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    • 36. 发明申请
    • HIGH-STIFFNESS STRUCTURE FOR LARGER APERTURE TELESCOPE
    • 用于大型光纤电缆的高刚度结构
    • WO2017058352A1
    • 2017-04-06
    • PCT/US2016/044920
    • 2016-07-29
    • RAYTHEON COMPANY
    • BULLARD, Andrew L.MAKOWSKI, Maciej D.
    • G02B7/183
    • G02B23/16G02B7/183G02B23/06
    • A triangular frame metering structure (112, 312) includes three side beams (201-203) and three end pieces (204-206) each connected between two of the side beams. Each end piece top (212) and bottom (213) is configured for connection of support loads (104, 304, 108, 308), with all support loads connecting to the metering structure at the top or bottom of one of the end pieces. Secondary mirror focusing mechanisms mounted on the end piece tops support pairs of secondary mirror struts (103). Strut mounts on the end piece bottoms provide connections to pairs of primary mirror struts (106), base struts (109), and instrument struts (111). All support loads connected to the metering structure are thus connected only to the corners of the metering structure and are connected at a same radial distance from a central longitudinal axis. The metering structure has reduced mass with high stiffness for supporting large aperture telescopes.
    • 三角形框架计量结构(112,312)包括分别连接在两个侧梁之间的三个侧梁(201-203)和三个端部件(204-206)。 每个端部件顶部(212)和底部(213)构造成用于连接支撑负载(​​104,304,108,308),其中所有支撑负载在一个端部件的顶部或底部处连接到计量结构。 安装在端部件顶部上的辅助反射镜聚焦机构支撑成对的副镜支撑件(103)。 支柱底座上的支柱提供连接到主镜支架(106),基部支杆(109)和仪器支柱(111)的对。 连接到计量结构的所有支撑负载因此仅连接到计量结构的角部并且以与中心纵向轴线相同的径向距离连接。 计量结构具有减小的质量,高刚度用于支撑大孔径望远镜。
    • 39. 发明申请
    • SYSTEMS FOR ALIGNING AN OPTICAL ELEMENT AND METHOD THEREFOR
    • 用于调整光学元件的系统及其方法
    • WO2012041462A3
    • 2012-08-30
    • PCT/EP2011004767
    • 2011-09-23
    • ZEISS CARL SMT GMBHPNINI-MITTLER BOAZ
    • PNINI-MITTLER BOAZ
    • B25J9/16G02B7/182G02B7/183
    • G02B5/08B25J9/1623B25J9/1692G02B5/0891G02B7/1824G03F7/70825
    • A hexapod system for aligning an optical element in semiconductor clean rooms or in a vacuum, particularly in an illumination device for a microlithographic EUV projection exposure apparatus, comprises six hexapod supporting structures (42, 44, 46, 94; 42', 44', 46', 94', 106). Using a set of at least two replaceable spacer elements (94; 94') having a different extent in at least one direction, at least one of the six supporting structures (42, 44, 46, 94; 42', 44', 46', 94', 106) can be adjusted. The latter is adapted so that a spacer element (94; 94') can be removed or a spacer element (94; 94') can be added while the coupling of the first coupling end (46; 46') to the carrying structure (38; 38') and the coupling of the second coupling end (54a; 54') to the optical element (34; 34') are maintained. As an alternative, a hexapod system having six hexapod supporting structures (42, 44, 46, 94; 42', 44', 46', 94', 106) is provided, in which each supporting structure (42, 44, 46, 94; 42', 44', 46', 94', 106) comprises at least one monolithic articulation (60, 76; 60', 76'). By means of a set of at least two replaceable spacer elements (94), the working length of at least one of the six supporting structures (42, 44, 46, 94; 42', 44', 46 ', 94', 106) can be adjusted. A method for aligning an optical element in semiconductor clean rooms or in a vacuum by means of a hexapod system is furthermore provided.
    • 用于在半导体洁净室或真空中对准光学元件的六足(hexapod)系统,特别是在用于微光刻EUV投影曝光设备的照明装置中,包括六个六足支撑结构(42,44,46,94; 42',44' 46',94',106)。 使用一组至少两个在至少一个方向上具有不同程度的可更换间隔元件(94; 94'),六个支撑结构(42,44,46,94; 42',44',46' ',94',106)可以调整。 后者适于在第一联接端(46; 46')联接到承载结构(94; 94')时可以去除间隔元件(94; 94')或者可以添加间隔元件 38; 38')并且保持第二联接端(54a; 54')与光学元件(34; 34')的联接。 作为替代,提供了具有六个六足支撑结构(42,44,46,94; 42',44',46',94',106)的六足式系统,其中每个支撑结构(42,44,46,48) 94',42',44',46',94',106)包括至少一个单体式铰接件(60,76; 60',76')。 借助于一组至少两个可更换的间隔元件(94),六个支撑结构(42,44,46,94; 42',44',46',94',106')中的至少一个的工作长度 )可以调整。 此外还提供了一种通过六足式系统在半导体洁净室或真空中对准光学元件的方法。