专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明申请

WO0159889A9 BANDWIDTH CONTROL TECHNIQUE FOR A LASER 审中-公开
标题翻译：激光的带宽控制技术
公开(公告)号：WO0159889A9
公开(公告)日：2002-10-17
申请号：PCT/US0101787
申请日：2001-01-18
申请人： CYMER INC , FOMENKOV IGOR V , KROYAN ARMEN , BUCK JESSE D , DAS PALASH P , SANDSTROM RICHARD L , ERIE FREDERICK G , ALGOTS JOHN M , PADMABANDU GAMARALALAGE G
发明人： FOMENKOV IGOR V , KROYAN ARMEN , BUCK JESSE D , DAS PALASH P , SANDSTROM RICHARD L , ERIE FREDERICK G , ALGOTS JOHN M , PADMABANDU GAMARALALAGE G
IPC分类号： H01S3/139 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/097 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/134 , H01S3/22 , H01S3/225 , H01S3/08
CPC分类号： G03F7/70041 , G03F7/70575 , H01S3/105 , H01S3/1055
摘要： A technique for bandwidth control of an electric discharge laser (2A). Line narrowing equipment is provided having at least one piezoelectric drive (14B1 - 14B5) and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirrors (14C1 - 14C5) are dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in the wavelength values to produce a desired effective bandwidth of series of laser pulses.
摘要翻译：一种用于放电激光器（2A）的带宽控制的技术。提供了具有至少一个压电驱动器（14B1-14.455）和快速带宽检测装置以及时间响应小于约1.0毫秒的带宽控制的线窄设备。在优选实施例中，波长调谐镜（14C1-14C5）在非常窄的转角范围内以每秒超过500次抖动的抖动速率抖动，以使波长值中的抖动产生期望的有效带宽的一系列激光脉冲。

22. 发明申请

WO2002069461A1 LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER 审中-公开
标题翻译：具有压电驱动器的激光波长控制单元
公开(公告)号：WO2002069461A1
公开(公告)日：2002-09-06
申请号：PCT/US2002/004623
申请日：2002-02-15
申请人： CYMER, INC. , SPANGLER, Ronald, L. , JACQUES, Robert, N. , RULE, John, A. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , ALGOTS, John, M. , LIPCON, Jacob, P. , SANDSTROM, Richard, L.
发明人： SPANGLER, Ronald, L. , JACQUES, Robert, N. , RULE, John, A. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , ALGOTS, John, M. , LIPCON, Jacob, P. , SANDSTROM, Richard, L.
IPC分类号： H01S3/10
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： An electric discharge laser (34) with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system (104) and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide fast feedback control based on wavelength measurements, fast vibration control, active damping using the load cell and an active damping module (320), and transient inversion using feed forward algorithms based on historical burst data.
摘要翻译：具有快速波长校正的放电激光器（34）。快速波长校正设备包括至少一个压电驱动器和快速波长测量系统（104）和快速反馈响应时间。在优选实施例中，提供设备以在从大约1到5毫秒的中间时间和几微秒的非常快的时间帧上在几毫秒的慢时间帧上控制波长。优选的技术包括相对较慢的步进电机和非常快的压电驱动器的组合，用于使用调谐镜来调谐激光波长。非常快的波长控制与压电驱动器组合地设置有压电测力传感器。优选实施例提供基于波长测量，快速振动控制，使用负载传感器的主动阻尼和主动阻尼模块（320）的快速反馈控制，以及使用基于历史突发数据的前馈算法的瞬态反转。

