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1. 发明申请

WO2009042438A1 LINE WIDTH ROUGHNESS CONTROL WITH ARC LAYER OPEN 审中-公开
标题翻译：线宽宽度控制与弧层开放
公开(公告)号：WO2009042438A1
公开(公告)日：2009-04-02
申请号：PCT/US2008/076435
申请日：2008-09-15
申请人： LAM RESEARCH CORPORATION , CHI, Kyeong-Koo , KIM, Jonathan
发明人： CHI, Kyeong-Koo , KIM, Jonathan
IPC分类号： H01L21/3065
CPC分类号： H01L21/31116 , H01L21/31144
摘要： To achieve the foregoing and in accordance with the purpose of the present invention a method for etching an etch layer disposed below an antireflective coating (ARC) layer below a patterned mask is provided. The ARC layer is opened, and features are etched into the etch layer through the patterned mask. The opening the ARC layer includes (1) providing an ARC opening gas comprising a halogen containing gas, COS, and an oxygen containing gas, (2) forming a plasma from the ARC opening gas to open the ARC layer, and (3) stopping providing the ARC opening gas to stop the plasma. The patterned mask may be a photoresist (PR) mask having a line-space pattern. COS in the ARC opening gas reduces line width roughness (LWR) of the patterned features of the etch layer.
摘要翻译：为了实现上述目的，并且根据本发明的目的，提供了一种用于蚀刻设置在图案化掩模下面的抗反射涂层（ARC）层下方的蚀刻层的方法。 ARC层被打开，并且通过图案化掩模将特征蚀刻到蚀刻层中。 ARC层的开口包括（1）提供包含含卤素气体COS和含氧气体的ARC开口气体，（2）从ARC开口气体形成等离子体以打开ARC层，以及（3）停止提供ARC打开的气体来停止等离子体。图案化掩模可以是具有线间隔图案的光致抗蚀剂（PR）掩模。 ARC打开气体中的COS降低蚀刻层的图案化特征的线宽粗糙度（LWR）。

2. 发明申请

WO2009036434A2 LOW COST, HIGH PERFORMANCE GPS/GNSS RECEIVER ARCHITECTURE 审中-公开
标题翻译：低成本，高性能GPS / GNSS接收器架构
公开(公告)号：WO2009036434A2
公开(公告)日：2009-03-19
申请号：PCT/US2008/076414
申请日：2008-09-15
申请人： MAGELLAN SYSTEMS JAPAN, INC. , WEILL, Lawrence R.
发明人： WEILL, Lawrence R.
IPC分类号： G01S5/02
CPC分类号： G01S19/37
摘要： A low-cost GPS/GNSS receiver receives a satellite signal at an RF frequency (fRF). The GPS/GNSS receiver includes a front end section for receiving the satellite signal and generating a digital complex signal having a first bandwidth, the received satellite signal being converted into a complex signal before digitizing, a signal capturing section for searching for and acquiring the satellite signal, the signal capturing section including a capture memory, a baseband processor for tracking the acquired satellite signal, and a signal splitter coupled to the front end section. The signal splitter splits the digital complex signal into two bandwidths, by generating a narrowband digital complex signal having a second bandwidth substantially smaller than the first bandwidth. The signal splitter provides the narrowband digital signal to the capture memory and the wider first bandwidth digital complex signal to the baseband processor.
摘要翻译：低成本的GPS / GNSS接收器以RF频率（fRF）接收卫星信号。 GPS / GNSS接收机包括：前端部分，用于接收卫星信号并产生具有第一带宽的数字复合信号，所接收的卫星信号在数字化之前被转换成复合信号;信号捕获部分，用于搜索并获取卫星信号捕获部分包括捕获存储器，用于跟踪所获取的卫星信号的基带处理器，以及耦合到前端部分的信号分离器。信号分离器通过产生具有明显小于第一带宽的第二带宽的窄带数字复信号，将数字复信号分成两个带宽。信号分配器将窄带数字信号提供给捕获存储器，并将更宽的第一带宽数字复合信号提供给基带处理器。

