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1. 发明申请

WO2009042054A3 ORGANOSILOXANE MATERIALS FOR SELECTIVE AREA DEPOSITION OF INORGANIC MATERIALS 审中-公开
公开(公告)号：WO2009042054A3
公开(公告)日：2009-04-02
申请号：PCT/US2008/010824
申请日：2008-09-17
申请人： EASTMAN KODAK COMPANY , YANG, Cheng , IRVING, Lyn Marie , LEVY, David Howard , COWDERY-CORVAN, Peter Jerome , FREEMAN, Diane Carol
发明人： YANG, Cheng , IRVING, Lyn Marie , LEVY, David Howard , COWDERY-CORVAN, Peter Jerome , FREEMAN, Diane Carol
IPC分类号： C23C16/04 , C23C16/455
摘要： An atomic-layer-deposition process for forming a patterned thin film comprising (a) providing a substrate, (b) applying a deposition inhibitor material to the substrate, wherein the deposition inhibitor material is an organosiloxane compound; and (c) patterning the deposition inhibitor material either after step (b) or simultaneously with applying the deposition inhibitor material to provide selected areas of the substrate effectively not having the deposition inhibitor material. The thin film is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material.

2. 发明申请

WO2009042054A2 ORGANOSILOXANE MATERIALS FOR SELECTIVE AREA DEPOSITION OF INORGANIC MATERIALS 审中-公开
标题翻译：无机材料选择区沉积物的有机硅氧烷材料
公开(公告)号：WO2009042054A2
公开(公告)日：2009-04-02
申请号：PCT/US2008010824
申请日：2008-09-17
申请人： EASTMAN KODAK CO , YANG CHENG , IRVING LYN MARIE , LEVY DAVID HOWARD , COWDERY-CORVAN PETER JEROME , FREEMAN DIANE CAROL
发明人： YANG CHENG , IRVING LYN MARIE , LEVY DAVID HOWARD , COWDERY-CORVAN PETER JEROME , FREEMAN DIANE CAROL
IPC分类号： C08F2/46
CPC分类号： C23C16/042 , C23C16/45551 , C23C16/545
摘要： An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a deposition inhibitor material to the substrate, wherein the deposition inhibitor material is an organosiloxane compound; and patterning the deposition inhibitor material either after step (b) or simultaneously with applying the deposition inhibitor material to provide selected areas of the substrate effectively not having the deposition inhibitor material. The thin film is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material.
摘要翻译：一种用于形成图案化薄膜的原子层沉积工艺，包括提供衬底，向衬底施加沉积抑制剂材料，其中所述沉积抑制剂材料是有机硅氧烷化合物; 以及在步骤（b）之后图案化沉积抑制剂材料或同时施加沉积抑制剂材料以提供有效地不具有沉积抑制剂材料的基底的选定区域。薄膜仅基本上沉积在不具有沉积抑制剂材料的基底的选定区域中。

3. 发明申请

WO2012065158A1 CERIUM CONTAINING NANOPARTICLES PREPARED IN NON-POLAR SOLVENT 审中-公开
标题翻译：在非极性溶剂中制备的含有纳米颗粒的CER
公开(公告)号：WO2012065158A1
公开(公告)日：2012-05-18
申请号：PCT/US2011/060562
申请日：2011-11-14
申请人： CERION TECHNOLOGY, INC. , COWDERY-CORVAN, Peter Jerome , IRVING, Lyn Marie , HAILSTONE, Richard Kenneth , REED, Kenneth J. , ALLSTON, Thomas D. , AUGUSTYN, Carly L.
发明人： COWDERY-CORVAN, Peter Jerome , IRVING, Lyn Marie , HAILSTONE, Richard Kenneth , REED, Kenneth J. , ALLSTON, Thomas D. , AUGUSTYN, Carly L.
IPC分类号： C01F17/00 , C01G49/00
CPC分类号： C01F17/0043 , B82Y30/00 , C01F17/0018 , C01G25/00 , C01G49/0054 , C01P2002/54 , C01P2002/72 , C01P2004/04 , C01P2004/64
摘要： A method of making cerium-containing metal oxide nanoparticles in non-polar solvent eliminates the need for solvent shifting steps. The direct synthesis method involves: (a) forming a reaction mixture of a source of cerous ion and a carboxylic acid, and optionally, a hydrocarbon solvent; and optionally further comprises a non-cerous metal ion; (b) heating the reaction mixture to oxidize cerous ion to ceric ion; and (c) recovering a nanoparticle of either cerium oxide or a mixed metal oxide comprising cerium. The cerium-containing oxide nanoparticles thus obtained have cubic fluorite crystal structure and a geometric diameter in the range of about 1 nanometer to about 20 nanometers. Dispersions of cerium-containing oxide nanoparticles prepared by this method can be used as a component of a fuel or lubricant additive.
摘要翻译：在非极性溶剂中制造含铈金属氧化物纳米颗粒的方法消除了对溶剂转移步骤的需要。直接合成方法包括：（a）形成铈离子源和羧酸的反应混合物，以及任选的烃溶剂; 并且任选地还包含非铈金属离子; （b）加热反应混合物以将铈离子氧化成铈离子; 和（c）回收氧化铈或包含铈的混合金属氧化物的纳米颗粒。由此获得的含铈氧化物纳米颗粒具有立方萤石晶体结构，并且几何直径在约1纳米至约20纳米的范围内。通过该方法制备的含铈氧化物纳米颗粒的分散体可用作燃料或润滑剂添加剂的组分。