23. 发明申请

WO02061388A2 HIGH RESOLUTION ETALON-GRATING MONOCHROMATOR SPECTROMETER 审中-公开
标题翻译：高分辨率ETALON-GRATING MONOCHROMATOR SPECTROMETER
公开(公告)号：WO02061388A2
公开(公告)日：2002-08-08
申请号：PCT/US0202453
申请日：2002-01-28
申请人： CYMER INC , SANDSTROM RICHARD L , ERSHOV ALEXANDER I , FOMENKOV IGOR V , BROWN DANIEL J W , SMITH SCOTT T
发明人： SANDSTROM RICHARD L , ERSHOV ALEXANDER I , FOMENKOV IGOR V , BROWN DANIEL J W , SMITH SCOTT T
IPC分类号： G01J3/26 , G01J1/42 , G01J3/12 , G01J3/22 , G01J9/02 , G21K1/06 , H01S3/134 , H01S3/137 , G01N
CPC分类号： G01J3/12 , G01J1/4257 , G01J3/22 , G01J3/26 , G01J9/02
摘要： A high resolution etalon-grating spectrometer or monochromator. A preferred embodiment presents as extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser illuminates an etalon (ET). A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated (L3) and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit (2) and monitored by a light detector (PMT). When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow as about 0.034pm "FWHM" and about 0.091pm "95 percent integral". The etalon and the grating are placed in a leak-tight containment (50) filled with a gas, such a nitrogen or helium.
摘要翻译：高分辨率标准光栅光谱仪或单色仪。优选的实施例在紫外范围内呈现极窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。来自激光器的光聚焦成漫射器（D），离散扩散器的散射光照射标准具（ET）。将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。通过狭缝的光被准直（L3），并且准直光照射位于大约Littrow配置中的光栅（GR1），其根据波长分散光。表示对应于所选标准具条纹的波长的分散光的一部分通过第二狭缝（2）并由光检测器（PMT）监测。当标准具和光栅调谐到相同的精确波长时，定义了狭缝功能，其极窄，约0.034pm“FWHM”和约0.091μm“95％积分”。标准具和光栅放置在充满气体（例如氮气或氦气）的密封密封（50）中。

24. 发明申请

WO0198012A3 FOUR KHz GAS DISCHARGE LASER 审中-公开
标题翻译：四吉兹气体放电激光
公开(公告)号：WO0198012A3
公开(公告)日：2002-05-16
申请号：PCT/US0116985
申请日：2001-05-23
申请人： CYMER INC , NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
发明人： NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
IPC分类号： H01S3/134 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以约4,000Hz的脉冲速率产生高质量的脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的限度内。在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

25. 发明申请

WO2012091786A1 MULTI-PASS OPTICAL APPARATUS 审中-公开
标题翻译：多通道光学设备
公开(公告)号：WO2012091786A1
公开(公告)日：2012-07-05
申请号：PCT/US2011/057717
申请日：2011-10-25
申请人： CYMER, INC. , SANDSTROM, Richard, L.
发明人： SANDSTROM, Richard, L.
IPC分类号： G02B5/08
CPC分类号： G02B17/004 , G02B7/1815 , G02B7/1825 , H01S3/076 , H01S3/2325
摘要： An apparatus includes a first plurality of concave reflecting surfaces; a second plurality of reflecting surfaces facing the first plurality of concave reflecting surfaces such that a region is defined between the first and second pluralities; and an input for an optical beam to enter the region and an output for the optical beam to exit the region. The first and second pluralities of reflecting surfaces are arranged relative to each other so that the optical beam is re-imaged at a reflecting surface of one of the pluralities after only one reflection from a reflecting surface of the other of the pluralities and so that overlap of two or more optical beams on each of the reflecting surfaces is avoided.
摘要翻译：一种装置包括：第一多个凹面反射面; 面对所述第一多个凹反射表面的第二多个反射表面，使得在所述第一和第二多个之间限定区域; 以及用于进入该区域的光束的输入和用于使光束离开该区域的输出。第一和第二多个反射表面相对于彼此布置，使得光束在仅一次反射之后的多个反射表面中从多个另一个的反射表面重新成像，并且重叠避免了在每个反射表面上的两个或更多个光束。

26. 发明申请

WO2012054145A1 OSCILLATOR-AMPLIFIER DRIVE LASER WITH SEED PROTECTION FOR AN EUV LIGHT SOURCE 审中-公开
标题翻译：振荡放大器驱动激光器，具有针对EUV光源的保护
公开(公告)号：WO2012054145A1
公开(公告)日：2012-04-26
申请号：PCT/US2011/050566
申请日：2011-09-06
申请人： CYMER, INC. , HOU, Kai-chung , SANDSTROM, Richard, L. , PARTLO, William, N. , BROWN, Daniel, J.w. , FOMENKOV, Ifor, V.
发明人： HOU, Kai-chung , SANDSTROM, Richard, L. , PARTLO, William, N. , BROWN, Daniel, J.w. , FOMENKOV, Ifor, V.
IPC分类号： H01S3/00
CPC分类号： H01S3/117 , H01S3/005 , H01S3/0057 , H01S3/0064 , H01S3/076 , H01S3/0812 , H01S3/2232 , H01S3/2383 , H05G2/005 , H05G2/008
摘要： As disclosed herein, in a first aspect, a device may comprise; an oscillator producing a light output on a beam path; a target material for interaction with Light on the beam path at an irradiation site; a beam delay on the beam path the beam delay haying a beam folding optical arrangement; and a switch positioned along the beam, path and Interposed between the oscillator and the beam delay; the switch closable to divert at. least a portion of light on the beam path from the beam path, the switch having close time, t 1 and the beam path having a Length, L 1 . along the path from the switch to the irradiation site; with t 1 1 , where e is the speed of light on the path, to protect the oscillator.
摘要翻译：如本文所公开的，在第一方面中，一种装置可以包括：在光束路径上产生光输出的振荡器; 用于在照射部位的光束路径上与光相互作用的目标材料; 在光束路径上的波束延迟，波束延迟具有光束折叠光学布置; 和沿着光束路径定位的开关，并且介于振荡器和光束延迟之间; 开关可以转向。来自光束路径的光束路径上的光的至少一部分，开关具有接近的时间t1，并且光束路径具有长度L1。沿着从切换到照射场所的路径; 与t1 1，其中e是路径上的光速，以保护振荡器。