3. 发明申请

WO2009079380A2 PROCESS FOR SUB-MICROSECOND TIME TRANSFER USING WEAK GPS/GNSS SIGNALS 审中-公开
标题翻译：使用弱GPS / GNSS信号进行子微时间传输的过程
公开(公告)号：WO2009079380A2
公开(公告)日：2009-06-25
申请号：PCT/US2008/086613
申请日：2008-12-12
申请人： MAGELLAN SYSTEMS JAPAN, INC. , WEILL, Lawrence R.
发明人： WEILL, Lawrence R.
IPC分类号： G01S5/14 , H04B7/08
CPC分类号： H04B1/709 , G01S19/14 , G01S19/24 , G01S19/243 , G01S19/39
摘要： Sub-microsecond time transfer in a GPS/GNSS receiver using a weak GPS/GNSS signal is provided. The digitized complex baseband signal and the generated PN code are cross-correlated for each code period so as to output a complex correlation value at each code epoch of the generated PN code, where a sequence of the output correlation values form a data stream representing the navigation message. Bit synchronization generates bit sync pulses at bit boundaries. The location of a target segment having a known sequence at a known bit location in the navigation message is detected by searching through a plurality of subframes and accumulating search results for the plurality of subframes. Transmission time of the target segment is determined from the detected location of the target segment, with a certain time ambiguity. Accurate local time is determined by solving the time ambiguity using approximate time obtained from an external source.
摘要翻译：提供了使用弱GPS / GNSS信号的GPS / GNSS接收机中的亚微秒时间传输。数字化复基带信号和产生的PN码对于每个码周期是交叉相关的，以便在所生成的PN码的每个码周期输出复相关值，其中输出相关值的序列形成表示导航信息。位同步在位边界生成位同步脉冲。通过搜索多个子帧并累积多个子帧的搜索结果来检测在导航消息中的已知比特位置处具有已知序列的目标段的位置。从目标段的检测位置确定目标段的传输时间，具有一定的时间模糊度。通过使用从外部源获得的近似时间求解时间歧义来确定准确的本地时间。

4. 发明申请

WO2007001998A1 SECURE TRANSMISSION OF DATA BETWEEN CLIENTS OVER COMMUNICATIONS NETWORK 审中-公开
标题翻译：通过通信网络的客户端之间的数据安全传输
公开(公告)号：WO2007001998A1
公开(公告)日：2007-01-04
申请号：PCT/US2006/023838
申请日：2006-06-19
申请人： YOSHIOKA, Masami
发明人： YOSHIOKA, Masami
IPC分类号： H04L12/22 , H04L9/32
CPC分类号： H04L63/0823 , H04L63/0428 , H04L63/126 , H04L63/1466
摘要： A method and apparatus securely transmit data between a client and a server over a communications network. The secure data transmission includes, after the client is initially authenticated, (a) transmitting a series of client connection messages from the client to the server at least while the data is being transmitted, (b) transmitting a series of server connection messages from the server to the client at least while the data is being transmitted; (c) monitoring the client connection messages at the server; (d) monitoring the server connection messages at the client; (e) if a disturbance is found either in the client connection messages or the server connection messages, terminating the data transmission between the client and the server, re-authenticating the client, and re-transmitting the data; and (f) if the encrypted data is successfully transmitted to the server, storing the data in a database associated with the recipient.
摘要翻译：一种方法和装置通过通信网络在客户端和服务器之间安全地传输数据。安全数据传输包括：在客户端被初始认证之后，（a）至少在数据被发送时从客户端向服务器发送一系列客户端连接消息;（b）从所述客户端发送一系列服务器连接消息，服务器至少在数据正在传输时向客户端发送; （c）监控服务器端的客户端连接消息; （d）在客户端监控服务器连接消息; （e）如果在客户端连接消息或服务器连接消息中发现干扰，则终止客户端与服务器之间的数据传输，重新认证客户端并重新发送数据; 和（f）如果加密数据被成功发送到服务器，则将数据存储在与接收者相关联的数据库中。

5. 发明申请

WO2010047976A2 SILICON ETCH WITH PASSIVATION USING PLASMA ENHANCED OXIDATION 审中-公开
标题翻译：采用等离子体增强氧化钝化的硅蚀刻剂
公开(公告)号：WO2010047976A2
公开(公告)日：2010-04-29
申请号：PCT/US2009/060214
申请日：2009-10-09
申请人： LAM RESEARCH CORPORATION , WINNICZEK, Jaroslaw W. , CHEBI, Robert P.
发明人： WINNICZEK, Jaroslaw W. , CHEBI, Robert P.
IPC分类号： H01L21/3065
CPC分类号： H01L21/32137 , H01J37/32082 , H01L21/3065
摘要： A method and apparatus for etching a silicon layer through a patterned mask formed thereon are provided. The silicon layer is placed in an etch chamber. An etch gas comprising a fluorine containing gas and an oxygen and hydrogen containing gas is provided into the etch chamber. A plasma is generated from the etch gas and features are etched into the silicon layer using the plasma. The etch gas is then stopped. The plasma may contain OH radicals.
摘要翻译：提供了一种通过其上形成的图案化掩模来蚀刻硅层的方法和设备。硅层被放置在蚀刻室中。包括含氟气体和含氧和含氢气体的蚀刻气体被提供到蚀刻室中。从蚀刻气体产生等离子体，并且使用等离子体将特征蚀刻到硅层中。蚀刻气体然后停止。血浆可能含有OH自由基。

