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21. 发明申请

WO2003015136A2 SUSCEPTOR SHAFT VACUUM PUMPING 审中-公开
标题翻译： SUSCEPTOR轴真空泵
公开(公告)号：WO2003015136A2
公开(公告)日：2003-02-20
申请号：PCT/US2002/024508
申请日：2002-07-31
申请人： APPLIED MATERIALS, INC.
发明人： YADAV, Sanjay , SHANG, Quanyuan , KELLER, Ernst , CHANG, Wei
IPC分类号： H01L21/00
CPC分类号： H01L21/6838
摘要： Provided herein is a method of improving the planarity of a support plate of a susceptor for use during deposition of a film of material onto a substrate comprising the steps of reducing pressure in a hollow core of a shaft to a level below atmospheric pressure; and reducing a pressure in the deposition chamber to a level required for the deposition of the film of material onto the substrate, where the pressure in the hollow core of the shaft acts upon a lower surface of the support plate connected to the shaft and interfacing with the hollow core of the shaft and the pressure in the deposition chamber acts upon a upper surface of the support plate adapted to support the substrate thereby improving planarity. Also provided are a susceptor and a method of depositing a film onto a substrate affixed to the susceptor of the present invention.
摘要翻译：本文提供了一种提高用于将材料膜沉积到基材上的基座的支撑板的平面度的方法，包括以下步骤：将轴的空心芯中的压力降低到低于大气压的水平; 并且将沉积室中的压力降低到将材料膜沉积到基底上所需的水平，其中轴的中空芯中的压力作用在连接到轴的支撑板的下表面并与轴的中空芯和沉积室中的压力作用在支撑板的上表面，其适于支撑基板，从而改善平面度。还提供了一种感受器和将薄膜沉积在固定到本发明的基座上的基底上的方法。

22. 发明申请

WO2002050334A3 ON-SITE CLEANING GAS GENERATION FOR PROCESS CHAMBER CLEANING 审中-公开
公开(公告)号：WO2002050334A3
公开(公告)日：2002-06-27
申请号：PCT/US2001/047895
申请日：2001-12-10
申请人： APPLIED MATERIALS, INC.
发明人： SHANG, Quanyuan , HARSHBARGER, William, R. , YADAV, Sanjay , LAW, Kam S.
IPC分类号： C23C16/44
摘要： Provided herein is a method for cleaning a process chamber for semiconductor and/or flat panel display manufacturing. This method comprises the steps of converting a non-cleaning feed gas to a cleaning gas in a remote location and then delivering the cleaning gas to the process chamber for cleaning. Such method may further comprise the step of activating the cleaning gas outside the chamber before the delivery of the gas to the chamber. Also provided is a method of eliminating non-cleaning feed gas from the cleaning gas by cryocondensation.

23. 发明申请

WO2007041229A2 METHODS AND APPARATUS FOR ADJUSTING PIXEL FILL PROFILES 审中-公开
标题翻译：调整像素填充轮廓的方法和装置
公开(公告)号：WO2007041229A2
公开(公告)日：2007-04-12
申请号：PCT/US2006/037875
申请日：2006-09-28
申请人： APPLIED MATERIALS, INC.
发明人： SUN, Lizhong , SHANG, Quanyuan , WHITE, John, M.
IPC分类号： B41J29/38
CPC分类号： G02F1/133516 , G02F1/1303 , G02F1/133377 , H01L51/0005
摘要： For use in a color filter inkjet printing system that may be part of a flat panel display manufacturing system, methods and apparatus for adjusting a pixel fill profile are provided. The methods include application of , and the apparatus are adapted to apply, pressurized gas to at least one ink-filled pixel well on a substrate having a plurality of pixel wells. Numerous other aspects are provided.
摘要翻译：为了用作可以是平板显示器制造系统的一部分的滤色器喷墨打印系统，提供了用于调整像素填充轮廓的方法和装置。所述方法包括应用，并且该装置适于将压缩气体施加到具有多个像素孔的衬底上的至少一个填充墨水的像素。提供了许多其他方面。