27. 发明申请

WO2011162903A1 MASTER OSCILLATOR-POWER AMPLIFIER DRIVE LASER WITH PRE-PULSE FOR EUV LIGHT SOURCE 审中-公开
标题翻译：主振荡器功率放大器驱动激光器用于EUV光源的预脉冲
公开(公告)号：WO2011162903A1
公开(公告)日：2011-12-29
申请号：PCT/US2011/037793
申请日：2011-05-24
申请人： CYMER, INC. , HOU, Kai-chung , SANDSTROM, Richard, L , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V.
发明人： HOU, Kai-chung , SANDSTROM, Richard, L , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V.
IPC分类号： H01S3/00
CPC分类号： H01S3/0078 , G03F7/70033 , G03F7/70175 , G03F7/70908 , G03F7/70933 , H01S3/076 , H01S3/1055 , H01S3/117 , H01S3/2232 , H05G2/008
摘要： A device is described herein which may comprise an optical amplifier having a gain band including wavelengths λ 1 and λ 2 , with λ 1 ≠ λ 2 ; a pre-pulse seed laser having a tuning module for tuning a pre-pulse output to wavelength λ 1 ; a main pulse seed laser generating a laser output having wavelength, λ 2 ; and a beam combiner for directing the pre-pulse output and the main pulse output on a common path through the optical amplifier.
摘要翻译：本文描述了一种可以包括具有包括波长λ1和λ2的增益带的光放大器的装置，？2; 具有用于将预脉冲输出调谐到波长λ1的调谐模块的预脉冲种子激光器; 产生具有波长λ2的激光输出的主脉冲种子激光器; 以及用于将预脉冲输出和主脉冲输出引导到通过光放大器的公共路径上的光束组合器。

28. 发明申请

WO2011112235A1 LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源
公开(公告)号：WO2011112235A1
公开(公告)日：2011-09-15
申请号：PCT/US2011/000374
申请日：2011-03-01
申请人： CYMER, INC. , VASCHENKO, Georgiy, O. , ERSHOV, Alexander, I. , SANDSTROM, Richard, L.
发明人： VASCHENKO, Georgiy, O. , ERSHOV, Alexander, I. , SANDSTROM, Richard, L.
IPC分类号： A61N5/06
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A device is disclosed herein which may include a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing the spacing between at least some adjacent droplets to decrease as the droplets travel to the irradiation region.
摘要翻译：本文公开了一种装置，其可以包括等离子体产生系统，其包括目标材料液滴源和产生在照射区域照射液滴的光束的激光器，等离子体产生EUV辐射，其中液滴源包括离开孔口的流体，产生流体中的扰动的子系统产生具有不同初始速度的液滴，导致至少一些相邻液滴之间的间隔随着液滴行进到照射区域而减小。

