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    • 51. 发明申请
    • OPTICAL INTERCONNECT
    • 光学互连
    • WO2009017771A2
    • 2009-02-05
    • PCT/US2008/009226
    • 2008-07-30
    • HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P.FATTAL, DavidBICKNELL, RobertSANTORI, CharlesWU, Wei
    • FATTAL, DavidBICKNELL, RobertSANTORI, CharlesWU, Wei
    • G02B6/36G02B6/38
    • H04B10/803
    • An optical interconnect (100, 200, 300, 400, 445) includes a first circuit board (140, 260, 350, 405) having an optical source (110, 210, 240, 305, 440) and an optical receiver (125, 220, 235, 315, 441); and a second circuit board (145, 265, 355, 410) having data source (105, 205, 250) and an optical modulator (225, 230, 310, 425, 430, 435) optically coupled with the optical source (110, 210, 240, 305, 440) and optical receiver (125, 220, 235, 315, 441), wherein the optical modulator (225, 230, 310, 425, 430, 435) is configured to encode data from the data source (105, 205, 250) into an optical signal from the optical source (110, 210, 240, 305, 440). The optical receiver (125, 220, 235, 315, 441) is configured to receive the optical signal from the optical modulator (225, 230, 310, 425, 430, 435). A method of optical communication includes generating on a first circuit board (140, 260, 350, 405) an optical signal directed at a second circuit board (145, 265, 355, 410); modulating the optical signal with data at the second circuit board (145, 265, 355, 410); reflecting the optical signal to the first circuit board (140, 260, 350, 405); and demodulating the optical signal to receive the data at the first circuit board (140, 260, 350, 405).
    • 一种光学互连(100,200,300,400,445)包括具有光源(110,210,240,305,440)的第一电路板(140,260,350,405) )和光接收器(125,220,235,315,441); 以及具有数据源(105,205,250)和光学耦合于所述光源(110,115)的光调制器(225,230,310,425,430,435)的第二电路板(145,265,355,410) ,其中所述光调制器(225,230,310,425,430,435)被配置为对来自所述数据源的数据进行编码( 105,205,250)转换成来自光源(110,210,240,305,440)的光信号。 光接收器(125,220,235,315,441)被配置为从光调制器(225,230,310,425,430,435)接收光信号。 一种光通信的方法包括在第一电路板(140,260,350,405)上产生指向第二电路板(145,265,355,410)的光信号; 用第二电路板(145,265,355,410)处的数据调制光信号; 将光信号反射到第一电路板(140,260,350,405); 以及解调光信号以在第一电路板(140,260,350,405)处接收数据。
    • 52. 发明申请
    • FREE SPACE WDM SIGNAL DETECTOR
    • 免费空间WDM信号检测器
    • WO2009017610A1
    • 2009-02-05
    • PCT/US2008/008744
    • 2008-07-16
    • HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P.BEAUSOLEIL, RaymondWU, WeiFATTAL, DavidFIORENTINO, Marco
    • BEAUSOLEIL, RaymondWU, WeiFATTAL, DavidFIORENTINO, Marco
    • G02B6/28
    • H04B10/1121
    • A system (100) can include a transmitter (114) that produces an optical signal (118) having a plurality of carrier frequencies and a receiver (116) separated from the transmitter (114) by free space through which the optical signal (118) propagates. The receiver (116) includes an array (200) of detectors of multiple types, with the types being capable of detecting light respectively having the carrier frequencies. A location of an incident area (220) where the optical signal (118) is incident on the detector array (200) generally depends on a misalignment of the receiver (116) relative to the transmitter (114) , but the detectors in the detector array (200) are arranged so that at least one detector of each of the types detects light from the optical signal (118) regardless of where the incident area (220) is on the detector array (200).
    • 系统(100)可以包括产生具有多个载波频率的光信号(118)的发射机(114)和与发射机(114)分离的自由空间的接收机(116),通过该自由空间,光信号(118) 传播。 接收器(116)包括多个类型的检测器的阵列(200),其类型能够检测分别具有载波频率的光。 光信号(118)入射到检测器阵列(200)上的入射区域(220)的位置通常取决于接收器(116)相对于发射器(114)的未对准,但检测器中的检测器 阵列(200)布置成使得每种类型的至少一个检测器检测来自光信号(118)的光,而不管入射面积(220)在检测器阵列(200)上的位置。
    • 53. 发明申请
    • OPTICAL INTERCONNECT
    • 光学互联
    • WO2009002419A1
    • 2008-12-31
    • PCT/US2008/007554
    • 2008-06-16
    • HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P.WANG, Shih-yuanSIGALAS, MihailWU, Wei
    • WANG, Shih-yuanSIGALAS, MihailWU, Wei
    • G02B6/36
    • H04B10/803
    • An optical interconnect (100. 300, 400, 500, 600) has a plurality of optical data sources (125, 130, 135, 525, 530, 535), a plutality of optical data receivers (155, 160, 165, 555, 560, 565), a diffractive optical element (186, 320, 440, 670) configured to diffract an optical beam (176, 335, 435, 650) from at least one alignment optical source (170, 360, 460, 625) to at leats one sensor (370, 375, 470, 475, 640, 645), and an aligning element configured to align optical beams (120, 345, 445, 570, 650) from the optical data sources (125, 130, 135, 525, 530, 535) to said optical data receivers (155, 160, 165, 555, 560, 565), according to readings from the sensor (370, 375, 470, 475, 640, 645).
