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    • 61. 发明申请
    • CURING AGENTS FOR AQUEOUS EPOXY RESINS
    • 环氧树脂固化剂
    • WO1995001386A1
    • 1995-01-12
    • PCT/US1994006641
    • 1994-06-15
    • HENKEL CORPORATION
    • HENKEL CORPORATIONCHOU, Jason, L.SHAH, ShaileshJEWELL, Brian, G.MOON, Robert, M.
    • C08G59/50
    • C08G59/184
    • Provided are epoxy curing agents comprising the reaction product of reactants consisting essentially of an alkylene polyamine having less than about 12 carbon atoms, an aromatic mono-glycidyl ether having less than about 18 carbon atoms, and a diglycidyl ether of an aromatic diol having an average degree of oligomerization of less than about 3.5, wherein the ratio of primary amine equivalents of said alkylene polyamine to the total epoxide equivalents of said aromatic glycidyl ether and said diglycidyl ether of an aromatic diol is not essentially less than one, and the ratio of epoxide equivalents of said aromatic mono-glycidyl ether to epoxide equivalents of said diglycidyl ether of an aromatic diol is greater than one. The reaction product is preferably employed as a curing agent for an aqueous epoxy resin in a two component coating system wherein said curing agent, essentially free of acids, is mixed with an aqueous epoxy resin emulsion and then the resulting mixture is applied as a continuous coating to a rigid substrate, e.g. as an industrial maintenance coating.
    • 提供的是包含基本上由少于约12个碳原子的亚烷基多胺,具有少于约18个碳原子的芳族单缩水甘油醚组成的反应物的反应产物和具有平均值的芳族二醇的二缩水甘油醚的环氧固化剂 低聚度小于约3.5,其中所述亚烷基多胺的伯胺当量与芳族二醇的芳族缩水甘油醚和所述二缩水甘油醚的总环氧当量的比例基本上不小于1,环氧化物的比例 所述芳族单缩水甘油醚与芳族二醇的所述二缩水甘油醚的环氧当量的当量大于1。 反应产物优选用作双组分涂料体系中的水性环氧树脂的固化剂,其中将基本上不含酸的固化剂与水性环氧树脂乳液混合,然后将所得混合物作为连续涂层 到刚性基底,例如 作为工业维护涂料。
    • 62. 发明申请
    • CITRAL ACETAL ETHERS OF ALPHA-HYDROXY PHENYL KETONES AND POLYMERIZABLE COMPOSITIONS
    • 羟基苯乙酮和可聚合组合物的CITRAL ACETAL ETHERS
    • WO1994029355A1
    • 1994-12-22
    • PCT/US1994005583
    • 1994-05-24
    • HENKEL CORPORATION
    • HENKEL CORPORATIONSHARE, Paul, E.
    • C08F02/50
    • C07C45/71C07C49/84C08F246/00C09D4/00Y10S522/904C08F220/00
    • Provided are compounds having formula (I), wherein R and R are independently selected from the group consisting of a hydrogen atom, an aliphatic group, a hetero-aliphatic group, an aromatic group, and a heterocyclic group, provided that R and R may together form a divalent radical selected from the group consisting of an aliphatic radical and hetero-aliphatic group; each R is independently selected from the group consisting of an aliphatic group, a hetero-aliphatic group, an aromatic group, and a heterocyclic group; R is selected from the group consisting of an aliphatic group, a hetero-aliphatic group, an aromatic group, and a heterocyclic group; and n is an integer from 0 to 5. Also provided are polymerizable compositions containing such compounds and a method of coating a substrate which uses such polymerizable compositions.
    • 提供具有式(I)的化合物,其中R 1和R 2独立地选自氢原子,脂族基团,杂脂族基团,芳族基团和杂环基团, 条件是R 1和R 2可以一起形成选自脂族基团和杂脂族基团的二价基团; 每个R 3独立地选自脂族基团,杂脂族基团,芳族基团和杂环基团; R 4选自脂族基团,杂脂族基团,芳族基团和杂环基团; 并且n为0至5的整数。还提供含有这些化合物的可聚合组合物以及使用这种可聚合组合物的基材的涂覆方法。
    • 63. 发明申请
    • POLYMERIC THICKENERS FOR AQUEOUS COMPOSITIONS
    • 聚合物增稠剂用于水性组合物
    • WO1994028060A1
    • 1994-12-08
    • PCT/US1994005393
    • 1994-05-19
    • HENKEL CORPORATION
    • HENKEL CORPORATIONWIGGINS, Michael, S.GRINSTEIN, Reuben, H.
    • C08K03/20
    • A61K8/86A61Q19/00C08G63/672C08G69/26C08G69/40C08G69/44C09D7/43C09K5/00
    • Latexes are thickened by compounds of the formula (I): R -(O-A)a-B -R -(B -R )d-(B -(A'-O)b-f-(A'-B )f-R -(B -R )e)n-B -(A''O)c-R , wherein: R and R are monovalent hydrophobic groups independently selected from the group consisting of an aliphatic group, a substituted aliphatic group, an aromatic group, and a substituted aromatic group; R and R are independently selected from the group consisting of aliphatic, substituted aliphatic, aromatic, or substituted aromatic radicals, each radical being divalent or trivalent; R and R are independently selected from hydrogen, lower alkyl and lower aralkyl; B , B , B , B , B , and B are linking groups independently selected from the group consisting of an oxygen atom, carboxylate group, an amino group and an amido group, each of a, b, c, d, e, f, and n are integers, wherein each of a and c are independently any integer from greater than 20 to about 200; b is any integer from greater than 20 to about 450; d, e, and f are 0 or 1; and n is any integer from 1 to about 5; and each of A, A', and A'' is independently an ethylene, 1,2-propylene, 1,2-butylene unit or combinations thereof.
