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1. 发明申请

WO1988001424A1 ELECTRON BEAM MEMORY SYSTEM WITH ULTRA-COMPACT, HIGH CURRENT DENSITY ELECTRON GUN 审中-公开
标题翻译：具有超紧凑，高电流密度电子枪的电子束存储系统
公开(公告)号：WO1988001424A1
公开(公告)日：1988-02-25
申请号：PCT/US1987001875
申请日：1987-08-06
申请人： CREWE, Albert, V.
IPC分类号： G11B09/10
CPC分类号： G11B9/10 , H01J3/021
摘要： A rapid random accessed electron beam memory system comprises a disc (14) mounted for rotation and supporting an information storage medium (13). An electron gun (18) is mounted for movement across the disc. The gun has ultra-compactness and extremely low mass, yet is capable of developing a finely focused electron beam probe at high beam current densities. The gun comprises a low-mass field emission cathode, the cathode having an emitting tip (60) and being adapted to receive a predetermined electrical potential to form a high brigthness electron source at the tip. An electrostatic focus lens forms a real image of the electron source in the vicinity of the storage medium. The lens comprises a first electrode (66) adapted to receive a predetermined second electrical potential which is positive relative to the potential on the tip and has a value effective to extract electrons from the tip. The electrode defines a relatively small aperture (78) for deforming the diameter of an electron beam which is formed. A second electrode (68) located downbeam of the first electrode is adapted to receive an adjustable third, focusing, electrical potential which is negative relative to the second electrical potential, and said second electrode having an aperture (80) which is larger than the first electrode aperture. A third electrode (70) located downbeam of the second electrode is adapted to receive a fourth, accelerating, electrical potential which is positive relative to the third potential for accelerating the beam, the third electrode having an aperture (82) which is also larger than said first electrode aperture. The second, third and fourth electrical potentials are selected to establish beamfocusing fields between said first and second and between said second and said third electrodes. The gun has an ultra-low mass in order to make feasible rapid random accessing of any area of the storage medium.

2. 发明申请

WO1987004845A1 ELECTRON BEAM MEMORY SYSTEM WITH IMPROVED HIGH RATE DIGITAL BEAM PULSING SYSTEM 审中-公开
标题翻译：具有改进的高速数字波束脉冲系统的电子束存储器系统
公开(公告)号：WO1987004845A1
公开(公告)日：1987-08-13
申请号：PCT/US1987000186
申请日：1987-01-29
申请人： CREWE, Albert, V.
IPC分类号： G11B09/10
CPC分类号： G11B9/10
摘要： An electron beam memory system comprises: a substrate (14) mounted for rotation and supporting an information storage medium (13). Means are provided for rotating the substrate. An electron gun (18) comprises a field emission cathode (38) having an emitting tip (40), anode means (50), and means for developing and applying between the tip and the anode means a predetermined accelerating potential for forming a high brightness electron source at the tip and for causing an electron beam to be formed through the anode means. The gun includes focus lens means (54) for receiving the beam and for forming a very small yet intense electron beam probe at a predetermined first focal distance (FD2) therefrom. A high rate digital beam pulsing system comprises voltage pulse generating means (74) for developing a series of voltage pulses of predetermined magnitude and duration, and means for applying the pulses to the gun such that the pulses add to or substract from the accelerating potential to thereby cause the focus lens means to focus the beam at a predetermined second focal distance (FD1) different from the first focal distance. The gun is positioned relative to the recording medium such that one of the first and second focal distances corresponds to the distance between the focus lens means and the recording medium.

3. 发明申请

WO1996041362A1 MAGNETIC LENS APPARATUS FOR USE IN HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPES AND LITHOGRAPHIC PROCESSES 审中-公开
标题翻译：用于高分辨率扫描电子显微镜和光刻工艺的磁性透镜装置
公开(公告)号：WO1996041362A1
公开(公告)日：1996-12-19
申请号：PCT/US1996009906
申请日：1996-06-07
申请人： ARCH DEVELOPMENT CORPORATION , CREWE, Albert, V.
发明人： ARCH DEVELOPMENT CORPORATION
IPC分类号： H01J37/141
CPC分类号： H01J37/141 , H01J2237/1035 , H01J2237/142
摘要： Disclosed are lens apparatus in which a beam of charged particlesis brought to a focus by means of a magnetic field, the lens being situated behind the target position. In illustrative embodiments, a lens apparatus is employed in a scanning electron microscopeas the sole lens for high-resolution focusing of an electron beam, and in particular, an electron beam having an accelerating voltage of from about 10 to about 30,000 V. In one embodiment, the lens apparatus comprises an electrically-conducting coil arranged around the axis of the beam and a magnetic pole piece extending along the axis of the beam at least within the space surrounded by the coil. In other embodiments, the lens apparatus comprises a magnetic dipole or virtual magnetic monopole fabricated from a variety of materials, including permanent magnets, superconducting coils, and magnetizable spheres and needles contained within an energy-conducting coil. Multiple-array lens apparatus are also disclosed for simultaneous and/or consecutive imaging of multiple images on single or multiple specimens. The invention further provides apparatus, methods, and devices useful in focusing charged particle beams for lithographic processes.
摘要翻译：公开了一种透镜装置，其中带电粒子束通过磁场被聚焦，透镜位于目标位置之后。在说明性实施例中，在扫描电子显微镜中使用透镜装置用于电子束的高分辨率聚焦的唯一透镜，特别是具有约10至约30,000V的加速电压的电子束。在一个实施例中透镜装置包括围绕光束的轴线布置的导电线圈和至少在由线圈包围的空间内沿着光束的轴线延伸的磁极片。在其他实施例中，透镜装置包括由各种材料制成的磁偶极子或虚拟磁单极子，包括永磁体，超导线圈和可磁化球体以及包含在能量传导线圈内的针。还公开了多阵列透镜装置，用于在单个或多个标本上同时和/或连续成像多个图像。本发明还提供了用于聚焦用于光刻工艺的带电粒子束的装置，方法和装置。

