透射和反射系数来控制输出脉冲的相对能量。该脉冲倍增器可以以最小的总功率损耗来降低每脉冲的峰值功率，同时增加每秒的脉冲数。

5. 发明申请

WO2011028807A2 METROLOGY SYSTEMS AND METHODS 审中-公开
标题翻译：计量系统和方法
公开(公告)号：WO2011028807A2
公开(公告)日：2011-03-10
申请号：PCT/US2010/047539
申请日：2010-09-01
申请人： KLA-TENCOR CORPORATION , KANDEL, Daniel , LEVINSKI, Vladimir , SVIZHER, Alexander , SELIGSON, Joel , HILL, Andrew , BACHAR, Ohad , MANASSEN, Amnon , CHUANG, Yung-Ho Alex , SELA, Ilan , MARKOWITZ, Moshe , NEGRI, Daria , ROTEM, Efraim
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , SVIZHER, Alexander , SELIGSON, Joel , HILL, Andrew , BACHAR, Ohad , MANASSEN, Amnon , CHUANG, Yung-Ho Alex , SELA, Ilan , MARKOWITZ, Moshe , NEGRI, Daria , ROTEM, Efraim
IPC分类号： H01L21/66
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided.
摘要翻译：
提供了各种计量系统和方法。

6. 发明申请

WO2018144958A1 INSPECTION AND METROLOGY USING BROADBAND INFRARED RADIATION 审中-公开
公开(公告)号：WO2018144958A1
公开(公告)日：2018-08-09
申请号：PCT/US2018/016760
申请日：2018-02-03
申请人： KLA-TENCOR CORPORATION
发明人： CHUANG, Yung-Ho Alex , ESFANDYARPOUR, Vahid , FIELDEN, John , ZHANG, Baigang , XIAOLI, Yinying
IPC分类号： G01N21/3563 , G01N21/95
摘要： Systems and methods for measuring or inspecting semiconductor structures using broadband infrared radiation are disclosed. The system may include an illumination source comprising a pump source configured to generate pump light and a nonlinear optical (NLO) assembly configured to generate broadband IR radiation in response to the pump light. The system may also include a detector assembly and a set of optics configured to direct the IR radiation onto a sample and direct a portion of the IR radiation reflected and/or scattered from the sample to the detector assembly.

7. 发明申请

WO2017031004A1 ELECTRON SOURCE 审中-公开
标题翻译：电子源
公开(公告)号：WO2017031004A1
公开(公告)日：2017-02-23
申请号：PCT/US2016/046901
申请日：2016-08-12
申请人： KLA-TENCOR CORPORATION
发明人： CHUANG, Yung-Ho Alex , XIAOLI, Yinying , LIU, Xuefeng , FIELDEN, John
IPC分类号： H01J1/304 , H01J9/02
CPC分类号： G03F7/70008 , H01J1/304 , H01J1/34 , H01J35/065 , H01J37/073 , H01J2201/30411 , H01J2201/3048 , H01J2237/0635
摘要： An electron source is formed on a silicon substrate having opposing first and second surfaces. At least one field emitter is prepared on the second surface of the silicon substrate to enhance the emission of electrons. To prevent oxidation of the silicon, a thin, contiguous boron layer is disposed directly on the output surface of the field emitter using a process that minimizes oxidation and defects. The field emitter can take various shapes such as pyramids and rounded whiskers. One or several optional gate layers may be placed at or slightly lower than the height of the field emitter tip in order to achieve fast and accurate control of the emission current and high emission currents. The field emitter can be p-type doped and configured to operate in a reverse bias mode or the field emitter can be n-type doped.
摘要翻译：在具有相对的第一和第二表面的硅衬底上形成电子源。在硅衬底的第二表面上制备至少一个场致发射体以增强电子的发射。为了防止硅的氧化，使用最小化氧化和缺陷的工艺将薄的连续的硼层直接设置在场致发射体的输出表面上。场发射器可以采取各种形状，例如金字塔和圆形晶须。一个或几个可选的栅极层可以放置在或稍低于场发射极尖端的高度，以便实现对发射电流和高发射电流的快速和准确的控制。场发射极可以是p型掺杂的并且被配置为以反偏压模式操作，或者场发射极可以是n型掺杂的。

