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21. 发明申请

WO2005017617A8 PLANARIZATION FILMS FOR ADVANCED MICROELECTRONIC APPLICATIONS AND DEVICES AND METHODS OF PRODUCTION THEREOF 审中-公开
标题翻译：用于高级微电子应用的平面薄膜及其制造方法
公开(公告)号：WO2005017617A8
公开(公告)日：2006-06-01
申请号：PCT/US0334347
申请日：2003-10-27
申请人： HONEYWELL INT INC , HUANG WEI , KENNEDY JOSEPH , KATSANES RONALD
发明人： HUANG WEI , KENNEDY JOSEPH , KATSANES RONALD
IPC分类号： B05D5/12 , B32B27/42 , C08J3/00 , C08J7/02 , G03C1/00
CPC分类号： C08J7/02 , C04B26/12 , C04B2111/00482 , C08J2361/00 , C23F1/10 , C23F1/44 , C23F3/00 , C23F3/04 , H01L21/31051 , H01L21/312 , Y10T428/31942 , C04B2103/0093 , C04B2103/40
摘要： A planarization composition is disclosed herein that comprises: a) a structural constituent; and b) a solvent system, wherein the solvent system is compatible with the structural constituent and lowers the lowers at least one of the intermolecular forces or surface forces components of the planarization composition. A film that includes this planarization composition is also disclosed. In addition, another planarization composition is disclosed herein that comprises: a) a cresol-based polymer compound; and b) a solvent system comprising at least one alcohol and at least one ether acetate-based solvent. A film that includes this planarization composition is also disclosed. A layered component is also disclosed herein that comprises: a) a substrate having a surface topography; and b) a planarization composition or a film such as those described herein, wherein the composition is coupled to the substrate. Methods of forming a planarization compositions are also disclosed herein that comprise: a) providing a structural constituent; b) providing a solvent system, wherein the solvent system is compatible with the structural constituent and lowers at least one of the intermolecular forces or surface forces components of the planarization composition; and c) blending the structural constituent and the solvent system to form a planarization composition. Methods of forming a film are also disclosed that comprise: a) providing a planarization composition such as those disclosed herein; and b) evaporating at least part of the solvent system to form a film.
摘要翻译：本文公开了一种平面化组合物，其包括：a）结构成分; 和b）溶剂体系，其中所述溶剂体系与所述结构组分相容并降低所述平坦化组合物的至少一种分子间力或表面力组分。还公开了包含该平坦化组合物的膜。此外，本文公开了另外的平坦化组合物，其包括：a）甲酚基聚合物化合物; 和b）包含至少一种醇和至少一种乙酸乙烯酯类溶剂的溶剂体系。还公开了包含该平坦化组合物的膜。本文还公开了一种分层组件，其包括：a）具有表面形貌的衬底; 和b）平面化组合物或诸如本文所述的那些的膜，其中所述组合物与所述基材偶联。本文还公开了形成平坦化组合物的方法，其包括：a）提供结构成分; b）提供溶剂体系，其中所述溶剂体系与所述结构组分相容并降低所述平坦化组合物的分子间力或表面力组分中的至少一种; 和c）将结构成分和溶剂体系混合以形成平坦化组合物。还公开了形成膜的方法，其包括：a）提供诸如本文公开的那些的平坦化组合物; 和b）蒸发至少部分溶剂系统以形成膜。

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