4. 发明申请

WO2007136656A2 COLORED MASKING FOR FORMING TRANSPARENT STRUCTURES 审中-公开
标题翻译：用于形成透明结构的彩色遮蔽
公开(公告)号：WO2007136656A2
公开(公告)日：2007-11-29
申请号：PCT/US2007/011734
申请日：2007-05-16
申请人： EASTMAN KODAK COMPANY , IRVING, Lyn Marie , LEVY, David Howard , IRVING, Mark Edward
发明人： IRVING, Lyn Marie , LEVY, David Howard , IRVING, Mark Edward
CPC分类号： G03F7/2018 , G03F1/56 , G03F7/0035 , G03F7/027 , G03F7/2014 , Y10T428/24802 , Y10T428/24917
摘要： The invention relates to a process for forming a stacked transparent structure comprising providing a support, coating one side of said support with a multicolored mask, coating the other side of the support with a layer curable by visible light, and exposing the light-curable layer through the mask with visible light to cure the layer curable by light in exposed portions to form a cured pattern.
摘要翻译：本发明涉及一种用于形成层叠透明结构的方法，包括提供支撑体，用多色面罩涂覆所述支撑体的一侧，用可见光固化的层涂覆支撑体的另一侧，并将可光固化层通过具有可见光的掩模来固化由暴露部分中的光可固化的层以形成固化图案。

5. 发明申请

WO2009067160A1 USE OF GRADIENT COLORED MASK 审中-公开
标题翻译：使用梯级彩色面膜
公开(公告)号：WO2009067160A1
公开(公告)日：2009-05-28
申请号：PCT/US2008/012713
申请日：2008-11-12
申请人： EASTMAN KODAK COMPANY , IRVING, Lyn Marie , IRVING, Mark Edward , THAI, Lan Bach
发明人： IRVING, Lyn Marie , IRVING, Mark Edward , THAI, Lan Bach
IPC分类号： G03F7/00 , G03F7/20 , H01L21/77
CPC分类号： H01L27/1288 , G03F7/0005 , G03F7/2022 , H01L27/1214 , H01L27/1225 , H01L29/66765 , H01L29/7869 , Y10T428/24802
摘要： The invention relates to a process for forming a structure comprising: (a) providing a transparent support; (b) forming a color mask having a selected absorption spectral range wherein the color mask has an effectively transparent portion and a partially absorptive portion, wherein the partially absorptive portion includes at least two portions having different optical densities within the absorption spectral range; (c) coating a layer of a photopatternable material sensitive to visible light in the absorption spectral range; (d) exposing and developing the photopatternable material to form a photopattern corresponding to at least one of said two portions of the partially absorptive portion; and (e) depositing and patterning a layer of functional material such that a pattern of functional material results corresponding to the at least one of said two portions of the partially absorptive portion.
摘要翻译：本发明涉及一种用于形成结构的方法，包括：（a）提供透明支撑体; （b）形成具有选定的吸收光谱范围的彩色掩模，其中所述彩色掩模具有有效透明部分和部分吸收部分，其中所述部分吸收部分包括在所述吸收光谱范围内具有不同光密度的至少两个部分; （c）在吸收光谱范围内涂覆对可见光敏感的光致图案材料层; （d）曝光和显影所述光图案化材料以形成对应于所述部分吸收部分的所述两个部分中的至少一个的光图案; 和（e）沉积和图案化功能材料层，使得功能材料的图案对应于部分吸收部分的所述两个部分中的至少一个。

