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    • 34. 发明申请
    • 単結晶シリコン引き上げ用シリカ容器及びその製造方法
    • 用于绘制单晶硅的二氧化硅及其生产方法
    • WO2013171937A1
    • 2013-11-21
    • PCT/JP2013/000890
    • 2013-02-19
    • 信越石英株式会社
    • 山形 茂
    • C30B29/06C03B20/00C30B15/10
    • C03B19/02C03B19/095C03B2201/04C03B2201/07C03B2201/23C03B2201/54C03C3/06C03C8/02C03C10/0009C03C21/008C03C23/007C03C2201/02C03C2201/54C03C2201/80C03C2203/10C30B15/10C30B29/06Y02P40/57Y10T117/1032
    •  本発明は、内側に透明シリカガラスから成る透明層を有し、外側に気泡を含有する不透明シリカガラスから成る不透明層を有する単結晶シリコン引き上げ用シリカ容器であって、前記透明層が、前記シリカ容器の内表面側に位置し、OH基を200~2000massppmの濃度で含有する高OH基層と、該高OH基層よりもOH基濃度が低い低OH基層とから成り、前記高OH基層がBaを50~2000massppmの濃度で含有するものである単結晶シリコン引き上げ用シリカ容器である。これにより、単結晶シリコン引き上げ用にシリカ容器を用いた場合に、該容器使用開始後短時間のうちに該容器の透明シリカガラスから成る内側表面の全面が微細結晶化(グラスセラミックス化)することにより、該容器内側表面のシリコン融液に対する耐エッチング性(耐侵食性)を大幅に向上させるようなシリカ容器、及び、そのようなシリカ容器の製造方法が提供される。
    • 这种二氧化硅容器用于制造单晶硅,并且在内部具有包括透明石英玻璃的透明层,并且在外部具有包含含有气泡的不透明石英玻璃的不透明层。 透明层位于二氧化硅容器的内表面侧,并且包含OH基浓度为200-2000质量ppm的OH基团和OH基浓度低于OH基浓度的低OH基层的高OH基层。 的高OH基层,高OH基层含有Ba的50-2000质量ppm的浓度。 结果,提供了:二氧化硅容器,使得当二氧化硅容器用于制备单晶硅时,容器内表面相对于熔融硅的耐腐蚀性(耐侵蚀性)通过整个 包含容器的透明石英玻璃的内表面的表面在容器使用开始后的短时间内被微晶化(玻璃化); 以及这种二氧化硅容器的制造方法。
    • 38. 发明申请
    • SOL-GEL PROCESS FOR PRODUCING SYNTHETIC SILICA GLASS
    • 用于生产合成二氧化硅玻璃的溶胶凝胶工艺
    • WO01053225A1
    • 2001-07-26
    • PCT/US2001/002325
    • 2001-01-23
    • C03B8/02C03B19/12C03C3/06C03C1/00
    • C03C3/06C03B19/12C03C2201/02C03C2201/32C03C2201/3476C03C2201/36C03C2201/40C03C2201/42C03C2203/22C03C2203/26C03C2203/34
    • An improved sol-gel process is disclosed for producing a synthetic silica glass article, in which a sol is formed having a silica loading as high as 34 to 40 %. This high loading is achieved by introducing an aqueous colloidal silica suspension into a silicon alkoxide solution and slowly stirring the mixture together, during which time the mixture hydrolyzes and the colloidal suspension is broken down by chemical reaction. This produces a hydrolyzed sol incorporating a suspension of very fine aggregates of colloidal particles, having particle sizes less than about 10 microns. The need for a stabilizing agent and/or continuous ultra-sonicating or violently stirring the sol is eliminated. One application of the process of the invention is in making silica photoblanks exhibiting very high optical transmission at UV wavelengths. For such applications, the silica powder is purified using a chlorination step prior to its being made into the aqueous colloidal silica suspension. In addition, warpage of the silica photoblanks is avoided by using silicon carbide plates as weights during sintering.