8. 发明申请

WO2015021411A1 MULTI-SPOT ILLUMINATION FOR IMPROVED DETECTION SENSITIVITY 审中-公开
标题翻译：用于改善检测灵敏度的多点照明
公开(公告)号：WO2015021411A1
公开(公告)日：2015-02-12
申请号：PCT/US2014/050395
申请日：2014-08-08
申请人： KLA-TENCOR CORPORATION
发明人： CHUANG, Yung-Ho Alex , LU, Xiaoxu , FIELDEN, John , MALEEV, Ivan
IPC分类号： H01L21/66
CPC分类号： G01N21/9501 , G01J1/04 , G01N21/8806
摘要： Methods and systems for minimizing interference among multiple illumination beams generated from a non-uniform illumination source to provide an effectively uniform illumination profile over the field of view of an inspection system are presented. In some examples, a pulsed beam of light is split into multiple illumination beams such that each of the beams are temporally separated at the surface of the specimen under inspection. In some examples, multiple illumination beams generated from a non-uniform illumination source are projected onto spatially separated areas on the surface of the specimen. A point object of interest illuminated by each area is imaged onto the surface of a time-delay integration (TDI) detector. The images are integrated such that the relative position of the illumination areas along the direction of motion of the point object of interest has no impact on the illumination efficiency distribution over the field of view.
摘要翻译：提出了用于最小化由不均匀照明源产生的多个照明光束之间的干扰的方法和系统，以在检查系统的视场上提供有效均匀的照明轮廓。在一些示例中，脉冲光束被分成多个照明光束，使得每个光束在被检查的样品的表面处在时间上分离。在一些示例中，从不均匀照明源产生的多个照明光束投影到样本表面上的空间分离的区域上。由每个区域照亮的感兴趣的点对象被成像到时间延迟积分（TDI）检测器的表面上。图像被集成，使得沿着感兴趣点对象的运动方向的照明区域的相对位置对视场的照明效率分布没有影响。

9. 发明申请

WO2014169104A1 PASSIVATION OF NONLINEAR OPTICAL CRYSTALS 审中-公开
标题翻译：非线性光学晶体的钝化
公开(公告)号：WO2014169104A1
公开(公告)日：2014-10-16
申请号：PCT/US2014/033625
申请日：2014-04-10
申请人： KLA-TENCOR CORPORATION
发明人： DRIBINSKI, Vladimir , CHUANG, Yung-Ho Alex
IPC分类号： C23C16/44 , C23C16/52 , G02F1/35 , G01N21/88 , G01N21/95
CPC分类号： C30B33/02 , C30B7/00 , C30B9/00 , C30B29/10 , C30B29/22 , G01N21/87 , G01N21/9501 , G01N21/956 , G01N2021/8477 , Y10T117/1016 , Y10T117/1024
摘要： The passivation of a nonlinear optical crystal for use in an inspection tool includes growing a nonlinear optical crystal in the presence of at least one of fluorine, a fluoride ion and a fluoride-containing compound, mechanically preparing the nonlinear optical crystal, performing an annealing process on the nonlinear optical crystal and exposing the nonlinear optical crystal to a hydrogen-containing or deuterium-containing passivating gas.
摘要翻译：用于检查工具的非线性光学晶体的钝化包括：在氟，氟离子和含氟化合物中的至少一种存在下生长非线性光学晶体，机械地制备非线性光学晶体，进行退火处理在非线性光学晶体上并将非线性光学晶体暴露于含氢或含氘的钝化气体。

10. 发明申请

WO2013090261A1 ELECTRON-BOMBARDED CHARGE-COUPLED DEVICE AND INSPECTION SYSTEMS USING EBCCD DETECTORS 审中-公开
标题翻译：使用EBCCD检测器的电子支付充电耦合器件和检查系统
公开(公告)号：WO2013090261A1
公开(公告)日：2013-06-20
申请号：PCT/US2012/068944
申请日：2012-12-11
申请人： KLA-TENCOR CORPORATION
发明人： CHUANG, Yung-Ho Alex , LIU, Xuefeng , FIELDEN, John , BROWN, David L.
IPC分类号： H01J31/50
CPC分类号： G01N21/88 , G01N21/9501 , G01N2021/8822 , G01N2021/95676 , H01J31/26 , H01L27/14806 , H01L27/14818 , H01L27/14856
摘要： A focusing EBCCD includes a control device positioned between a photocathode and a CCD. The control device has a plurality of holes therein, wherein the plurality of holes are formed perpendicular to a surface of the photocathode, and wherein a pattern of the plurality of holes is aligned with a pattern of pixels in the CCD. Each hole is surrounded by at least one first electrode, which is formed on a surface of the control device facing the photocathode. The control device may include a plurality of ridges between the holes. The control device may be separated from the photocathode by approximately half a shorter dimension of a CCD pixel or less. A plurality of first electrodes may be provided, wherein each first electrode surrounds a given hole and is separated from the given hole by a gap.
摘要翻译：聚焦EBCCD包括位于光电阴极和CCD之间的控制装置。控制装置具有多个孔，其中多个孔垂直于光电阴极的表面形成，并且其中多个孔的图案与CCD中的像素图案对准。每个孔被形成在面向光电阴极的控制装置的表面上的至少一个第一电极包围。控制装置可以包括孔之间的多个脊。控制装置可以与光电阴极分离CCD像素的大约一半的较短尺寸或更小。可以提供多个第一电极，其中每个第一电极围绕给定的孔并且通过间隙与给定的孔分离。

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