4. 发明申请

WO1987004846A1 ELECTRON BEAM MEMORY SYSTEM WITH ULTRA-COMPACT, HIGH CURRENT DENSITY ELECTRON GUN 审中-公开
标题翻译：具有超紧凑，高电流密度电子枪的电子束存储系统
公开(公告)号：WO1987004846A1
公开(公告)日：1987-08-13
申请号：PCT/US1987000187
申请日：1987-01-29
申请人： CREWE, Albert, V.
IPC分类号： G11B09/10
CPC分类号： H01J37/065 , G11B9/10 , H01J37/305 , H01J2237/06316
摘要： A rapid random accessed electron beam memory system (10) comprises a disc (13) mounted for rotation and supporting an information storage medium. An electron gun (18, 19, 20) is mounted for movement across the disc. The gun has ultra-compactness and extremely low mass, yet capable of developing a finely focused electron beam probe at high beam current densities. The gun comprises a low-mass field emission cathode and means for heating the cathode, the cathode having an emitting tip and being adapted to receive a predetermined electrical potential to form a high brightness electron source at the tip. A low-mass electrode receives a predetermined accelerating potential for receiving electrons from the tip to form an electron beam. A single focus lens of low mass is positioned a relatively short object distance from the tip for receiving the beam and forms a finely focused, yet intense electron beam probe at a relatively short focal distance therefrom. The probe is of such high current density due to the brightness of the source and the power of the lens that the minimum diameter of the probe is significantly affected by space charge effects in said beam. The sum of the object and image distances are so small as to suppress the space charge contribution to probe diameter and thereby make practicable a finely focused, yet extremely intense electron beam probe. The total mass of the gun is so low as to be readily capable of being rapidly accelerated and decelerated to effectuate a rapid random accessing of data stored on the information storage medium.
摘要翻译：一种快速随机存取的电子束存储系统（10）包括一个安装用于旋转并支持信息存储介质的盘（13）。安装电子枪（18,19,20）以便跨越盘移动。该枪具有超紧凑性和极低质量，但能够以高光束电流密度开发精细聚焦的电子束探头。枪包括低质量场发射阴极和用于加热阴极的装置，阴极具有发射尖端，并且适于接收预定电位以在尖端处形成高亮度电子源。低质量电极接收预定的加速电位，用于从尖端接收电子以形成电子束。低质量的单焦点透镜被定位成与用于接收光束的尖端相对较短的物体距离，并形成与其相对较短焦距的精细聚焦而强烈的电子束探针。由于源的亮度和透镜的功率，探针具有如此高的电流密度，因此探针的最小直径受到所述光束中的空间电荷效应的显着影响。物体和图像距离的总和非常小，以抑制空间电荷对探针直径的贡献，从而使得精细聚焦但非常强烈的电子束探针变得可行。枪的总质量非常低，以便能够快速加速和减速，以实现对存储在信息存储介质上的数据的快速随机存取。

5. 发明申请

WO1988002180A1 DIFFERENTIAL PRESSURE ELECTRON BEAM SYSTEM, METHOD AND GUN 审中-公开
标题翻译：差压电子束系统，方法和枪
公开(公告)号：WO1988002180A1
公开(公告)日：1988-03-24
申请号：PCT/US1987002318
申请日：1987-09-10
申请人： CREWE, Albert, V.
IPC分类号： H01J37/18
CPC分类号： G11B9/10 , H01J3/021 , H01J37/18
摘要： A differential pressure electron beam system comprising means defining at least a first vacuum enclosure (12) adapted to be maintained at a first vacuum level and a second vacuum enclosure (18) adapted to be maintained at a second vacuum level higher than the first vacuum level. An electron gun generates an electron beam within said first and second enclosures; the electron gun means includes the second vacuum enclosure. Gun mounting means mounts the electron gun for movement within said first vacuum enclosure. Valve means (98) between the first and second vacuum enclosures permits communication between the first and second enclosures when the first enclosure is being pumped, and isolates the second vacuum enclosure from the first when the second enclosure is at a higher vacuum than the first enclosure. Active pumping means pumps the first and second vacuum enclosures to the first vacuum level. Ultra-high vacuum pumping means (94) within or in communication with the second vacuum enclosure pumps only the second vacuum enclosure to said second vacuum level.
摘要翻译：一种差压电子束系统，包括限定适于保持在第一真空度的至少第一真空外壳（12）的装置和适于保持在高于第一真空度的第二真空度的第二真空罩（18）。电子枪在所述第一和第二外壳内产生电子束; 电子枪装置包括第二真空罩。枪安装装置安装电子枪以在所述第一真空外壳内移动。当第一外壳被泵送时，在第一和第二真空罩之间的阀装置（98）允许第一和第二外壳之间的连通，并且当第二外壳处于比第一外壳更高的真空时，将第二真空外壳与第一外壳隔离。主动泵送装置将第一和第二真空罩泵送到第一真空水平。在第二真空罩内或与其连通的超高真空泵装置（94）仅将第二真空罩泵送到所述第二真空级。

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