24. 发明申请

WO2004054010A2 LOW TEMPERATURE PROCESS FOR PASSIVATION APPLICATIONS 审中-公开
标题翻译：低温应用过程
公开(公告)号：WO2004054010A2
公开(公告)日：2004-06-24
申请号：PCT/US2003/039385
申请日：2003-12-10
申请人： APPLIED MATERIALS, INC.
发明人： HSIAO, Mark , TAKEHARA, Takako , SHANG, Quanyuan , HARSHBARGER, William, R.
IPC分类号： H01L51/20
CPC分类号： H01L51/5253
摘要： An organic electroluminescent device comprising an anode layer on a substrate, an organic layer on the anode layer, and a cathode layer on the organic layer. In one embodiment, the cathode layer is subjected to H 2 plasma prior to deposition of a protective layer over the cathode. In another embodiment, the organic electroluminescent device is encapsulated with an inner encapsulation layer on the cathode layer, and an outer encapsulation layer on the inner encapsulation layer. The inner layer is optimized for adhesion to the cathode layer.
摘要翻译：一种有机电致发光器件，包括在衬底上的阳极层，阳极层上的有机层和有机层上的阴极层。在一个实施例中，在阴极上沉积保护层之前，使阴极层经受H 2等离子体。在另一个实施方案中，有机电致发光器件被封装在阴极层上的内部封装层和内部封装层上的外部封装层。内层被优化用于与阴极层的粘附。

25. 发明申请

WO2003018867A1 SEMICONDUCTOR PROCESSING USING AN EFFICIENTLY COUPLED GAS SOURCE 审中-公开
标题翻译：使用高效耦合气体源的半导体处理
公开(公告)号：WO2003018867A1
公开(公告)日：2003-03-06
申请号：PCT/US2002/027939
申请日：2002-08-29
申请人： APPLIED MATERIALS, INC.
发明人： SORENSEN, Carl, A. , ELLINGBOE, Albert, R. , SHANG, Quanyuan , BLONIGAN, Wendell, T. , WHITE, John, M.
IPC分类号： C23C16/00
CPC分类号： H01J37/32862 , C23C16/4405 , C23C16/452 , H01J37/321
摘要： A semiconductor processing system includes a processing chamber system and an activated gas source coupled to the chamber system. The gas source includes a primary winding coupled to an RF generator and a secondary winding effectively formed by the conductance of a plasma filled passageway in a toroidal chamber. The primary winding and the secondary winding are coaxially aligned to provide a suitable inductive coupling between the windings.
摘要翻译：半导体处理系统包括处理室系统和耦合到室系统的活性气体源。气源包括耦合到RF发生器的初级绕组和通过等离子体填充的通道在环形室中的电导有效形成的次级绕组。初级绕组和次级绕组被同轴对准以在绕组之间提供合适的电感耦合。

26. 发明申请

WO2007040970A2 METHODS AND APPARATUS FOR INKJET HEAD CLEANING 审中-公开
标题翻译：用于喷墨头清洁的方法和设备
公开(公告)号：WO2007040970A2
公开(公告)日：2007-04-12
申请号：PCT/US2006/036297
申请日：2006-09-15
申请人： APPLIED MATERIALS, INC.
发明人： SHANG, Quanyuan , KURITA, Shinichi , SZE, Fan, Cheung
CPC分类号： B41J2/16535 , B41J2/16526
摘要： Methods and apparatus for cleaning a nozzle plate of an inkjet print head are provided. A first method includes positioning a cleaning medium proximate the inkjet print head, determining a pressure for a pressure roller to apply against the cleaning medium, contacting the cleaning medium with the pressure roller with the determined pressure, and moving the cleaning medium relative to the inkjet print head so as to clean the inkjet print head. The method also includes purging ink from the inkjet print head prior to the pressure roller contacting the cleaning medium and pre- jetting ink from the inkjet print head after moving the cleaning medium. Numerous other aspects are t provided.
摘要翻译：提供了用于清洁喷墨打印头的喷嘴板的方法和设备。第一种方法包括：将清洁介质定位在喷墨印刷头附近，确定压力辊施加在清洁介质上的压力，以确定的压力使清洁介质与压力辊接触，以及相对于喷墨头移动清洁介质打印头，以清洁喷墨打印头。该方法还包括在压力辊接触清洁介质之前从喷墨印刷头清除油墨，并且在移动清洁介质之后从喷墨印刷头预先喷射油墨。许多其他方面都提供。

