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1. 发明申请

WO2010133576A1 PATTERNING AND CONTACTING OF MAGNETIC LAYERS 审中-公开
标题翻译：磁性层的绘图与接触
公开(公告)号：WO2010133576A1
公开(公告)日：2010-11-25
申请号：PCT/EP2010/056785
申请日：2010-05-18
申请人： IMEC , KATHOLIEKE UNIVERSITEIT LEUVEN , OP DE BEECK, Maria , LAGAE, Liesbet , CORNELISSEN, Sven
发明人： OP DE BEECK, Maria , LAGAE, Liesbet , CORNELISSEN, Sven
IPC分类号： H01L43/12
CPC分类号： H01L43/12
摘要： A method according to embodiments of the present invention comprises providing a magnetic stack comprising a magnetic layer sub-stack comprising magnetic layers (41) and a bottom conductive electrode (43) and a top conductive electrode (44) electrically connecting the magnetic layer sub-stack at opposite sides thereof; providing a sacrificial pillar (46) on top of the magnetic stack, the sacrificial pillar (46) having an undercut with respect to an overlying second sacrificial material (45) and a sloped foot with increasing cross-sectional dimension towards the magnetic stack, using the sacrificial pillar for patterning the magnetic stack, depositing an insulating layer (70) around the sacrificial pillar (46), selectively removing the sacrificial pillar, thus creating a contact hole (80) towards the patterned magnetic stack, and filling the contact hole with electrically conductive material (81).
摘要翻译：根据本发明的实施例的方法包括提供包括磁层子堆叠的磁性堆叠，磁层子层包括磁性层（41）和底部导电电极（43），以及顶部导电电极（44）在其相对侧堆叠; 在所述磁性堆叠的顶部提供牺牲柱（46），所述牺牲柱（46）相对于上覆的第二牺牲材料（45）具有底切，并且具有朝着所述磁性堆叠的横截面尺寸增加的倾斜脚用于图案化磁性堆叠的牺牲柱，在牺牲柱（46）周围沉积绝缘层（70），选择性地去除牺牲柱，从而产生朝向图案化磁性堆叠的接触孔（80），并且向导电材料（81）。

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