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1. 发明申请

WO2018043976A1 SUBSTRATE PROCESSING APPARATUS 审中-公开
标题翻译：基板处理装置
公开(公告)号：WO2018043976A1
公开(公告)日：2018-03-08
申请号：PCT/KR2017/009107
申请日：2017-08-22
申请人： JUSUNG ENGINEERING CO., LTD.
发明人： SHIN, Seung Chul , YOO, Jin Hyuk , LEE, Min Su , CHOI, Dong Hwan
IPC分类号： H01L21/027 , H01L21/687 , H01L21/683
摘要： A substrate processing apparatus may include a first disk provided in a chamber and configured to perform a turning motion and to include a plurality of seating holes periodically arranged within a specific radius from a center axis, a plurality of second disks provided in the seating holes, respectively, and configured to perform a revolving and rotating motion in accordance with the turning motion of the first disk, a first rotary connector structure provided between the second disk and the seating hole to allow for a rotating motion of and for an electric connection to the second disk, an electrostatic chuck provided on the second disk and configured to hold a substrate using an electric power supplied through the first rotary connector structure, and a first magnetic gear fixed to the second disk and configured to exert a torque on the second disk, and a second magnetic gear provided in the chamber to be interact with the first magnetic gear but prevented from turning.
摘要翻译：衬底处理设备可以包括：第一盘，其设置在腔室中并且被配置为执行转动运动并且包括多个从中心轴线以特定半径周期性地布置的座孔;多个第二盘，所述第二盘分别设置在所述座孔中，并且构造成根据所述第一盘的转动运动进行旋转和旋转运动;第一旋转连接器结构，设置在所述第二盘和所述座孔之间以允许旋转运动用于与所述第二盘片电连接;静电卡盘，其设置在所述第二盘片上并且被配置为利用通过所述第一旋转连接器结构提供的电力来保持衬底;以及第一磁齿轮，其被固定到所述第二盘片并且被配置为在第二盘上施加扭矩，并且设置在腔室中的第二磁齿轮与第一磁齿轮相互作用但防止转动

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