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1. 发明申请

WO2010033194A1 HIGH POWER SEED/AMPLIFIER LASER SYSTEM WITH BEAM SHAPING INTERMEDIATE THE SEED AND AMPLIFIER 审中-公开
标题翻译：具有光束形状的高功率种子/放大器激光系统中间种子和放大器
公开(公告)号：WO2010033194A1
公开(公告)日：2010-03-25
申请号：PCT/US2009/005171
申请日：2009-09-16
申请人： CYMER, INC. , SANDSTROM, Richard, L. , BROWN, Daniel, J. W. , HOFMANN, Thomas , ROBINSON, Jason, D. , UNICK, Craig, W.
发明人： SANDSTROM, Richard, L. , BROWN, Daniel, J. W. , HOFMANN, Thomas , ROBINSON, Jason, D. , UNICK, Craig, W.
IPC分类号： H01S3/22
CPC分类号： C30B13/24 , B23K26/0622 , B23K26/0738 , C30B29/06 , H01L21/67115
摘要： An apparatus and method of operation for a high power broad band elongated thin beam laser annealing light source, which may comprise a gas discharge seed laser oscillator having a resonance cavity, providing a seed laser output pulse; a gas discharge amplifier laser amplifying the seed laser output pulse to provide an amplified seed laser pulse output; a divergence correcting multi-optical element optical assembly intermediate the seed laser and the amplifier laser. The divergence correcting optical assembly may adjust the size and/or shape of the seed laser output pulse within a discharge region of the amplifier laser in order to adjust an output parameter of the amplified seed laser pulse output. The divergence correcting optical assembly may comprise a telescope with an adjustable focus. The adjustable telescope may comprise an active feedback-controlled actuator based upon a sensed parameter of the amplified seed laser output from the amplifier laser.
摘要翻译：一种用于大功率宽带细长光束激光退火光源的装置和方法，其可以包括具有谐振腔的气体放电种子激光振荡器，提供种子激光输出脉冲; 气体放电放大器激光器，放大种子激光输出脉冲，以提供放大的种子激光脉冲输出; 种子激光器和放大器激光器之间的发散校正多光学元件光学组件。发散校正光学组件可以在放大器激光器的放电区域内调整种子激光器输出脉冲的尺寸和/或形状，以便调节放大的种子激光脉冲输出的输出参数。发散校正光学组件可以包括具有可调焦点的望远镜。可调节望远镜可以包括基于从放大器激光器输出的放大的种子激光器的感测参数的主动反馈控制致动器。

2. 发明申请

WO2005089130A3 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2005089130A3
公开(公告)日：2005-09-29
申请号：PCT/US2005/007056
申请日：2005-03-03
申请人： CYMER, INC. , AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
IPC分类号： H01J35/20
摘要： An EUV light source apparatus (20) comprises a pulse laser (22) providing laser pulses (55) at a selected pulse repetition rate focused at a desired target ignition site (28); a target formation system (92) providing discrete targets (94); a target steering system (350) intermediate the target formation system (92) and the ignition site (28); a target tracking system (42) providing information about movement of the target (94) between the target formation system (92) and the target steering system (350); an electrostatic plasma containment apparatus (314) providing an electric plasma confinement field (316) at or near the ignition site (28) at the time of ignition; a vessel (30) having an intermediate wall (282) for passing EUV light; and a magnetic plasma confinement mechanism (329) creating a magnetic field (320) in the vicinity of the ignition site (28).

