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    • 5. 发明申请
    • APPARATUS AND METHOD FOR SURFACE TREATMENT
    • 装置和表面处理方法
    • WO2007017524A1
    • 2007-02-15
    • PCT/EP2006/065213
    • 2006-08-10
    • MULTI ORBITAL SYSTEMS GMBHCRASSER, Leonhard
    • CRASSER, Leonhard
    • B24B35/00B24B1/00
    • B24B1/04B24B31/116B24B35/005
    • The present invention relates to an apparatus for treating surfaces, in particular for polishing and/or grinding surfaces. The apparatus comprises a first retaining device (10) for at least one treatment tool (4) and a second retaining device (11) for at least one body (5) to be treated. The first retaining device can be loaded in a first direction with a predetermined force and is movably mounted in at least a second movement direction or movement plane substantially perpendicular to the first direction. The second retaining device is also movably mounted in a third movement direction or movement plane substantially perpendicular to the first direction. The invention is characterized in that the first and second retaining devices each have at least one generator oscillating in predetermined phases to one another, though which the first or second retaining device is driven, preferably to have orbital or circular movement, so that the first retaining device (10) undergoes a predetermined relative movement in respect of the second retaining device (11).
    • 本发明涉及一种用于处理表面的装置,特别是用于抛光和/或研磨表面。 该装置包括用于至少一个处理工具(4)的第一保持装置(10)和用于待处理的至少一个主体(5)的第二保持装置(11)。 第一保持装置可以以预定的力装载在第一方向上,并且可移动地安装在基本上垂直于第一方向的至少第二移动方向或运动平面上。 第二保持装置也可移动地安装在基本上垂直于第一方向的第三移动方向或运动平面上。 本发明的特征在于,第一和第二保持装置每个具有至少一个以预定的相位彼此振荡的发生器,而第一或第二保持装置被驱动,优选地具有轨道或圆周运动,使得第一保持装置 装置(10)相对于第二保持装置(11)经历预定的相对运动。