6. 发明申请

WO2009067153A1 MULTICOLOR MASK 审中-公开
公开(公告)号：WO2009067153A1
公开(公告)日：2009-05-28
申请号：PCT/US2008/012659
申请日：2008-11-10
申请人： EASTMAN KODAK COMPANY , IRVING, Lyn, Marie , LEVY, David, Howard , IRVING, Mark, Edward , ELLINGER, Carolyn, Rae
发明人： IRVING, Lyn, Marie , LEVY, David, Howard , IRVING, Mark, Edward , ELLINGER, Carolyn, Rae
IPC分类号： G03F7/00 , G03F7/20 , H01L21/77
CPC分类号： G03F7/0007 , G03F1/14 , G03F7/2022 , H01L27/1214 , H01L27/1225 , H01L27/1288 , H01L29/66765 , H01L29/7869 , Y10T428/24802
摘要： The invention relates to a process for forming a stacked transparent structure comprising providing a support, coating one side of said support with a multicolored mask, coating the other side of the support with a layer curable by visible light, and exposing the light-curable layer through the mask with visible light to cure the layer curable by light in exposed portions to form a cured pattern.
摘要翻译：本发明涉及一种用于形成层叠透明结构的方法，包括提供支撑体，用多色面罩涂覆所述支撑体的一侧，用可见光固化的层涂覆支撑体的另一侧，并将可光固化层通过具有可见光的掩模来固化由暴露部分中的光可固化的层以形成固化图案。

7. 发明申请

WO2009067148A1 PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE 审中-公开
标题翻译：含有硅氧烷的光致抗蚀剂沉积抑制剂
公开(公告)号：WO2009067148A1
公开(公告)日：2009-05-28
申请号：PCT/US2008/012632
申请日：2008-11-10
申请人： EASTMAN KODAK COMPANY , IRVING, Lyn Marie , LEVY, David Howard , FREEMAN, Diane Carol , YANG, Cheng , COWDERY-CORVAN, Peter Jerome
发明人： IRVING, Lyn Marie , LEVY, David Howard , FREEMAN, Diane Carol , YANG, Cheng , COWDERY-CORVAN, Peter Jerome
IPC分类号： G03F7/075 , G03F7/40
CPC分类号： G03F7/0757 , G03F7/0754 , G03F7/40
摘要： An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a photopatternable deposition inhibitor material to the substrate, wherein the deposition inhibitor material comprises an organosiloxane compound; and patterning the deposition inhibitor material. The thin film is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material.
摘要翻译：一种用于形成图案化薄膜的原子层沉积工艺，包括提供衬底，将光可图案化沉积抑制剂材料施加到衬底上，其中所述沉积抑制剂材料包含有机硅氧烷化合物; 并图案化沉积抑制剂材料。薄膜仅基本上沉积在不具有沉积抑制剂材料的基底的选定区域中。

8. 发明申请

WO2009042059A1 PROCESS FOR MAKING THIN FILM TRANSISTORS BY ATOMIC LAYER DEPOSITION 审中-公开
标题翻译：通过原子层沉积制备薄膜晶体管的方法
公开(公告)号：WO2009042059A1
公开(公告)日：2009-04-02
申请号：PCT/US2008/010853
申请日：2008-09-18
申请人： EASTMAN KODAK COMPANY , NELSON, Shelby Forrester , LEVY, David Howard , IRVING, Lyn Marie , COWDERY-CORVAN, Peter Jerome , FREEMAN, Diane Carol , ELLINGER, Carolyn R.
发明人： NELSON, Shelby Forrester , LEVY, David Howard , IRVING, Lyn Marie , COWDERY-CORVAN, Peter Jerome , FREEMAN, Diane Carol , ELLINGER, Carolyn R.
IPC分类号： C23C16/455 , H01L21/336
CPC分类号： H01L27/1259 , B33Y80/00 , C23C16/407 , C23C16/45551 , C23C16/45595 , C23C16/545 , H01L27/1214 , H01L27/1225
摘要： The present invention relates to a process of making thin film electronic components and devices, such as thin film transistors, environmental barrier layers, capacitors, insulators and bus lines, where most or all of the layers are made by an atmospheric atomic layer deposition process.
摘要翻译：本发明涉及薄膜电子元件和薄膜晶体管，环境屏障层，电容器，绝缘子和总线线路的制造方法，其中大部分或全部层通过大气原子层沉积工艺制成。