27. 发明申请

WO2006089105A2 METHODS AND APPARATUS FOR PRECISION CONTROL OF PRINT HEAD ASSEMBLIES 审中-公开
标题翻译：打印头组件精密控制的方法和装置
公开(公告)号：WO2006089105A2
公开(公告)日：2006-08-24
申请号：PCT/US2006/005614
申请日：2006-02-17
申请人： APPLIED MATERIALS, INC.
发明人： SHAMOUN, Bassam , JOZWIAK, Janusz , SHANG, Quanyuan , JI, Hongbin
IPC分类号： B41J2/21 , B41J2/045 , G02F1/1335 , B41M3/00
CPC分类号： B41J2/2128 , B41J2/04541 , B41J2/0456 , B41J2/04581 , B41J2/04591 , B41J2/04593 , B41J2202/09 , G02F1/133516 , H04N1/4015
摘要： The present invention provides methods and apparatus for controlling the quantity of fluid output (e.g., drop size) by individual nozzles of a print head to a very high precision at a frequency equal to the frequency at which fluid is normally dispensed. This is achieved by mapping fluid quantity control information into the data that represents the image to be printed. Data representative of an image is received and converted into pixel data. In at least one embodiment, the pixel data includes pixels represented by N bits, and the N bits may represent a drop size for the pixel and a union of the N bits may represent a nozzle status. A print head may be controlled based on the pixel data, and the print head may include nozzles that are each adapted to deposit at least one drop size quantity of a fluid on a substrate.
摘要翻译：本发明提供了用于以等于通常分配流体的频率的频率将打印头的各个喷嘴的流体输出量（例如，液滴尺寸）控制到非常高的精度的方法和装置。这通过将流体量控制信息映射到表示要打印的图像的数据来实现。接收表示图像的数据并将其转换为像素数据。在至少一个实施例中，像素数据包括由N位表示的像素，并且N位可以表示像素的液滴大小，并且N位的并联可以表示喷嘴状态。可以基于像素数据来控制打印头，并且打印头可以包括各自适于在衬底上沉积至少一个液滴量的流体的喷嘴。

28. 发明申请

WO2003015481A2 SUSPENDED GAS DISTRIBUTION MANIFOLD FOR PLASMA CHAMBER 审中-公开
标题翻译：用于等离子体室的悬挂气体分配管
公开(公告)号：WO2003015481A2
公开(公告)日：2003-02-20
申请号：PCT/US2002/024467
申请日：2002-08-02
申请人： APPLIED MATERIALS, INC.
发明人： KELLER, Ernst , SHANG, Quanyuan
IPC分类号： H05H1/00
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/5096 , H01J37/3244 , Y10T29/49948
摘要： A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by a side wall comprising one or more sheets. The sheets preferably provide flexibility to alleviate stress in the gas distribution plate due to thermal expansion and contraction. In another aspect, the side wall provides thermal isolation between the gas distribution plate and other components of the chamber.
摘要翻译：一种用于等离子体室的气体入口歧管，其具有由包括一个或多个片材的侧壁悬挂的多孔气体分配板。片材优选提供柔性以缓解由于热膨胀和收缩导致的气体分配板中的应力。在另一方面，侧壁在气体分配板和腔室的其它部件之间提供热隔离。

29. 发明申请

WO2002103742A3 PLASMA DISPLAY PANEL WITH A LOW K DIELECTRIC LAYER 审中-公开
公开(公告)号：WO2002103742A3
公开(公告)日：2002-12-27
申请号：PCT/US2002/019559
申请日：2002-06-18
申请人： APPLIED MATERIALS, INC.
发明人： LAW, Kam, S. , SHANG, Quanyuan , TAKEHARA, Takako , WON, Taekyung , HARSHBARGER, William, R. , MAYDAN, Dan
IPC分类号： H01J17/04
摘要： A plasma display panel including a low k dielectric layer (44). In one embodiment, the dielectric layer (44) is comprises a fluorine-doped silicon oxide layer such as an SiOF layer. In another embodiment, the dielectric layer (44) comprises a Black Diamond TM layer. In certain embodiments, a capping layer (46) such as SiN or SiON is deposited over the dielectric layer (44).

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