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31. 发明申请

WO2005063431A1 METHOD OF AND ARRANGEMENT FOR SEPARATING SEMICONDUCTOR ELEMENTS FORMED IN A WAFER OF SEMICONDUCTOR MATERIAL, AND SEMICONDUCTOR ELEMENT SEPARATED THEREWITH 审中-公开
标题翻译：用于分离在半导体材料中形成的半导体元素的方法和装置以及分离的半导体元件
公开(公告)号：WO2005063431A1
公开(公告)日：2005-07-14
申请号：PCT/NL2004/000923
申请日：2004-12-29
申请人： ADVANCED LASER SEPARATION INTERNATIONAL (ALSI) B.V. , CHALL, Hans, Peter , VAN PANHUYS, Haro, Egbert, Georg, Roderik
发明人： CHALL, Hans, Peter , VAN PANHUYS, Haro, Egbert, Georg, Roderik
IPC分类号： B23K26/04
CPC分类号： H01L21/78 , B23K26/04 , B23K26/38 , B23K26/40 , B23K2201/40 , B23K2203/50
摘要： The present invention provides a method of separating semiconductor elements formed in a wafer of semiconductor material using a laser for forming a score on a surface of said wafer. Said method comprises the steps of focussing said laser in a focus point on said wafer surface using a focussing lens, moving said laser relative to said wafer for forming said score, and prior to said step of moving said laser relative to said wafer, in steps 2-3, measuring and providing a heightmap of said wafer surface of heights of surface irregularities of said wafer surface relative to an imaginary reference plane parallel to said wafer surface. During the movement of the laser relative to the wafer, in steps 4-5, said laser is maintained focussed on said wafer surface.
摘要翻译：本发明提供了使用在所述晶片的表面上形成刻痕的激光来分离形成在半导体材料晶片中的半导体元件的方法。所述方法包括以下步骤：使用聚焦透镜将聚焦点上的所述激光聚焦在所述晶片表面上，使所述激光相对于所述晶片移动以形成所述刻痕，并且在所述步骤相对于所述晶片移动所述激光之前，以步骤 2-3，测量和提供所述晶片表面相对于平行于所述晶片表面的虚拟参考平面的所述晶片表面的高度的高度图。在激光器相对于晶片移动期间，在步骤4-5中，所述激光器被保持聚焦在所述晶片表面上。

32. 发明申请

WO2005038994A2 LASER-BASED SYSTEM FOR MEMORY LINK PROCESSING WITH PICOSECOND LASERS 审中-公开
标题翻译：基于激光的系统，用于使用PICOSECOND激光进行存储器链接处理
公开(公告)号：WO2005038994A2
公开(公告)日：2005-04-28
申请号：PCT/US2004/032661
申请日：2004-10-05
申请人： GSI LUMONICS CORPORATION , GU, Bo , SMART, Donald, V. , CORDINGLEY, James, J. , LEE, Joohan , SVETKOFF, Donald, J. , JOHNSON, Shepard, D. , EHRMANN, Jonathan, S.
发明人： GU, Bo , SMART, Donald, V. , CORDINGLEY, James, J. , LEE, Joohan , SVETKOFF, Donald, J. , JOHNSON, Shepard, D. , EHRMANN, Jonathan, S.
IPC分类号： H01S
CPC分类号： H01S3/2383 , B23K26/04 , B23K26/0624 , B23K26/0626 , B23K26/0736 , B23K26/361 , B23K26/389 , B23K26/40 , B23K2201/38 , B23K2201/40 , B23K2203/10 , B23K2203/12 , B23K2203/172 , H01L21/485 , H01L21/76894 , H01L22/12 , H01L23/5258 , H01L2924/0002 , H01S3/0085 , H01S3/06758 , H01S3/1618 , H01S3/23 , H05K3/0026 , H01L2924/00
摘要： A laser-based system for processing target material within a microscopic region without causing undesirable changes in electrical or physical characteristics of at least one material surrounding the target material, the system includes a seed laser, an optical amplifier, and a beam delivery system. The seed laser for generating a sequence of laser pulses having a first pre-determined wavelength. The optical amplifier for amplifying at least a portion of the sequence of pulses to obtain an amplified sequence of output pulses. The beam delivery system for delivering and focusing at least one pulse of the amplified sequence of pulses onto the target material. The at least one output pulse having a pulse duration in the range of about (10) picoseconds to less than (1) nanosecond. The pulse duration being within a thermal processing range. The at least one focused output pulse having sufficient power density at a location within the target material to reduce the reflectivity of the target material and efficiently couple the focused output into the target material to remove the target material.
摘要翻译：一种用于在微观区域内处理目标材料而不引起围绕靶材料的至少一种材料的电学或物理特性的不希望的变化的基于激光的系统，该系统包括种子激光器，光学放大器和光束传递系统。用于产生具有第一预定波长的激光脉冲序列的种子激光器。用于放大脉冲序列的至少一部分以获得放大的输出脉冲序列的光放大器。用于将放大的脉冲序列的至少一个脉冲传送和聚焦到目标材料上的光束传送系统。所述至少一个输出脉冲具有在约（10）皮秒至小于（1）纳秒范围内的脉冲持续时间。脉冲持续时间在热处理范围内。所述至少一个聚焦输出脉冲在目标材料内的位置处具有足够的功率密度，以减少目标材料的反射率并有效地将聚焦的输出耦合到目标材料中以去除目标材料。