9. 发明申请

WO2009042046A1 PROCESS FOR SELECTIVE AREA DEPOSITION OF INORGANIC MATERIALS 审中-公开
标题翻译：无机材料选择区沉积工艺
公开(公告)号：WO2009042046A1
公开(公告)日：2009-04-02
申请号：PCT/US2008/010759
申请日：2008-09-16
申请人： EASTMAN KODAK COMPANY , YANG, Cheng , IRVING, Lyn, Marie , LEVY, David, Howard , COWDERY-CORVAN, Peter, Jerome , FREEMAN, Diane, Carol
发明人： YANG, Cheng , IRVING, Lyn, Marie , LEVY, David, Howard , COWDERY-CORVAN, Peter, Jerome , FREEMAN, Diane, Carol
IPC分类号： C23C16/455 , C23C16/04
CPC分类号： C23C16/45551 , C23C16/042 , H01L21/02175 , H01L21/02178 , H01L21/0228 , H01L21/02304 , H01L21/3141 , H01L21/31616 , H01L51/0004
摘要： An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a deposition inhibitor material to the substrate, wherein the deposition inhibitor material is an organic compound or polymer; and patterning the deposition inhibitor material either after step (b) or simultaneously with applying the deposition inhibitor material to provide selected areas of the substrate effectively not having the deposition inhibitor material. An inorganic thin film material is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material.
摘要翻译：一种用于形成图案化薄膜的原子层沉积工艺，包括提供衬底，向衬底施加沉积抑制剂材料，其中所述沉积抑制剂材料是有机化合物或聚合物; 以及在步骤（b）之后图案化沉积抑制剂材料或同时施加沉积抑制剂材料以提供有效地不具有沉积抑制剂材料的基底的选定区域。无机薄膜材料仅基本上沉积在不具有沉积抑制剂材料的基板的选定区域中。

10. 发明申请

WO2009067154A1 MULTICOLORED MASK PROCESS FOR MAKING DISPLAY CIRCUITRY 审中-公开
标题翻译：用于制作显示电路的MULTICOLORA MASK PROCESS
公开(公告)号：WO2009067154A1
公开(公告)日：2009-05-28
申请号：PCT/US2008/012662
申请日：2008-11-10
申请人： EASTMAN KODAK COMPANY , IRVING, Lyn Marie , LEVY, David Howard , THAI, Lan Bach
发明人： IRVING, Lyn Marie , LEVY, David Howard , THAI, Lan Bach
IPC分类号： G03F7/20 , H01L21/77
CPC分类号： H01L27/1288 , G03F7/2022 , H01L27/1214 , H01L27/1225 , H01L27/3244 , H01L29/66765 , H01L29/7869 , H01L2227/323 , Y10T428/24802
摘要： A process for forming a pixel circuit is disclosed comprising: (a) providing a transparent support; (b) forming a multicolor mask having at least four different color patterns; (c) forming integrated electronic components of the pixel circuit having at least four layers of patterned functional material comprising a first conductor, a dielectric, a semiconductor, and a second conductor each layer of patterned functional material corresponding to the four different color patterns of the multicolor mask. The functional material is patterned using a photopattern corresponding to each color pattern.
摘要翻译：公开了一种用于形成像素电路的工艺，包括：（a）提供透明支撑体; （b）形成具有至少四种不同颜色图案的多色蒙版; （c）形成像素电路的集成电子部件，其具有至少四层图案化的功能材料，其包括第一导体，电介质，半导体和第二导体，每层图案化的功能材料层对应于四个不同颜色图案多色面膜使用对应于每个颜色图案的光图案来对功能材料进行图案化。

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