29. 发明申请

WO2010117858A1 SYSTEM, METHOD AND APPARATUS FOR DROPLET CATCHER FOR PREVENTION OF BACKSPLASH IN A EUV GENERATION CHAMBER 审中-公开
标题翻译：用于防止在EUV生成室中发生反冲洗的刮水器的系统，方法和装置
公开(公告)号：WO2010117858A1
公开(公告)日：2010-10-14
申请号：PCT/US2010/029436
申请日：2010-03-31
申请人： CYMER, INC. , VASCHENKO, Georgiy, O. , PARTLO, William, N. , FOMENKOV, Igor, V. , SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , BRANDT, David, C. , MILLER, Joshua, J.
发明人： VASCHENKO, Georgiy, O. , PARTLO, William, N. , FOMENKOV, Igor, V. , SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , BRANDT, David, C. , MILLER, Joshua, J.
IPC分类号： G01J3/10
CPC分类号： H05G2/005 , G03F7/70033 , G21K5/00 , H05G2/003 , H05G2/006
摘要： A system and method generating an extreme ultraviolet light in an extreme ultraviolet light chamber including a collector mirror, a droplet generation system having a droplet outlet aligned to output a plurality of droplets along a target material path and a first catch including a first open end substantially aligned to the target material path and at least one internal surface oriented toward a second end of the first catch, the second end being opposite from the first open end.
摘要翻译：一种在包括收集反射镜的极紫外光室中产生极紫外光的系统和方法，具有液滴出口的液滴产生系统，该液滴产生系统沿着目标材料路径排列以输出多个液滴;以及第一捕集器，其基本上包括第一开口端与目标材料路径对准并且至少一个内表面朝向第一卡扣的第二端定向，第二端与第一开口端相对。

30. 发明申请

WO2006060359A2 HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM BANDWIDTH MANAGEMENT 审中-公开
标题翻译：高功率高脉冲重复率气体放电激光系统带宽管理
公开(公告)号：WO2006060359A2
公开(公告)日：2006-06-08
申请号：PCT/US2005/043055
申请日：2005-11-28
申请人： CYMER, INC. , SANDSTROM, Richard, L. , PARTLO, William, N. , BROWN, Daniel, J., W. , ALGOTS, J., Martin , TRINTCHOUK, Fedor
发明人： SANDSTROM, Richard, L. , PARTLO, William, N. , BROWN, Daniel, J., W. , ALGOTS, J., Martin , TRINTCHOUK, Fedor
IPC分类号： H01S3/22
CPC分类号： H01S3/08009 , H01S3/08031 , H01S3/08059 , H01S3/097 , H01S3/1055
摘要： A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner. The first manner may modify a first measure of bandwidth and the second manner may modify a second measure of bandwidth such that the ratio of the first measure to the second measure substantially changes. The first measure may be a spectrum width at a selected percentage of the spectrum peak value (FWX%M) and the second measure may be width within which some selected percentage of the spectral intensity is contained (EX%). The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second in a second dimension generally orthogonal to the first dimension. The laser system may comprise a beam path insert comprising a material having an different index of refraction and an index of refraction thermal gradient opposite from that of a neighboring optical element. The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second a second dimension generally parallel to the first dimension. An optical beam twisting element in the lasing cavity may optically twist the laser light pulse beam to present a twisted wavefront to the dispersive center wavelength selection optic. Bending may change the curvature and wavelength selection, e.g., in a burst may create two center wavelength peaks to select FWX%M and EX% independently.
摘要翻译：公开了一种用于窄带DUV大功率高重复率气体放电激光器的脉冲串产生输出激光脉冲束脉冲的线窄化装置和方法，其可包括包含在线窄模块内的分散中心波长选择光学器件，选择用于每个脉冲的至少一个中心波长至少部分地由在分散波长选择光学色散表面上包含各个脉冲的激光束的入射角确定; 第一分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且可操作以以第一方式改变所述分散表面的曲率; 以及第二分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且以第二方式改变所述分散表面的曲率。第一种方式可以修改第一带宽测量，第二种方式可以修改第二带宽度量，使得第一测量与第二测量的比率基本上改变。第一测量可以是频谱峰值（FWX％M）的选定百分比处的频谱宽度，第二测量可以是包含频谱强度的某些选定百分比（EX％）的宽度。第一分散光学弯曲机构可以在第一维度上改变分散表面的曲率，而第二维度可以大致正交于第一维度。激光系统可以包括光束路径插入件，其包括具有不同折射率的材料和与相邻光学元件的折射率相反的折射热梯度。第一分散光学弯曲机构可以改变分散表面在第一维度中的曲率，而第二分辨率曲线机构可以改变大体平行于第一尺寸的第二尺寸。激光腔中的光束加捻元件可以光学地扭转激光脉冲光束，以将扭曲的波前呈现到色散中心波长选择光学器件。弯曲可以改变曲率和波长选择，例如，在脉冲串中可以产生两个中心波长峰值，以独立地选择FWX％M和EX％。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式