3. 发明申请

WO2002099938A1 INJECTION SEEDED F2 LASER WITH LINE SELECTION AND DISCRIMINATION 审中-公开
标题翻译：注射种子F2激光与线选择和歧视
公开(公告)号：WO2002099938A1
公开(公告)日：2002-12-12
申请号：PCT/US2002/021867
申请日：2002-04-03
申请人： CYMER, INC. , ONKELS, Eckehard, D. , SANDSTROM, Richard, L. , NESS, Richard, M. , PARTLO, William, N. , ERSHOV, Alexander, I. , OH, Choonghoon
发明人： ONKELS, Eckehard, D. , SANDSTROM, Richard, L. , NESS, Richard, M. , PARTLO, William, N. , ERSHOV, Alexander, I. , OH, Choonghoon
IPC分类号： H01S3/10
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70483 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/082 , H01S3/0835 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/10092 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2325 , H01S3/2366
摘要： A narrow band F 2 laser system having two laser subsystems. The first laser subsystem is a seed laser (100) and provides a very narrow band pulsed beam at a first narrow wavelength range corresponding to a first natural emission line of the F 2 laser system. This beam is injected into the gain medium of the second laser subsystem (102) in a first direction where the beam is amplified to produce a narrow band pulsed output beam. The seed laser (100) also produces a second pulsed beam at a second wavelength range corresponding to a second natural emission line of the F 2 laser. This line is injected into the gain medium of the second laser subsystem (102) in a second direction opposite said first direction. The second beam is amplified in the gain medium of the second laser subsystem of the second laser subsystem and depletes the gain medium of gain potential at the second wavelength range. Thus, the portion of light at the second wavelength range in the output beam (124) is greatly reduced.
摘要翻译：具有两个激光子系统的窄带F2激光系统。第一激光子系统是种子激光器（100），并且在对应于F2激光系统的第一自然发射线的第一窄波长范围处提供非常窄的带状脉冲光束。该光束在第一方向上被注入到第二激光子系统（102）的增益介质中，其中该光束被放大以产生窄带脉冲输出光束。种子激光器（100）还在对应于F2激光器的第二自然发射线的第二波长范围上产生第二脉冲光束。该线在与第一方向相反的第二方向上被注入到第二激光子系统（102）的增益介质中。第二光束在第二激光子系统的第二激光子系统的增益介质中被放大，并且在第二波长范围消耗增益电位的增益介质。因此，输出光束（124）中第二波长范围内的光的部分大大减小。

4. 发明申请

WO2002093700A1 LASER SPECTRAL ENGINEERING FOR LITHOGRAPHIC PROCESS 审中-公开
标题翻译：激光光谱工程用于光刻工艺
公开(公告)号：WO2002093700A1
公开(公告)日：2002-11-21
申请号：PCT/US2002/012396
申请日：2002-04-19
申请人： CYMER, INC. , KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor , DAS, Palash, P. , SANDSTROM, Richard, L. , ALGOTS, John, M. , AHMED, Khurshid
发明人： KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor , DAS, Palash, P. , SANDSTROM, Richard, L. , ALGOTS, John, M. , AHMED, Khurshid
IPC分类号： H01S3/10
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： An integrated circuit lithograohy technique (pectral engineering) for bandwidth control of an electric discharge laser. A computer models lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism (104) adjusts the center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks to produce improved pattern resolution in photo resits film. Line narrowing equipment (106) is provided having at least one piezoelectric drive and a fast banwidth detection control system having a time response of less than about 2.0 millisecond. A wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser.
摘要翻译：一种用于放电激光器带宽控制的集成电路光栅技术（pectral engineering）。计算机模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。快速响应调谐机构（104）以脉冲串脉冲调整激光脉冲的中心波长，以实现接近期望激光光谱的积分光谱。控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以在照相胶片中产生改进的图案分辨率。线路缩窄设备（106）具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速禁带检测控制系统。波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。