33. 发明申请

WO2005016587A1 VERFAHREN ZUR BESTIMMUNG DER OBERFLÄCHENPOSITION EINES WERKSTÜCKES INNERHALB EINER LASERBEARBEITUNGSMASCHINE 审中-公开
标题翻译：方法用于确定所述表面位置的工件内部的激光加工机
公开(公告)号：WO2005016587A1
公开(公告)日：2005-02-24
申请号：PCT/EP2004/050535
申请日：2004-04-16
申请人： SIEMENS AKTIENGESELLSCHAFT , METKA, Uwe
发明人： METKA, Uwe
IPC分类号： B23K26/04
CPC分类号： H05K3/0008 , B23K26/04 , B23K2201/42 , H05K1/0269 , H05K3/0026 , H05K2201/09918
摘要： Bei dem Verfahren zur Bestimmung der OberflächenHöhenposition eines Werkstücks (6) innerhalb einer Laserbearbeitungsmaschine, bei der ein Laserstrahl (2) über eine Fokussieroptik (4) auf das auf einem Träger (5) angeordnete Werkstück (6) gerichtet wird, wird zumindest eine auf der 0berfläche des Trägers angeordnete Marke (9) mittels einer Kamera in mehreren vorgegebenen Höhenpositionen (z -3 bis z 3 ) des Trägers vermessen. Eine durch die Marke vorgegebene Messdistanz (B) ergibt bei den unterschiedlichen Höhenpositionen unterschiedliche Messwerte, aus denen eine Eichkurve abgeleitet wird. Eine auf dem Werkstück (6) vorgesehene Marke (9*) wird in gleicher Weise in einer bestimmten Höhenposition des Trägers (5) vermessen. Durch Vergleich des auf dem Werkstück gewonnenen Messwertes mit der Eichkurve ergibt sich die genaue Höhe des Werkstücks.
摘要翻译：在用于在其中激光束（2）通过聚焦光学系统（4），布置成在载体上的激光加工机内确定的工件（6）的表面高度位置的方法（5）工件（6）被引导，至少一个在载体的0berfläche布置在多个预定的高度位置的（Z3到Z3）载体的测量通过照相机的手段标记（9）。通过预定的测量距离（B）的标记导致不同的测量值，从该校准曲线是在不同的高度位置的。阿对工件（6）在载体的一定高度位置上设置标记（9 *）以相同的方式进行测量（5）。通过与校准曲线的工件测量值所获得的比较给出了工件的确切高度。