    • 光学互连(100,300,400,500,600)具有多个光学数据源(125,130,135,525,530,535),光学数据接收器(155,160,165,555, 被配置为将光束(176,335,435,650)从至少一个对准光源(170,360,460,625)衍射到 在一个传感器(370,375,470,475,640,645)上的对准元件被配置成使光束(120,345,445,570,650)与光学数据源(125,130,135,650)对准, 根据来自传感器(370,375,470,475,640,645)的读数,将所述光学数据接收器(155,160,165,555,560,556)分配给所述光学数据接收器(155,160,165,555,560,556)。
    • 54. 发明申请
    • CONTACT LITHOGRAPHY APPARATUS, SYSTEM AND METHOD
    • 联系人地平线设备,系统和方法
    • WO2008048491A2
    • 2008-04-24
    • PCT/US2007/021813
    • 2007-10-12
    • HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P.WU, WeiWANG, Shih-YuanLI, ZhiyongWALMSLEY, Robert
    • WU, WeiWANG, Shih-YuanLI, ZhiyongWALMSLEY, Robert
    • G03F7/00G03F7/20
    • G03F7/0002B82Y10/00B82Y40/00G03F7/7035
    • A contact lithography system (100, 200) includes a patterning tool (110, 228a, 510) bearing a pattern (112); a substrate chuck (214) for chucking a substrate (130, 228b) to receive the pattern (112) from the patterning tool (110, 228a, 510); where the system (100, 200) deflects a portion of either the patterning tool (110, 228a, 510) or the substrate (130, 228b) to bring the patterning tool (110, 228a, 510) and a portion of the substrate (130, 228b) into contact; and a stepper (260) for repositioning either or both of the patterning tool (110, 228a, 510) and substrate (130, 228b) to align the pattern (112) with an additional portion of the substrate (130, 228b) to also receive the pattern (112). A method of performing contact lithography comprising: deflecting a portion of either a patterning tool (110, 228a, 510) or a substrate (130, 228b) to bring the patterning tool (110, 228a, 510) and a portion of the substrate (130, 228b) into contact; and repositioning either or both of the patterning tool (110, 228a, 510) and substrate (130, 228b) to align a pattern (112) on the patterning tool (110, 228a, 510) with an additional portion of the substrate (130, 228b) to also receive the pattern (112).
    • 接触光刻系统(100,200)包括具有图案(112)的图案形成工具(110,228a,510); 用于夹持基板(130,228b)以从所述图形化工具(110,228a,510)接收所述图案(112)的基板卡盘(214); 其中所述系统(100,200)偏转所述图案形成工具(110,228a,510)或所述衬底(130,228b)的一部分以使所述图案形成工具(110,228a,510)和所述衬底的一部分 130,228b)接触; 以及用于重新定位所述图案形成工具(110,228a,510)和衬底(130,228b)中的一个或两个以使所述图案(112)与所述衬底(130,228b)的附加部分对准的步进器(260) 接收图案(112)。 一种执行接触光刻的方法,包括:使图案形成工具(110,228a,510)或衬底(130,228b)的一部分偏转以使图案形成工具(110,228a,510)和衬底的一部分 130,228b)接触; 以及重新定位图案形成工具(110,228a,510)和衬底(130,228b)中的一个或两个以使图案形成工具(110,228a,510)上的图案(112)与衬底的附加部分(130 ,228b)以也接收图案(112)。
    • 55. 发明申请
    • METHODS AND SYSTEMS FOR PERFORMING LITHOGRAPHY, METHODS FOR ALIGNING OBJECTS RELATIVE TO ONE ANOTHER, AND NANOIMPRINTING MOLDS HAVING NON-MARKING ALIGNMENT FEATURES
    • 用于执行算术的方法和系统,与其他方法对准对象的方法,以及具有非标记对齐特征的纳米粒子
    • WO2008016651A2
    • 2008-02-07
    • PCT/US2007/017195
    • 2007-07-30
    • HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P.PICCIOTTO, CarlGAO, JunWU, WeiYU, Zhaoning
    • PICCIOTTO, CarlGAO, JunWU, WeiYU, Zhaoning
    • G03F9/7092G03F9/7038G03F9/7042G03F9/7088
    • Methods of performing lithography include calculating a displacement vector (74) for a lithography tool (50) using an image (60) of a portion of the lithography tool (50) and a portion of a substrate (10) and an additional image (28) of a portion of an additional lithography tool (30) and a portion of the substrate (10). Methods of aligning objects include positioning a second object (30) proximate a first object (10) and acquiring a first image (38) illustrating a feature (32) on a surface of the second object (30) and a feature (18) on a surface of the first object (10). As additional object (50) is positioned proximate the first object (10), and an additional image (60) is acquired that illustrates a feature (52) on a surface of the additional object (50) and the feature (18) on the surface of the first object (10). The additional image (60) is compared with the first image (38). Imprint molds (30, 50) include at least one non-marking reference feature (32, 52) on animprinting surface of the imprint molds (30, 50).
    • 执行光刻的方法包括使用光刻工具(50)的一部分的图像(60)和基底(10)的一部分和附加图像(28)来计算光刻工具(50)的位移矢量(74) )附加光刻工具(30)的一部分和基底(10)的一部分。 对准对象的方法包括定位邻近第一物体(10)的第二物体(30)并且获取第二图像(38),该第一图像(38)示出在第二物体(30)的表面上的特征(32) 第一物体(10)的表面。 随着附加物体(50)被定位在第一物体(10)附近,并且获取附加图像(60),其示出了附加物体(50)的表面上的特征(52)和 第一物体(10)的表面。 将附加图像(60)与第一图像(38)进行比较。 压印模具(30,50)包括在压印模具(30,50)的印模表面上的至少一个非标记参考特征(32,52)。