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2. 发明申请

WO1981000571A1 PHOSPHORIC ACIDS AND THEIR DERIVATIVES 审中-公开
标题翻译：磷酸及其衍生物
公开(公告)号：WO1981000571A1
公开(公告)日：1981-03-05
申请号：PCT/EP1980000085
申请日：1980-08-28
申请人： BIOTECHN FORSCHUNG GMBH , MORR M , KULA M
发明人： BIOTECHN FORSCHUNG GMBH
IPC分类号： C08G65/32
CPC分类号： C08G65/337 , C07F9/091 , C07F9/14 , C07F9/1651 , C07F9/20 , C07K14/555 , C08G65/32 , C08G65/335 , C08G65/336
摘要： The compounds have the following formula: (FORMULA) wherein p is equal to 1 to 800, and a 1) m = 1, A = an oxygen atom, X = a chlorine atom or a hydroxy group, Y = X or C u alkoxy residue, Z = an oxygen or sulphur atom, or a 2) m = 1, A = an oxygen atom, X = a C u alkoxy residue, a phenylalkoxy residue with a C u alkylene group, a C u alkylamino residue, a C u dialkylamino residue, a phenylalkylamino residue with a C u alkylene group, a bisphenylalkylamino residue with C u alkylene groups or a p-nitrophenoxy residue, the phenyl groups of the phenylalkoxy, phenylalkylamino and bisphenylalkylamino residues being substitutable by a hydroxy residue, a C u alkyl residue or a C u alkoxy residue; Y = X or a C u alkoxy residue and Z = an oxygen atom, or a 3) m = 1, A = an oxygen atom, X = a hydroxy residue, Y = a C u alkylthio residue, a C u aminoalkylthio or carboxyalkylthio residue with a C u alkylene group; Z = an oxygen atom, or b) m = 1, A = a sulphur atom, X = Y = a hydroxy residue and, Z = an oxygen atom, or c) m = o, X = Y = a hydroxy residue, a C u alkoxy residue, a phenylalkoxy residue with a C u alkylene group, the phenyl group being substitutable by a hydroxy residue, a C u alkyl residue or a C u alkoxy residue, or a trialkylsilyloxy residue with C u alkyl group; Z = an oxygen atom. The invention also applies to the derivatives of these compounds.
摘要翻译：化合物具有下式：其中p等于1至800，和a 1）m = 1，A =氧原子，X =氯原子或羟基，Y = X或C u烷氧基残基; Y = X或C u U 5 u烷氧基残基，Z =氧原子，或a 3）m = 1，A =氧原子，X =羟基残基，Y = a C 烷硫基残基，C 1-5烷基硫基或羧基烷硫基残基与C u - u> u亚烷基; Z =氧原子，或b）m = 1，A =硫原子，X = Y =羟基残基，Z =氧原子，或c）m = o，X = Y =羟基残基，烷氧基残基，具有C 1-5烷基的苯基烷氧基残基，苯基可被羟基残基，C 1-5烷基残基或C 1-4烷基残基取代或者具有C 1-5烷基的三烷基甲硅烷氧基残基; Z =氧原子。本发明也适用于这些化合物的衍生物。

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