    • 乳液由式(I)化合物增稠:R 1 - (OA)a B 1 -R 2 - (B 2 -R 3)d - (B 3 - ( A'-O)BF-(A'-B <4>)FR <4> - (B <5> -R <5>)e)NB的<6> - (A''O)c <6>, 其中:R 1和R 6是独立地选自脂族基团,取代脂族基团,芳族基团和取代芳族基团的一价疏水基团; R 2和R 4独立地选自脂族,取代的脂族,芳族或取代的芳族基团,每个基团是二价或三价的; R 3和R 5独立地选自氢,低级烷基和低级芳烷基; B 1,B 2,B 3,B 4,B 5和B 6是独立地选自氧原子,羧酸酯基,氨基的连接基团 和酰胺基,a,b,c,d,e,f和n各自为整数,其中a和c各自独立地为大于20至约200的任何整数; b是大于20至约450的任何整数; d,e和f为0或1; n为1〜5的整数; A,A'和A“各自独立地为乙烯,1,2-亚丙基,1,2-亚丁基单元或其组合。
    • 66. 发明申请
    • APPARATUS FOR MAINTAINING A STABLE AUTODEPOSITION BATH
    • 维护稳定的自动化浴室的装置
    • WO1994016792A1
    • 1994-08-04
    • PCT/US1994000275
    • 1994-01-13
    • HENKEL CORPORATION
    • HENKEL CORPORATIONKOZAK, William, G.TOPPING, Joseph, C.
    • B01D15/04
    • B05D7/142
    • A system automated for providing at least periodic removal of metal ions and contaminants from a chemical bath (T4), consists of a microprocessor programmed for controlling fluid circuits of pumps (P1, P2, P3) and valves (AV1, AV2, AV3, AV4, AV5, AV6, AV7), for in one state of operation circulating a first predetermined quantity of the chemical bath from a first tank (T4), through an ion exchange column, and back to the first tank; for in a second state of operation circulating deionized water from a second tank (T1), into the IEX column for displacing residual chemical bath therefrom for return to the first tank; for in a third state of operation circulating deionized water through the IEX column, and discharging the rinse water from a waste port; for in a fourth state of operation circulating regenerant acid (T2) through the ion exchange column, and discharging the used acid from a waste port; for in a fifth state of operation circulating deionized water through the IEX column for rinsing acid regenerant therefrom and discharging the same out of a waste port; and for in a sixth state of operation circulating chemical bath into the IEX column for displacing residual rinse water therefrom, and discharging the same out of the waste port, in preparation for a cycle of treatment of the chemical bath.
    • 自动化用于从化学浴(T4)至少周期性地去除金属离子和污染物的系统由编程用于控制泵(P1,P2,P3)和阀(AV1,AV2,AV3,AV4)的流体回路的微处理器 ,AV5,AV6,AV7),用于在一个操作状态下将来自第一罐(T4)的第一预定量的化学浴循环通过离子交换柱,并返回到第一罐; 用于在来自第二罐(T1)的循环去离子水的第二操作状态下进入IEX柱,用于将残留的化学浴从其中移出以返回到第一罐; 在第三种操作状态下循环去离子水通过IEX柱,并从冲洗水排出冲洗水; 用于通过离子交换塔循环再生酸(T2)的第四操作状态,并且从废物口排出所使用的酸; 在第五种操作状态下,通过IEX柱循环去离子水以从其中冲洗酸再生剂并将其从废物口排出; 并且在第六操作状态下将化学浴循环到IEX柱中以从中移出残留的漂洗水,并将其从废物口排出,以准备化学浴的处理循环。
    • 67. 发明申请
    • METHOD FOR APPLYING AUTODEPOSITION COATING
    • 用于自动涂覆涂料的方法
    • WO1994015719A1
    • 1994-07-21
    • PCT/US1993011912
    • 1993-12-14
    • HENKEL CORPORATION
    • HENKEL CORPORATIONAHMED, Bashir, M.
    • B05D01/02
    • C09D5/088B05D1/30B05D7/142
    • The invention concerns a process for forming an autodeposition coating on a metallic substrate by applying an autodeposition composition from a motile source thereof such as by spraying or by treating the surface with a continuous stream of the autodepositing composition. The figure shows an embodiment of the invention wherein the autodepositing composition is applied as a continuous stream along a metallic surface. The autodepositing composition is stored as an autodepositing bath (2) in a vessel (4). The object to be coated, typically a panel (6) having a metallic surface (8), is positioned so as to be impinged by a stream (10) of the autodeposition composition. The stream (10) is formed by passing the autodepositing composition from the bath (2) through a conduit (12) by the pressure generated by a pump (14). The autodepositing composition proceeds through the conduit (16) and is evacuated ouf of an exit port (18).
    • 本发明涉及一种在金属基材上形成自沉积涂层的方法,该方法是通过自动沉积组合物从其活性源施加,例如通过喷洒或用自动沉积组合物的连续流处理该表面。 该图示出了本发明的一个实施方案,其中自动沉积组合物沿着金属表面作为连续流施加。 自动沉积组合物作为自动沉积浴(2)储存在容器(4)中。 待涂覆的物体,通常是具有金属表面(8)的板(6),被定位成被自动沉积组合物的流(10)撞击。 通过由泵(14)产生的压力使自动沉积组合物从浴(2)通过导管(12)形成流(10)。 自动沉积组合物通过导管(16)进行并排出出口(18)。