34. 发明申请

WO2005001552A1 眼鏡レンズの製造方法、マーキング装置、マーキングシステム、眼鏡レンズ审中-公开
标题翻译：玻璃镜片，标记装置，标记系统，玻璃镜片的生产方法
公开(公告)号：WO2005001552A1
公开(公告)日：2005-01-06
申请号：PCT/JP2004/009473
申请日：2004-06-28
申请人：セイコーエプソン株式会社
发明人：伊藤歩 , 澤木大輔
IPC分类号： G02C7/02
CPC分类号： B23K26/04 , B23K26/043 , B23K2201/007 , B41M5/262 , G02C7/021
摘要： A laser beam is condensed inside a glasses lens (L1) to form a mark (10A). The mark (10A) is formed in a direction almost in parallel to the optical axis of the glasses lens (L1) without obstructing a wearer's view. Positioning is made by allowing the optical reference position (L0) of the glasses lens (L1) to agree with the reference position (T) of a marking device (3), and the glasses lens (L1), after being mounted to the retaing unit (11) of the marking device (3), is positoned based on the optical reference position (L0) of the glasses lens (L1). The glasses lens (L1) is then moved to a marking start position to carry out marking. A pair of hidden marks formed on the glasses lens (L1) are used to adjust the position of the glasses lens (L1), whereby the optical reference position (L0) can be made to agree with the reference position (T) of the marking device (3).
摘要翻译：激光束在玻璃透镜（L1）内聚光以形成标记（10A）。标记（10A）在几乎平行于眼镜镜片（L1）的光轴的方向上形成，而不妨碍佩戴者的视野。通过允许眼镜镜片（L1）的光学基准位置（L0）与标记装置（3）的基准位置（T）一致并且眼镜镜片（L1）在安装到报复基于眼镜镜片（L1）的光学基准位置（L0）将标记装置（3）的单元（11）定位。然后将眼镜镜片（L1）移动到标记开始位置以进行标记。使用形成在眼镜镜（L1）上的一对隐藏标记来调节眼镜（L1）的位置，从而使光学基准位置（L0）与标记的参考位置（T）一致装置（3）。

35. 发明申请

WO2004044955A3 LASER SCANNING APPARATUS AND METHODS FOR THERMAL PROCESSING 审中-公开
标题翻译：激光扫描装置和热处理方法
公开(公告)号：WO2004044955A3
公开(公告)日：2004-07-08
申请号：PCT/US0335236
申请日：2003-11-03
申请人： ULTRATECH STEPPER INC
发明人： TALWAR SOMIT , THOMPSON MICHAEL O , MARKLE DAVID A
IPC分类号： B23K26/00 , B23K26/03 , B23K26/04 , B23K26/073 , B23K26/08
CPC分类号： B23K26/032 , B23K26/04 , B23K26/0738 , B23K26/08 , B23K26/082 , B23K2201/40 , H01L21/02683 , H01L21/02691 , H01L21/268 , H01L21/67115
摘要： Apparatus and methods for thermally processing a substrate (60) with scanned laser radiation (14B) are disclosed. The apparatus includes a continuous radiation source (12) and an optical system (20) that forms an image (100) on a substrate (60). The image (100) is scanned relative to the substrate surface (62) so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.
摘要翻译：公开了用扫描激光辐射（14B）热处理衬底（60）的装置和方法。该装置包括在衬底（60）上形成图像（100）的连续辐射源（12）和光学系统（20）。相对于衬底表面（62）扫描图像（100），使得处理区域中的每个点接收足以热处理该区域的辐射脉冲。

36. 发明申请

WO2004044955A2 LASER SCANNING APPARATUS AND METHODS FOR THERMAL PROCESSING 审中-公开
标题翻译：激光扫描装置和热处理方法
公开(公告)号：WO2004044955A2
公开(公告)日：2004-05-27
申请号：PCT/US2003/035236
申请日：2003-11-03
申请人： ULTRATECH STEPPER, INC.
发明人： TALWAR, Somit , THOMPSON, Michael, O. , MARKLE, David, A.
IPC分类号： H01L
CPC分类号： B23K26/032 , B23K26/04 , B23K26/0738 , B23K26/08 , B23K26/082 , B23K2201/40 , H01L21/02683 , H01L21/02691 , H01L21/268 , H01L21/67115
摘要： Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.
摘要翻译：公开了用扫描激光辐射热处理衬底的设备和方法。该设备包括连续辐射源和在基底上形成图像的光学系统。图像被相对于基板表面扫描，使得处理区域中的每个点接收足以热处理该区域的辐射脉冲。