5. 发明申请

WO2002082598A1 INJECTION SEEDED F2 LASER WITH PRE-INJECTED FILTER 审中-公开
标题翻译：注射用预先注入的过滤器填充F2激光
公开(公告)号：WO2002082598A1
公开(公告)日：2002-10-17
申请号：PCT/US2002/010734
申请日：2002-04-04
申请人： CYMER, INC. , SANDSTROM, Richard, L. , PARTLO, William, N. , ONKELS, Eckehard, D.
发明人： SANDSTROM, Richard, L. , PARTLO, William, N. , ONKELS, Eckehard, D.
IPC分类号： H01S3/10
CPC分类号： H01S3/10092 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/0078 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08063 , H01S3/08068 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2325 , H01S3/2333 , H01S3/2366
摘要： A narrow band F 2 laser system useful for integrated circuit lithography. An output beam from a first F 2 laser gain medium (master oscillator) is filtered with a pre-gain filter to produce a seed beam having a bandwidth of about 0.1 pm or less. The seed beam is amplified in a power gain stage which includes a second F 2 laser gain medium. The output beam of the system is a pulsed laser beam with a full width half maximum band width of about 0.1 pm or less with pulse energy in excess of about 5 mJ. In a preferred embodiment the pre-gain filter includes a wavelength monitor that permits feedback control over the centreline wavelength so that the pre-gain filter optics can be adjusted to ensure that the desired bandwidth range is injected into the power gain stage.
摘要翻译：用于集成电路光刻的窄带F2激光系统。来自第一F2激光增益介质（主振荡器）的输出光束用预增益滤波器滤波，以产生具有约0.1μm或更小带宽的种子光束。种子束在包括第二F2激光增益介质的功率增益级中被放大。系统的输出光束是具有约0.1μm或更小的全宽半最大带宽的脉冲激光束，脉冲能量超过约5mJ。在优选实施例中，预增益滤波器包括允许对中心线波长进行反馈控制的波长监视器，使得可以调整预增益滤波器光学器件，以确保将期望的带宽范围注入功率增益级。

6. 发明申请

WO2002069461A1 LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER 审中-公开
标题翻译：具有压电驱动器的激光波长控制单元
公开(公告)号：WO2002069461A1
公开(公告)日：2002-09-06
申请号：PCT/US2002/004623
申请日：2002-02-15
申请人： CYMER, INC. , SPANGLER, Ronald, L. , JACQUES, Robert, N. , RULE, John, A. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , ALGOTS, John, M. , LIPCON, Jacob, P. , SANDSTROM, Richard, L.
发明人： SPANGLER, Ronald, L. , JACQUES, Robert, N. , RULE, John, A. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , ALGOTS, John, M. , LIPCON, Jacob, P. , SANDSTROM, Richard, L.
IPC分类号： H01S3/10
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： An electric discharge laser (34) with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system (104) and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide fast feedback control based on wavelength measurements, fast vibration control, active damping using the load cell and an active damping module (320), and transient inversion using feed forward algorithms based on historical burst data.
摘要翻译：具有快速波长校正的放电激光器（34）。快速波长校正设备包括至少一个压电驱动器和快速波长测量系统（104）和快速反馈响应时间。在优选实施例中，提供设备以在从大约1到5毫秒的中间时间和几微秒的非常快的时间帧上在几毫秒的慢时间帧上控制波长。优选的技术包括相对较慢的步进电机和非常快的压电驱动器的组合，用于使用调谐镜来调谐激光波长。非常快的波长控制与压电驱动器组合地设置有压电测力传感器。优选实施例提供基于波长测量，快速振动控制，使用负载传感器的主动阻尼和主动阻尼模块（320）的快速反馈控制，以及使用基于历史突发数据的前馈算法的瞬态反转。

7. 发明申请

WO2012050685A1 METHOD FOR LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS 审中-公开
标题翻译：在EUV非输出期间的LPP驱动激光输出的方法
公开(公告)号：WO2012050685A1
公开(公告)日：2012-04-19
申请号：PCT/US2011/050565
申请日：2011-09-06
申请人： CYMER, INC. , PARTLO, William, N. , SANDSTROM, Richard, L. , BROWN, Daniel, J.w. , FOMENKOV, Igor, V.
发明人： PARTLO, William, N. , SANDSTROM, Richard, L. , BROWN, Daniel, J.w. , FOMENKOV, Igor, V.
IPC分类号： A61N5/06
CPC分类号： G21K5/00 , G03F7/70033 , H01S3/117 , H01S3/2232 , H01S3/2308 , H05G2/008
摘要： A device is disclosed, herein which may comprise a droplet generator producing droplets of target material; a sensor providing an. intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the. intercept time signal; a. laser source responsive to a trigger signal to produce a laser pulse-; and a system controlling said delay circuit to provide a. trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light -pulse which is not focused on a droplet.
摘要翻译：本文公开了一种装置，其可以包括产生目标材料的液滴的液滴发生器; 传感器提供。当液滴到达预选位置时截获时间信号; 与所述传感器耦合的延迟电路，所述延迟电路产生从所述传感器延迟的触发信号。拦截时间信号; 一个。激光源响应于触发信号以产生激光脉冲; 以及控制所述延迟电路以提供a的系统。触发信号从截取时间延迟第一延迟时间，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生不聚焦在液滴上的光脉冲。