    • 公开了一种改进的溶胶 - 凝胶法,用于生产合成石英玻璃制品,其中形成具有高达34至40%的二氧化硅载量的溶胶。 通过将水性胶体二氧化硅悬浮液引入硅醇溶液中并缓慢搅拌混合物来实现该高负载,在此期间混合物水解,并且胶体悬浮液通过化学反应分解。 这产生了一种水合溶胶,其结合了非常细的胶体颗粒聚集体的悬浮液,其具有小于约10微米的粒度。 消除了对稳定剂和/或连续超声波或剧烈搅拌溶胶的需要。 本发明方法的一个应用是使二氧化硅photoblank在UV波长下表现出非常高的光学透射率。 对于这种应用,二氧化硅粉末在制成水性胶体二氧化硅悬浮液之前,使用氯化步骤进行纯化。 此外,通过在烧结期间使用碳化硅板作为重量来避免二氧化硅照相片的翘曲。
    • 39. 发明申请
    • QUARTZ GLASS CRUCIBLE AND METHOD FOR THE PRODUCTION THEREOF
    • 石英玻璃坩埚和方法进行生产
    • WO01046077A1
    • 2001-06-28
    • PCT/EP2000/012686
    • 2000-12-14
    • C03B20/00C03B19/09C30B15/10C30B35/00F27B14/10C03C3/06
    • C03C3/06C03B19/09C03B19/095C03B2201/04C03C2201/02C03C2201/23C03C2201/80C30B15/10C30B35/002Y10S65/04Y10T428/131
    • The invention relates to a crucible characterized in that said crucible is of high purity and high opacity or exhibits low transmission characteristics in the IR range and is derived from a quartz glass crucible known in prior art. Said crucible known in prior art has a crucible body which is symmetrical about a rotational axis and said body is made of opaque quartz glass, whereby the crucible has an outer zone (3) made of opaque quartz glass which projects radially inwards to an inner zone (2) made of transparent quartz glass having a density of at least 2.15 g/cm . The crucible body (1) is made of a synthetic SiO2 granulate with a specific surface (according to BET) in the range of 0.5 m /g to 40 m /g and having a stamp density of at least 0.8 g/cm and is produced from an at least partially porous agglomerate of SiO2 primary particles. A method for producing said quartz glass crucible is characterized according to the invention in that during the production of said crucible, an at least partially porous agglomorate of synthetically produced SiO2 granulate made of SiO2 primary particles is produced having a specific surface (according to BET) in the range of 0.5 m /g to 40 m /g and a stamp density of at least 0.8 g/cm . Heating is performed in such a manner that a vitrification front progresses from the inside to the outside of an inner zone (4) made of transparent quartz glass.
    • 为了从一个已知的石英玻璃坩埚开始与周围不透明石英玻璃的具有外区中的旋转轴坩埚主体对称(3)不透明石英玻璃构成,在内部区域径向向内(2)具有至少2.15克密度透明石英玻璃的 /厘米<3>通过提供一种石英玻璃坩埚,其特征是高纯度,高的不透明度和在IR范围内的低传输,根据它建议将锅体(1)由合成二氧化硅颗粒(具有特定的表面的本发明 /克至40μm<2> / g,且至少为0.8的夯实密度克/厘米<3>,它是由BET在0.5微米<2>的SiO至少部分多孔附聚物2个一次粒子的范围形成的) 被产生。 一种用于制造这样的石英玻璃坩埚的方法是根据本发明的特征在于,合成产生的SiO至少部分多孔附聚物其 2的特征在于<形成一次粒子的SiO> 2 <颗粒使用具有比表面积(按照BET) > /克至40μm<2> / g,且至少为0.8的夯实密度克/厘米<3>在0.5毫升2的范围内,其中所述加热进行,使得内部区域的形成(4) 玻璃化前从内侧向透明石英玻璃的外侧进行。
    • 40. 发明申请
    • METHOD FOR PREPARATION OF SYNTHETIC VITREOUS SILICA AND APPARATUS FOR HEAT TREATMENT
    • 合成二氧化硅的制备方法和热处理装置
    • WO01012566A1
    • 2001-02-22
    • PCT/JP2000/005412
    • 2000-08-11
    • C03B8/04C03B19/14C03B25/02C03B32/00C03C3/06C03C23/00C03B20/00
    • C03B19/1484C03B19/1453C03B25/02C03B32/00C03C3/06C03C23/007C03C2201/02C03C2203/40C03C2203/52
    • A method for preparation of a synthetic vitreous silica which comprises a first step comprising ejecting a silicon compound together with a combustion gas containing oxygen and hydrogen from a burner, to hydrolyze the silicon compound in an oxyhydrogen flame and form vitreous silica particles, and depositing the silica particles onto a target being opposed to the burner, to thereby produce a transparent synthetic vitreous silica ingot, a second step of heating the silica ingot to a first holding temperature of 900 DEG C or higher and holding it at the temperature, and then cooling it to a temperature of 500 DEG C or less by a temperature-decreasing rate of 10 DEG C/hr or less, and a third step of heating the resultant glass ingot to a second holding temperature of from 500 DEG C to 1100 DEG C and holding it at the temperature, and then cooling it to a temperature 100 DEG C lower than the second holding temperature by a temperature-decreasing rate of 50 DEG C/hr or greater.
    • 一种合成玻璃状二氧化硅的制备方法,包括第一步骤,包括将来自燃烧器的含有氧和氢的燃烧气体与硅化合物一起喷出,在氢氧焰中水解硅化合物并形成二氧化硅玻璃颗粒,并沉积 将二氧化硅颗粒放置在与燃烧器相对的靶上,由此制造透明的合成玻璃态石英锭,将二氧化硅锭加热至第一保持温度为900℃以上并将其保持在该温度的第二步骤,然后冷却 以10℃/小时以下的降温速度将其加热至500℃以下的温度,将第三工序加热至500〜1100℃的第二保持温度, 将其保持在温度下,然后以50℃/ hr以上的降温速度将其冷却至比第二保持温度低100℃的温度。