6. 发明申请

WO2009108915A3 METHOD AND APPARATUS FOR ACQUISITION, TRACKING, AND SUB-MICROSECOND TIME TRANSFER USING WEAK GPS/GNSS SIGNALS 审中-公开
公开(公告)号：WO2009108915A3
公开(公告)日：2009-09-03
申请号：PCT/US2009/035627
申请日：2009-03-01
申请人： MAGELLAN SYSTEMS JAPAN, INC. , WEILL, Lawrence, R.
发明人： WEILL, Lawrence, R.
IPC分类号： G01S5/14 , G01S11/10
摘要： A method and apparatus provide high-sensitivity GPS/GNSS signal acquisition in a stationary GPS/GNSS receiver. The uncertainty in frequency due to apparent Doppler shift is partitioned into a plurality of contiguous frequency bins, and the uncertainty in location of navigation data bit boundaries is partitioned into equally spaced trial bit boundary locations. For each combination of the trial bit boundary location and the frequency bin, a signal block of captured complex baseband signal is Doppler-compensated using a phase rotator, and then synchronously summed with a periodicity of one period of C/A code so as to produce a compressed sample block having N samples. Each compressed sample block is cross-correlated with one period of reference C/A code to produce an N-value correlation function. A predetermined number of magnitudes of the N-value correlation functions are stack-accumulated into an array with precession compensation so as to find a correlation peak having the largest value.

7. 发明申请

WO2009026298A1 MASK TRIMMING 审中-公开
标题翻译：掩模修剪
公开(公告)号：WO2009026298A1
公开(公告)日：2009-02-26
申请号：PCT/US2008/073602
申请日：2008-08-19
申请人： LAM RESEARCH CORPORATION , GOYAL, Supriya , HEO, Dongho , KIM, Jisoo , SADJADI, S., M., Reza
发明人： GOYAL, Supriya , HEO, Dongho , KIM, Jisoo , SADJADI, S., M., Reza
IPC分类号： H01L21/3065
CPC分类号： H01L21/0338
摘要： A method for etching a dielectric layer is provided. A patterned mask with mask features is formed over a dielectric layer. The mask has isolated areas and dense areas of the mask features. The mask is trimmed by a plurality of cycles, where each cycle includes depositing a deposition layer, and selectively etching the deposition layer and the patterned mask. The selective etching selectively trims the isolated areas of the mask with respect to the dense areas of the mask. The dielectric layer is etched using the thus trimmed mask. The mask is removed.
摘要翻译：提供了蚀刻介电层的方法。在介电层上形成具有掩模特征的图案化掩模。面具具有隔离区域和密集区域的面具功能。掩模被多个周期修剪，其中每个周期包括沉积沉积层，以及选择性地蚀刻沉积层和图案化掩模。选择性蚀刻相对于掩模的密集区域选择性地修剪掩模的隔离区域。使用如此修整的掩模蚀刻电介质层。去除面具。

