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    • 3. 发明申请
    • SYSTEM FOR DEPOSITING SUPERCONDUCTING FILMS
    • 沉积超薄膜系统
    • WO1993013240A1
    • 1993-07-08
    • PCT/US1991009698
    • 1991-12-23
    • PRINCE, John, H.
    • C23C14/30
    • H01J37/304C23C14/30C23C14/548H01J37/3053H01J2237/30411H01J2237/3132
    • A system for depositing a film containing as many as seven elements or more, the ratios amongst which are under precise computer cotrol. The ability to change these ratios almost instantly allows the deposition of structurally and compositionally complex crystalline or amorphous films, including superconducting films. In a preferred form the system comprises a high vacuum chamber (2) comprising a multi-pocket (6a-6g), single filament electron gun (24) and an atomic absorption rate monitoring system (20, 22). The atomic absorption system (20, 22) measures the concentrations of the depositing elements in the vapor near the film substrate (68), and frequently relays these data to the computer (14). These data are used by the computer (14) to precisely control the deposition rates of the elements being deposited. This deposition control is implemented by precisely varying the dwell times of the electron beam (1) within the pockets (6a-6g) containing the depositing elements.
    • 一种用于沉积含有多达七个元素或更多元素的膜的系统,其中的比例在精确的计算机上。 几乎立即改变这些比率的能力允许沉积结构和组成复杂的结晶或非晶膜,包括超导膜。 在优选的形式中,系统包括包括多口袋(6a-6g),单丝电子枪(24)和原子吸收率监测系统(20,22)的高真空室(2)。 原子吸收系统(20,22)测量薄膜基底(68)附近的蒸汽中的沉积元素的浓度,并且经常将这些数据中继到计算机(14)。 计算机(14)使用这些数据来精确地控制被沉积的元件的沉积速率。 该沉积控制通过精确地改变包含沉积元件的凹穴(6a-6g)内的电子束(1)的停留时间来实现。