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    • 55. 发明申请
    • ILLUMINATION SOURCE INCLUDING PHOTOLUMINESCENT MATERIAL AND A FILTER AND AN APPARATUS INCLUDING SAME
    • 包含光致变色材料的照射源和过滤器以及包括其的装置
    • WO2007133742A3
    • 2008-09-18
    • PCT/US2007011546
    • 2007-05-14
    • X RITE INCBYLSMA RICHARD B
    • BYLSMA RICHARD B
    • H01J1/62H01J63/04
    • G01J3/10G01J1/58G01N21/278G01N21/31H01L33/44H01L33/507H01L2224/48091H01L2224/73265H01L2924/00014
    • In spectroscopy or color measurement applications which characterize the transmission, absorption, emission or reflection of a target material (such as ink on paper, paint on metal, dyes on cloth, etc.), an illumination source must be present, as well as an apparatus to measure the reflected, transmitted or emitted light. One method for providing the illumination is using light emitted from light emitting diodes (LEDs). To adequately characterize the material properties of the target that would be seen by a human observer, illumination over the entire visible wavelength range from 400nm to 700nm is desirable. Individual white or chromatic LEDs and even multiple-LED assemblies, however, often do not provide adequate intensity at all wavelengths in this range. One known solution for tailoring the emission spectra of a LED to cover the desired illumination range is to use an interference filter in combination with the LED to filter out the unwanted wavelengths. Such an arrangement, however, is not practical where the source (e.g., the LED) does not emit sufficient energy at the desired wavelength. Also, such arrangements can be inefficient for certain applications where much of the energy emissions from the source may be filter out and therefore wasted.
    • 在光谱学或颜色测量应用中,其特征在于目标材料(例如纸上的油墨,金属上的油漆,布上的染料等)的透射,吸收,发射或反射,必须存在照明源,以及 测量反射,发射或发射光的装置。 提供照明的一种方法是使用从发光二极管(LED)发射的光。 为了充分地表征人类观察者可以看到的靶的材料性质,期望在400nm至700nm的整个可见光波长范围内的照明。 然而,单个白色或彩色LED以及甚至多个LED组件通常不能在该范围内的所有波长上提供足够的强度。 用于调整LED的发射光谱以覆盖期望的照明范围的一种已知解决方案是使用与LED组合的干涉滤光器来滤除不需要的波长。 然而,当源(例如,LED)在期望的波长处不发射足够的能量时,这种布置是不实际的。 此外,对于某些应用来说,这种布置可能是低效的,其中来自源的大量能量排放可能被过滤掉并因此被浪费。
    • 56. 发明申请
    • LIGHT SOURCE INCLUDING QUANTUM DOT MATERIAL AND APPARATUS INCLUDING SAME
    • 光源包括量子材料和装置,包括它们
    • WO2007133743A2
    • 2007-11-22
    • PCT/US2007/011547
    • 2007-05-14
    • X-RITE, INC.PETERSON, Steven, H.BYLSMA, Richard, B.
    • PETERSON, Steven, H.BYLSMA, Richard, B.
    • A61N1/00
    • G01J3/10B82Y30/00G01J1/58G01N21/278G01N21/31
    • A light source comprising a light emitting device and quantum dot material is disclosed. According to various embodiments, the quantum dot material is positioned relative to the light emitting device such that the quantum dot material absorbs light emitted from the light emitting device and converts the wavelengths of photons emitted from the light emitting device to longer wavelengths. Judicious selection of the quantum dot material allows the emission spectra of the light source to be tailored to meet the needs of a particular illumination application, and avoids the drawbacks associated with the use of interference filters because the quantum dot material can upconvert the wavelengths emitted from the light emitting device such that the emission spectra of the light source can include wavelengths that are not emitted by the light emitting device itself.