8. 发明申请

WO2011084337A2 METHOD AND APPARATUS FOR PROCESSING BEVEL EDGE 审中-公开
标题翻译：用于处理水平边缘的方法和装置
公开(公告)号：WO2011084337A2
公开(公告)日：2011-07-14
申请号：PCT/US2010/059585
申请日：2010-12-08
申请人： LAM RESEARCH CORPORATION , CHEN, Jack , KIM, Yunsang
发明人： CHEN, Jack , KIM, Yunsang
IPC分类号： H01L21/3065
CPC分类号： H01L21/02274 , C23C16/0245 , C23C16/04 , C23C16/509 , H01L21/02087 , H01L21/02115 , H01L21/3083 , H01L21/31144
摘要： A method and apparatus for processing a bevel edge is provided. A substrate is placed in a bevel processing chamber and a passivation layer is formed on the substrate only around a bevel region of the substrate using a passivation plasma confined in a peripheral region of the bevel processing chamber. The substrate may undergo a subsequent semiconductor process, during which the bevel edge region of the substrate is protected by the passivation layer. Alternatively, the passivation layer may be patterned using a patterning plasma formed in an outer peripheral region of the processing chamber, the patterning plasma being confined by increasing plasma confinement. The passivation layer on outer edge portion of the bevel region is removed, while the passivation layer on an inner portion of the bevel region is maintained. The bevel edge of the substrate may be cleaned using the patterned passivation layer as a protective mask.
摘要翻译：提供了一种用于处理斜边的方法和装置。将衬底放置在斜面处理室中，并且使用限制在斜面处理室的周边区域中的钝化等离子体在衬底的仅一个斜面区域周围形成钝化层。衬底可以经历随后的半导体工艺，在此期间衬底的斜边缘区域被钝化层保护。或者，可以使用在处理室的外围区域中形成的图案化等离子体对钝化层进行图案化，通过增加等离子体限制来限制图形化等离子体。去除斜面区域的外边缘部分上的钝化层，同时保持斜面区域的内部部分上的钝化层。可以使用图案化的钝化层作为保护掩模来清洁基底的斜边缘。

9. 发明申请

WO2010047978A2 SILICON ETCH WITH PASSIVATION USING CHEMICAL VAPOR DEPOSITION 审中-公开
标题翻译：使用化学蒸气沉积物进行钝化的硅蚀刻
公开(公告)号：WO2010047978A2
公开(公告)日：2010-04-29
申请号：PCT/US2009/060218
申请日：2009-10-09
申请人： LAM RESEARCH CORPORATION , WINNICZEK, Jaroslaw, W. , CHEBI, Robert P.
发明人： WINNICZEK, Jaroslaw, W. , CHEBI, Robert P.
IPC分类号： H01L21/3065 , H01L21/205
CPC分类号： H01L21/3065 , H01J37/32082 , H01L21/32137
摘要： A silicon layer is etched through a patterned mask formed thereon using an etch chamber. A fluorine (F) containing etch gas and a silicon (Si) containing chemical vapor deposition gas are provided in the etch chamber. The fluorine (F) containing etch gas is used to etch features into the silicon layer, and the silicon (Si) containing chemical vapor deposition gas is used to form a silicon-containing deposition layer on sidewalls of the features. A plasma is generated from the etch gas and the chemical vapor deposition gas, and a bias voltage is provided. Features are etched into the silicon layer using the plasma, and a silicon-containing passivation layer is deposited on the sidewalls of the features which are being etched. Silicon in the passivation layer primarily comes from the chemical vapor deposition gas. The etch gas and the chemical vapor deposition gas are then stopped.
摘要翻译：通过使用蚀刻室在其上形成的图案化掩模蚀刻硅层。在蚀刻室中设置含有含氟（F）的蚀刻气体和含硅（Si）的化学气相沉积气体。使用含氟（F）的蚀刻气体将特征蚀刻到硅层中，并且使用含硅（Si）的化学气相沉积气体在特征的侧壁上形成含硅沉积层。从蚀刻气体和化学气相沉积气体产生等离子体，并提供偏置电压。使用等离子体将特征蚀刻到硅层中，并且在被蚀刻的特征的侧壁上沉积含硅钝化层。钝化层中的硅主要来自化学气相沉积气体。然后停止蚀刻气体和化学气相沉积气体。

10. 发明申请

WO2010047970A3 METHOD AND APPARATUS FOR REMOVING PHOTORESIST 审中-公开
公开(公告)号：WO2010047970A3
公开(公告)日：2010-04-29
申请号：PCT/US2009/060066
申请日：2009-10-08
申请人： LAM RESEARCH CORPORATION , CHEBI, Robert P. , WINNICZEK, Jaroslaw W.
发明人： CHEBI, Robert P. , WINNICZEK, Jaroslaw W.
IPC分类号： H01L21/3065
摘要： A method and apparatus remove photoresist from a wafer. A process gas containing sulfur (S), oxygen (O), and hydrogen (H) is provided, and a plasma is generated from the process gas in a first chamber. A radical-rich ion-poor reaction medium is flown from the first chamber to a second chamber where the wafer is placed. The patterned photoresist layer on the wafer is removed using the reaction medium, and then the reaction medium flowing into the second chamber is stopped. Water vapor may be introduced in a solvation zone provided in a passage of the reaction medium flowing down from the plasma such that the water vapor solvates the reaction medium to form solvated clusters of species before the reaction medium reaches the wafer. The photoresist is removed using the solvated reaction medium.

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