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    • 7. 发明申请
    • LASER MICROMACHINING OPTICAL ELEMENTS IN A SUBSTRATE
    • 激光微基片中的光学元件
    • WO2013048781A3
    • 2013-05-23
    • PCT/US2012055393
    • 2012-09-14
    • RAMBUS INCMCCOLLUM TIMOTHY AHIDE FUMITOMOHARDCASTLE IAN
    • MCCOLLUM TIMOTHY AHIDE FUMITOMOHARDCASTLE IAN
    • G02B6/00F21V8/00G02F1/13357
    • B23K26/0066B23K26/361B23K26/362G02B6/0001G02B6/0065Y10T428/24802
    • Optical elements with small increments in average density are formed in a substrate by laser micromachining using a variable aperture and a pattern mask set of pattern masks each having of shape-defining elements whose density differs among the pattern masks in first density increments. A laser light beam passes through a combined mask formed by the variable aperture and one pattern mask selected from the pattern mask set. The variable aperture controls beam size and the pattern mask spatially modulates its intensity. A focusing element focuses light from the combined mask on a small averaging region of the substrate. Different combinations of the size of the aperture mask and the selected pattern mask are used in combination at respective averaging regions of the substrate. The resulting average densities of the optical elements vary among the averaging regions in increments that are small compared to the first density increments.
    • 平均密度增量小的光学元件通过使用可变光圈的激光微加工和图案掩模组的图案掩模形成在衬底中,每个图案掩模具有形状限定元件,其密度在第一密度增量中在图案掩模中不同。 激光束穿过由可变光圈和从图案掩模组中选择的一个图案掩模形成的组合掩模。 可变光圈控制光束大小,图案掩模在空间上调制其强度。 聚焦元件将来自组合掩模的光聚焦在衬底的小平均区域上。 开口掩模和所选图案掩模的尺寸的不同组合被用于在衬底的各个平均区域中的组合。 所得到的光学元件的平均密度在平均区域之间以与第一密度增量相比较小的增量变化。
    • 8. 发明申请
    • LASER MICROMACHINING OPTICAL ELEMENTS IN A SUBSTRATE
    • 基片中激光微光学元件
    • WO2013048781A2
    • 2013-04-04
    • PCT/US2012/055393
    • 2012-09-14
    • RAMBUS INC.MCCOLLUM, Timothy, A.HIDE, FumitomoHARDCASTLE, Ian
    • MCCOLLUM, Timothy, A.HIDE, FumitomoHARDCASTLE, Ian
    • B23K26/0066B23K26/361B23K26/362G02B6/0001G02B6/0065Y10T428/24802
    • Optical elements with small increments in average density are formed in a substrate by laser micromachining using a variable aperture and a pattern mask set of pattern masks each having of shape-defining elements whose density differs among the pattern masks in first density increments. A laser light beam passes through a combined mask formed by the variable aperture and one pattern mask selected from the pattern mask set. The variable aperture controls beam size and the pattern mask spatially modulates its intensity. A focusing element focuses light from the combined mask on a small averaging region of the substrate. Different combinations of the size of the aperture mask and the selected pattern mask are used in combination at respective averaging regions of the substrate. The resulting average densities of the optical elements vary among the averaging regions in increments that are small compared to the first density increments.
    • 通过使用可变孔径的激光微机械加工形成具有平均密度小增量的光学元件,以及具有形状限定元件的图案掩模组,其具有在第一密度增量中的图案掩模之间密度不同的形状限定元件。 激光束通过由可变孔径形成的组合掩模和从图案掩模组中选择的一个图案掩模。 可变光圈控制光束尺寸和图案掩模在空间上调节其强度。 聚焦元件将来自组合掩模的光聚焦在衬底的小平均区域上。 孔径掩模和所选择的图案掩模的尺寸的不同组合在基板的各个平均区域组合使用。 所得到的光学元件的平均密度在平均区域之间以与第一密度增量相比较小的增量变化。