37. 发明申请

WO2004041473A1 LASERE MACHINING DEVICE WITH ULTRASOUND SYSTEMFOR CONTROLLING THE DISTANCE BETWEEN THE LASER HEAD AND THEWORKPIECE 审中-公开
标题翻译：具有超声波系统的激光加工装置，用于控制激光头与工件之间的距离
公开(公告)号：WO2004041473A1
公开(公告)日：2004-05-21
申请号：PCT/IT2002/000705
申请日：2002-11-08
申请人： EL.EN S.P.A. , MASOTTI, Leonardo , BIAGI, Elena , MASOTTI, Giovanni
发明人： MASOTTI, Leonardo , BIAGI, Elena , MASOTTI, Giovanni
IPC分类号： B23K26/00
CPC分类号： B23K26/04 , B23K26/705
摘要： The device comprises: a machining head (1) with a laser source and an optical system for focusing a laser beam; a support (S) for the workpiece (P) to be machined; a detection system for determining the distance between the laser head (1) and the workpiece being machined; a control unit (9) connected to the detection system and an actuator for controlling the position of the head with respect to the workpiece. The detection system comprises at least one ultrasonic transducer (7), the signal of which is used to control said position.
摘要翻译：该装置包括：具有激光源的加工头（1）和用于聚焦激光束的光学系统; 用于待加工的工件（P）的支撑件（S）; 用于确定激光头（1）和被加工的工件之间的距离的检测系统; 连接到检测系统的控制单元（9）和用于控制头部相对于工件的位置的致动器。检测系统包括至少一个超声换能器（7），其信号用于控制所述位置。

38. 发明申请

WO2004009283A3 PHARMACEUTICAL LASER DRILLING SYSTEM WITH MEANS FOR CHECKING THE CORRECT ORIENTATION OF EACH DOSAGE 审中-公开
标题翻译：具有检查每个剂量的正确方向的手段的药物激光钻孔系统
公开(公告)号：WO2004009283A3
公开(公告)日：2004-04-22
申请号：PCT/IB0303133
申请日：2003-07-11
申请人： PFIZER PROD INC , CARRUTHERS MARK SAMUEL , THOMBRE AVINASH GOVIND , CRAIG CHRISTOPHER DONAVAN , MILLARD DOUGLAS LEE , NEWBOLD DAVID DIXON , SPENCE KENNY RAY
发明人： CARRUTHERS MARK SAMUEL , THOMBRE AVINASH GOVIND , CRAIG CHRISTOPHER DONAVAN , MILLARD DOUGLAS LEE , NEWBOLD DAVID DIXON , SPENCE KENNY RAY
IPC分类号： A61J3/06 , A61J3/00 , B23K26/04 , B23K26/08 , B23K26/14 , B23K26/38 , B23K26/42 , A61K9/00 , A61K9/20 , B07C5/342 , B07C5/36 , B65G47/256
CPC分类号： B23K26/032 , A61J3/005 , A61J2205/20 , B23K26/04 , B23K26/0648 , B23K26/0665 , B23K26/0838 , B23K26/142 , B23K26/1462 , B23K26/1476 , B23K26/382 , B23K26/40 , B23K2201/35
摘要： A laser drilling system (10) forms an opening in the coating of a pharmaceutical dosage form and includes an orientation check assembly to check the correct orientation of each dosage form before the laser drilling is performed, a debris removal assembly to reduce buildup of and reduce exposure to drilling debris and a quality control assembly to verify that the opening formed conforms to predetermined specifications. The orientation check assembly comprises first and second link conveyors, one first color sensor (52) located adjacent the first link conveyor and generating a signal representative of the color of the pharmaceutical dosage form, and a rejection station located along said first link conveyor for ejecting said dosage form in response to said signal generated by said color sensor (52).
摘要翻译：激光钻孔系统（10）在药物剂型的涂层中形成开口，并且包括在进行激光钻孔之前检查每个剂型的正确取向的取向检查组件，用于减少积聚和减少的碎屑去除组件暴露于钻屑和质量控制组件，以验证形成的开口符合预定规格。定向检查组件包括第一和第二连杆输送机，位于第一连杆输送机附近的一个第一颜色传感器（52），并产生代表药物剂型的颜色的信号，以及位于沿着所述第一连杆输送机排出的排出台所述剂型响应由所述颜色传感器（52）产生的所述信号。