    • 公开了一种包括发光器件和量子点材料的光源。 根据各种实施例,量子点材料相对于发光器件定位,使得量子点材料吸收从发光器件发射的光并将从发光器件发射的光子的波长转换为更长的波长。 量子点材料的可靠选择允许光源的发射光谱被定制以满足特定照明应用的需要,并且避免与使用干涉滤光器相关联的缺点,因为量子点材料可以上变频从 发光装置使得光源的发射光谱可以包括不被发光装置本身发射的波长。
    • 57. 发明申请
    • METHOD AND APPARATUS FOR DETERMINING A VERTICAL INTENSITY PROFILE THROUGH A PLANE OF FOCUS IN A CONFOCAL MICROSCOPE
    • 用于通过共焦显微镜中的焦平面确定垂直强度分布的方法和设备
    • WO2006031759A2
    • 2006-03-23
    • PCT/US2005032467
    • 2005-09-12
    • WOJCIECHOWSKI JOEL C
    • WOJCIECHOWSKI JOEL C
    • G01J1/00
    • G02B27/32G01J1/38G01J1/4257G01J1/58G02B21/0024G02B21/006G02B21/34
    • An assembly is provided for the direct measurement of a vertical intensity profile through a plane of focus of a confocal microscope, a determination of a depth of the confocal plane and a maximum intensity of the intensity profile. The assembly includes a transparent substrate in which is embedded a scale having a graduated length, wherein the scale is inclined relative to a local portion of an illuminating beam on an illuminating path of the confocal microscope. The graduated scale is configured to be illuminated with an intensity corresponding to the position within the plane of focus along the axis of the illuminating beam. The inclination of the scale and the path of the illuminating beam are at a predetermined angle. The graduated scale can be fluorescently dyed to illuminate with an absorption frequency relevant to a light source or illuminating beam of the confocal microscope. An algorithm employing trigonometric functions and calculating the confocal plane depth of the specimen is disclosed.
    • 提供一个组件用于通过共聚焦显微镜的焦平面直接测量垂直强度分布,确定共焦平面的深度和强度分布的最大强度。 该组件包括透明衬底,在其中嵌入具有渐变长度的标尺,其中标尺相对于共焦显微镜照明路径上的照射束的局部部分倾斜。 刻度刻度被配置为以与沿着照明光束的轴线的焦平面内的位置相对应的强度来照明。 标尺的倾斜度和照明光束的路径处于预定角度。 刻度尺可以荧光染色以照射与共聚焦显微镜的光源或照明光束相关的吸收频率。 公开了一种采用三角函数并计算样本的共焦平面深度的算法。
    • 60. 发明申请
    • TEMPERATURE SENSING IN CONTROLLED ENVIRONMENT
    • 控制环境温度感测
    • WO2003021216A1
    • 2003-03-13
    • PCT/US2002/027517
    • 2002-08-28
    • INVAX TECHNOLOGIES
    • KHAN, Abid, L.
    • G01J5/00
    • G01J1/58G01J5/0003G01K11/3213
    • A Temperature-sensing apparatus is mounted within a wafer chuck (7) to contact the underside surface of a wafer that is secured by the chuck. A sensing element (23) having a photoluminescent materiel thereon is mounted in resilient contact with the wafer and emits a luminous flux in response to radiant energy stimulation with a characteristic intensity that varies with time as a function of temperature. A remote optical analyzer (39) supplies pulses of the radiant energy and receives the luminous flux to determine the temperature of the sensing element when it is in contact with the wafer. An optical channel (38) guides the radiant energy from the photoluminescent material to the remote optical analyzer.
    • 温度感测装置安装在晶片卡盘(7)内以接触由卡盘固定的晶片的下表面。 在其上具有光致发光材料的感测元件(23)以与晶片弹性接触的方式安装,并响应于以随时间变化的特征强度作为温度的函数而发射光束。 远程光学分析器(39)提供辐射能量的脉冲并接收光通量以确定感测元件与晶片接触时的温度。 光通道(38)将辐射能量从光致发光材料引导到远程光学分析器。