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    • 1. 发明申请
    • FILM FORMING, SILICONE CONTAINING COMPOSITIONS
    • 成膜,含有硅酮的组合物
    • WO2011003054A2
    • 2011-01-06
    • PCT/US2010/040878
    • 2010-07-02
    • DOW CORNING CORPORATIONDOW CORNING FRANCE SASGARAUD, Jean-LucKERGOSIEN, GuillaumeTHOMAS, Xavier
    • GARAUD, Jean-LucKERGOSIEN, GuillaumeTHOMAS, Xavier
    • C08L83/04
    • C08G77/12C08G77/20C08G77/70C08G77/80C08L83/04C09D183/04C08L83/00
    • The invention relates to silicone containing compositions able to form adhesive films on substrates, which typically comprises a curable silicone composition comprising components (a), (d) and at least one of (b) or (c): a. a polyorganosiloxane resin, composed of M and Q units having at least 3 alkenyl groups per molecule, herein after called "SiVi" groups, b. a polyorganosiloxane compound having at least 2 Si-bonded hydrogen groups on the polysiloxane chain, hereinafter called "SiH" groups, c. a telechelic polyorganosiloxane compound having terminal Si-H groups, and d. a hydrosilylation catalyst for the reaction of SiH groups with SiVi groups, e. a liquid diluent in an amount of from 0% to maximum 40% by weight of composition said components reacting together by hydrosilylation at a temperature below 4O0C when they are brought into contact on a substrate and cure to form a continuous film on the substrate. Such formulation can cure quickly at room temperature and can provide good balance between adhesion and tack.
    • (a),(d)和(b)或(c)中的至少一种的可固化有机硅组合物, ): 一个。 由每个分子具有至少3个链烯基的M和Q单元组成的聚有机硅氧烷树脂,在此称为“SiVi” 组,b。 在聚硅氧烷链上具有至少2个与Si键合的氢基的聚有机硅氧烷化合物,以下称为“SiH” 组,c。 具有末端Si-H基团的遥爪聚有机硅氧烷化合物,和d。 用于SiH基团与SiVi基团反应的氢化硅烷化催化剂, 以组合物的0重量%至最多40重量%的量存在的液体稀释剂,当所述组分在基材上接触并固化以在基材上形成连续膜时,所述组分在低于40℃的温度下通过氢化硅烷化反应在一起。 这种配方可以在室温下快速固化,并且可以在粘合和粘性之间提供良好的平衡。
    • 2. 发明申请
    • WET-ETCHABLE ANTIREFLECTIVE COATINGS
    • 可湿性抗反射涂层
    • WO2010068337A1
    • 2010-06-17
    • PCT/US2009/061130
    • 2009-10-19
    • DOW CORNING CORPORATIONFU, Peng-FeiMOYER, EricYEAKLE, Craig
    • FU, Peng-FeiMOYER, EricYEAKLE, Craig
    • C09D183/04G03F7/11H01L21/30C09D183/06
    • C09D183/06C08G77/04C08G77/14G03F7/0752G03F7/091
    • Antireflective coatings produced from silsesquioxane resin is comprised of the units (Ph(CH 2 ) r SiO (3_x)/2 (OR') x ) m (HSiO (3_x)/2 (OR') x ) n (MeSiO (3.x)/2 (OR') x ) o (RSiO (3-x)/2 (OR') x ) p (R 1 SiO (3-x)/2 (OR') x ) q where Ph is a phenyl group, Me is a methyl group; R' is hydrogen atom or a hydrocarbon group having from 1 to 4 carbon atoms; R is selected from a carboxylic acid group or a carboxylic acid forming group with the proviso that there is a sufficient amount of carboxylic acid groups to make the resin wet etchable after cure; and R is selected from substituted phenyl groups, ester groups, polyether groups; mercapto groups, sulfur-containing organic functional groups, hydroxyl producing group, aryl sulphonic ester groups, and reactive or curable organic functional groups; and r has a value of 0, 1, 2, 3, or 4; x has a value of 0, 1 or 2; wherein in the resin m has a value of 0 to 0.90; n has a value of 0.05 to 0.99; o has a value of 0 to 0.95; p has a value of 0.01 to 0.5; q has a value of 0 to 0.5; and m + n + o + p + q ≈ 1.
    • 由倍半硅氧烷树脂制成的抗反射涂层由单元(Ph(CH2)rSiO(3_x)/ 2(OR')x)m(HSiO(3_x)/ 2(OR')x)n(MeSiO(3.x) / 2(OR')x)o(RSiO(3-x)/ 2(OR')x)p(R1SiO(3-x)/ 2(OR')x)q其中Ph是苯基,Me是 甲基; R'是氢原子或具有1至4个碳原子的烃基; R选自羧酸基团或羧酸形成基团,条件是存在足够量的羧酸基团以使树脂在固化后可湿法蚀刻; 并且R选自取代的苯基,酯基,聚醚基团; 巯基,含硫有机官能团,羟基产生基团,芳基磺酸酯基团和反应性或可固化的有机官能团; 并且r的值为0,1,2,3或4; x的值为0,1或2; 其中在树脂中m为0至0.90; n的值为0.05〜0.99; o的值为0〜0.95; p的值为0.01〜0.5; q的值为0到0.5; 和m + n + o + p + q〜1。