39. 发明申请

WO2003089184A1 THERMAL FLUX PROCESSING BY SCANNING ELECTROMAGNETIC RADIATION 审中-公开
标题翻译：通过扫描电磁辐射的热通量处理
公开(公告)号：WO2003089184A1
公开(公告)日：2003-10-30
申请号：PCT/US2003/012291
申请日：2003-04-18
申请人： APPLIED MATERIALS, INC.
发明人： JENNINGS, Dean C. , YAM, Mark , MAYUR, Abhilash, J. , BEHRENS, Vernon , O'BRIEN, Paul, A. , TERTITSKI, Leonid, M. , GOLDIN, Alexander
IPC分类号： B23K26/00
CPC分类号： H01L21/02683 , B23K26/032 , B23K26/034 , B23K26/04 , B23K26/0608 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/0738 , B23K26/082 , B23K26/083 , B23K26/0838 , B23K26/0869 , B23K26/123 , B23K26/125 , B23K26/142 , B23K26/32 , B23K26/34 , B23K26/705 , B23K2201/34 , B23K2201/40 , B23K2203/08 , B23K2203/50 , C23C8/00 , C23C8/10 , C23C8/22 , C23C16/047 , C23C16/481 , G02B27/0955 , H01L21/00 , H01L21/2026 , H01L21/67115
摘要： The thermal processing device includes a stage (216), a continuous wave (cw) electromagnetic radiation source (202), a series of lenses (210), and a translation mechanism (218), and a controller (226). The stage (216) is configured to received a substrate (214). The cw electromagnetic radiation source (202) is disposed adjacent the stage (216), and is configured to emit cw electomagnetic radiation along a path towards the substrate (214). The series of lenses (210) is disposed between the cw electromagnetic radiation source (202) and the stage (216), and are configured to condense the cw electromagnetic radiation into a line of cw electomagnetic radiation (222) on a surface of the substrate (214).
摘要翻译：热处理装置包括台（216），连续波（cw）电磁辐射源（202），一系列透镜（210）和平移机构（218）以及控制器（226）。载物台（216）构造成接收基底（214）。 cw电磁辐射源（202）被布置成邻近载物台（216），并且被配置为沿着朝向衬底（214）的路径发射cw电磁辐射。所述一系列透镜（210）设置在所述cw电磁辐射源（202）和所述载物台（216）之间，并且被配置为将所述电磁辐射集中在所述基板的表面上的cw电磁辐射线（222）（214）。

40. 发明申请

WO02047919A1 BACKING LAYER OF A DONOR ELEMENT FOR ADJUSTING THE FOCUS ON AN IMAGING LASER 审中-公开
标题翻译：用于调整成像激光的焦点的支撑元件的支撑层
公开(公告)号：WO02047919A1
公开(公告)日：2002-06-20
申请号：PCT/US2001/048930
申请日：2001-12-14
IPC分类号： B41J2/32 , B23K26/04 , B41J2/475 , B41J31/00 , B41J31/06 , B41M5/382 , B41M5/392 , B41M5/40 , B41M5/42 , B41M5/46 , G02B5/20 , G02B5/22 , G02F1/1335 , G03F9/00 , B41M5/38
CPC分类号： B41M5/42 , B23K26/04 , B41J2/4753 , B41M5/38221 , B41M5/426 , G02B5/201 , G02B5/223 , G02F1/133516
摘要： A process for adjusting the energy of an imaging laser for imaging of a thermally imageable element and thermally imageable elements suitable for this purpose are described. The process comprises the steps of: (a) providing an imaging unit having a non-imaging laser and an imaging laser, the non-imaging laser having a light detector which is in communication with the imaging laser; (b) contacting a receiver element with the thermally imageable element in the imaging unit, the thermally imageable element comprising a thermally imageable layer on a front side of a base element and a light attenuated layer on a back side of the base element comprising a light attenuating agent; (c) actuating the non-imaging laser to expose the thermally imageable element and the receiver element to an amount of light energy sufficient for the light detector to detect the amount of light reflected from the light attenuated layer of the thermally imageable element; and (d) actuating the imaging laser to focus the imaging laser in order to expose the thermally imageable element to an amount of light energy sufficient for imaging the thermally imageable element. The light attenuation is achieved by use of a light attenuating agent or by physically roughening a support.
摘要翻译：描述了用于调整用于成像可热成像元件的成像激光器的能量和适于该目的的可热成像元件的工艺。该方法包括以下步骤：（a）提供具有非成像激光和成像激光的成像单元，所述非成像激光器具有与成像激光器连通的光检测器; （b）使接收器元件与成像单元中的可热成像元件接触，所述可热成像元件包括在基底元件的前侧上的可热成像层和在所述基底元件的背面上的光衰减层，包括光衰减剂; （c）致动所述非成像激光器以将所述可热成像元件和所述接收器元件暴露于足以使所述光检测器检测从所述可热成像元件的光衰减层反射的光量的量的光能量; 以及（d）致动成像激光器以聚焦成像激光器，以将可热成像元件暴露于足以对可热成像元件成像的光能量。光衰减通过使用光衰减剂或通过物理上粗糙化支持物来实现。

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