8. 发明申请

WO2007053335A2 LASER SYSTEM 审中-公开
标题翻译：激光系统
公开(公告)号：WO2007053335A2
公开(公告)日：2007-05-10
申请号：PCT/US2006/041107
申请日：2006-10-20
申请人： CYMER, INC. , ERSHOV, Alexander, I. , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V. , BERGSTEDT, Robert, A. , SANDSTROM, Richard, L. , LALOVIC, Ivan
发明人： ERSHOV, Alexander, I. , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V. , BERGSTEDT, Robert, A. , SANDSTROM, Richard, L. , LALOVIC, Ivan
IPC分类号： G11C8/00
CPC分类号： H01S3/225 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/03 , H01S3/034 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/105 , H01S3/2251 , H01S3/2333
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage wherein the output of the seed laser oscillator passes through the amplifying gain medium of the ring power amplification stage at least two times per loop.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括：激光输出光束脉冲，其可以包括环形功率放大级，其中种子激光振荡器的输出通过环形功率放大级的放大增益介质至少每循环两次。

9. 发明申请

WO2005046011A2 RELAX GAS DISCHARGE LASER LITHOGRAPHY LIGHT SOURCE 审中-公开
标题翻译： RELAX气体放电激光光刻光源
公开(公告)号：WO2005046011A2
公开(公告)日：2005-05-19
申请号：PCT/US2004/035671
申请日：2004-10-27
申请人： CYMER, INC. , SANDSTROM, Richard, L. , PARTLO, William, N. , BROWN, Daniel, J., W. , YAGER, Thomas, A. , ERSHOV, Alexander I. , RAFAC, Robert, J. , RYLOV, German, E.
发明人： SANDSTROM, Richard, L. , PARTLO, William, N. , BROWN, Daniel, J., W. , YAGER, Thomas, A. , ERSHOV, Alexander I. , RAFAC, Robert, J. , RYLOV, German, E.
IPC分类号： H01S
CPC分类号： G01J1/429 , B23K26/0622 , B23K2201/40 , G01J9/02 , G02B26/002 , G02B26/0875 , G03F7/70041 , G03F7/70575 , H01S3/005 , H01S3/0057 , H01S3/1055 , H01S3/225
摘要： An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.
摘要翻译：公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲光束产生系统的设备和方法，产生包括具有选定脉冲重复率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学器件，用于为每个脉冲选择至少一个中心波长，所述至少一个中心波长至少部分由在色散波长选择光学器件上包含相应脉冲的激光脉冲光束的入射角确定; 调谐机构，用于在所述色散中心波长选择光学器件上选择包含所述相应脉冲的所述激光脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光脉冲光束的第一空间限定部分在所述激光的多个入射位置中的一个位置处穿过所述可变折射光学元件的多个折射角位移脉冲光束在可变折射光学元件上。可变折射光学元件可以包括：限定用于激光脉冲束的入射表面的第一大致平坦面; 以及第二多面或曲面，其限定激光束的多个出口的大体上平坦的表面或连续变化的出口表面。公开了脉冲参数测量和脉冲调制控制的其他方面，包括响应来自使用工具的信号，例如涉及具有不同中心波长谱的适当剂量控制。

10. 发明申请

WO2003021728A2 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：非常窄带，两个室，高倍率气体放电激光系统
公开(公告)号：WO2003021728A2
公开(公告)日：2003-03-13
申请号：PCT/US2002/027925
申请日：2002-08-28
申请人： CYMER, INC. (a Nevada corporation) , KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
IPC分类号： H01S
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.
摘要翻译：一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。配置为MOPA并被专门用于集成电路光刻的光源的ArF准分子激光系统中的优选实施例。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。主振荡器配备有具有非常快的调谐镜的线窄化封装，能够以4000Hz或更高的重复频率在脉冲到脉冲的基础上控制中心线波长，精度低于0.2μm。

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