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    • 6. 发明申请
    • NANO-MOLDING PROCESS
    • 纳米成型工艺
    • WO2007043987A2
    • 2007-04-19
    • PCT/US2005/032852
    • 2005-09-15
    • DOW CORNING CORPORATIONUNIVERSITY OF ILLINOIS AT URBANA/CHAMPAIGNROGERS, JohnHUA, FengSHIM, Anne
    • ROGERS, JohnHUA, FengSHIM, Anne
    • H01L21/00
    • B81C1/0046B81C99/009B82Y30/00
    • A nano-molding process including an imprint process that replicates features sizes less than 7 nanometers. The nano-molding process produces a line edge roughness of the replicated features that is less than 2 nanometers. The nano-molding process including the steps of: a) forming a first substrate having nano-scale features formed thereon, b) casting at least one polymer against the substrate, c) curing the at least one polymer forming a mold, d) removing the mold from the first substrate, e) providing a second substrate having a molding material applied thereon, f) pressing the mold against the second substrate allowing the molding material to conform to a shape of the mold, g) curing the molding material, and h) removing the mold from the second substrate having the cured molding material revealing a replica of the first substrate.
    • 纳米模塑工艺,包括复制特征尺寸小于7纳米的压印工艺。 纳米成型工艺产生小于2纳米的复制特征的线边缘粗糙度。 纳米模塑方法包括以下步骤:a)形成其上形成有纳米尺度特征的第一基底,b)将至少一种聚合物浇铸到基底上,c)固化形成模具的至少一种聚合物,d)去除 所述模具从所述第一基板获得,e)提供具有施加在其上的成型材料的第二基板,f)将所述模具压在所述第二基板上,使所述模制材料符合所述模具的形状,g)固化所述模制材料,以及 h)从具有固化的模制材料的第二基底上移除模具,露出第一基底的复制品。