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11. 发明申请

WO2007001699A1 TRANPARENT MICROPOROUS MATERIALS FOR CMP 审中-公开
标题翻译：用于CMP的常规微孔材料
公开(公告)号：WO2007001699A1
公开(公告)日：2007-01-04
申请号：PCT/US2006/020193
申请日：2006-05-24
申请人： CABOT MICROELECTRONICS CORPORATION
发明人： PRASAD, Abaneshwar
IPC分类号： B24B37/04 , B24D3/32 , B24D13/12
CPC分类号： B24B37/24 , B24D3/32
摘要： The invention is directed to a chemical-mechanical polishing pad substrate comprising a microporous closed-cell foam characterized by a narrow pore size distribution in the range of 0.01 microns to 10 microns. The polishing pad is produced by foaming a solid polymer sheet with a supercritical gas under an elevated temperature and pressure until the sheet is saturated with gas. The invention is further directed to a polishing pad comprising the polishing pad substrate, a method of polishing comprising the use of the polishing pad substrate, and a chemical-mechanical apparatus comprising the polishing pad substrate.
摘要翻译：本发明涉及一种包括微孔闭孔泡沫的化学机械抛光垫基材，其特征在于0.01微米至10微米范围内的窄孔径分布。抛光垫通过在高温和高压下用超临界气体发泡固体聚合物片而制成，直到片材被气体饱和。本发明还涉及一种抛光垫，其包括抛光垫基板，包括使用抛光垫基板的抛光方法以及包括抛光垫基板的化学机械装置。

12. 发明申请

WO2005096700A2 POLISHING PAD AND METHOD OF MAKING SAME 审中-公开
标题翻译：抛光垫及其制作方法
公开(公告)号：WO2005096700A2
公开(公告)日：2005-10-20
申请号：PCT/IB2005/000732
申请日：2005-03-22
申请人： RIMPAD TECH LTD , PRESTON, Spencer , HUTCHINS, Doug , HYMES, Steve
发明人： PRESTON, Spencer , HUTCHINS, Doug , HYMES, Steve
IPC分类号： B24B37/04 , B24D3/32 , B24D18/00 , B29C44/00 , B29C44/34
CPC分类号： B24B37/24 , B24D3/32 , B24D13/147 , B24D18/00 , B24D18/0009 , B29C44/3442
摘要： An article or polishing pad for altering a surface of a work piece includes a polymer matrix created by reaction injection molding of size controlled gas bubbles within a polyurethane matrix. The proposed liquid urethane precursor is first injected into_ an actuated mold and cured. The molded product is then removed; from the mold and double side faced or ground o form a single thin polishing pad comprising a single layer of homogeneous material.
摘要翻译：用于改变工件表面的制品或抛光垫包括由聚氨酯基质内的尺寸控制的气泡的反应注射成型产生的聚合物基体。将所提出的液态氨基甲酸酯前体首先注入到致动模具中并固化。然后将成型产品取出; 从模具和双面朝向或磨削成形成单层均匀材料的单个薄抛光垫。

13. 发明申请

WO2005000527A2 MULTI-LAYER POLISHING PAD MATERIAL FOR CMP 审中-公开
标题翻译：多层抛光材料CMP
公开(公告)号：WO2005000527A2
公开(公告)日：2005-01-06
申请号：PCT/US2004017564
申请日：2004-06-03
申请人： CABOT MICROELECTRONICS CORP
发明人： PRASAD ABANESHWAR , SEVILLA ROLAND K , LACY MICHAEL S
IPC分类号： B24B7/30 , B24B37/20 , B24D3/32 , B24D13/14 , B24B37/04
CPC分类号： B24B37/205 , B24D3/32
摘要： The invention is directed to a multi-layer polishing pad for chemical-mechanical polishing comprising a polishing layer and a bottom layer, wherein the polishing layer and bottom layer are joined together without the use of an adhesive. The invention is also directed to a polishing pad comprising an optically transmissive multi-layer polishing pad material, wherein the layers of the polishing pad material are joined together without the use of an adhesive.
摘要翻译：本发明涉及一种用于化学机械抛光的多层抛光垫，其包括抛光层和底层，其中抛光层和底层在不使用粘合剂的情况下接合在一起。本发明还涉及一种包括光学透射多层抛光垫材料的抛光垫，其中抛光垫材料的层在不使用粘合剂的情况下连接在一起。

14. 发明申请

WO2004076127A1 METHOD OF MANUFACTURING A FIXED ABRASIVE MATERIAL 审中-公开
标题翻译：固定磨料的制造方法
公开(公告)号：WO2004076127A1
公开(公告)日：2004-09-10
申请号：PCT/US2004/004920
申请日：2004-02-19
申请人： DOW GLOBAL TECHNOLOGIES INC. , BALIJEPALLI, Sudhakar , ALDRICH, Dale, J. , GRIER, Laura, A.
IPC分类号： B24D3/32
CPC分类号： B24D18/00 , B24D3/32 , B24D13/147
摘要： Provided is a method for manufacturing a fixed abrasive material (19) suitable for use in CMP planarization pads from an aqueous polymer dispersion that also includes abrasive particles (30) that involves frothing the polymer dispersion, applying the froth to a substrate, mold or carrier and curing the froth to form a fixed abrasive material (19) having an open cell structure containing between about 5 and 85 wt% abrasive particles and a dry density of about 350kg/m 3 to 1200 kg/m 3 .
摘要翻译：本发明提供一种制造固化研磨材料（19）的方法，该固定研磨材料（19）适用于含水聚合物分散体的CMP平坦化垫中，所述水性聚合物分散体还包括包含起泡聚合物分散体的磨料颗粒（30），将泡沫施加到基材，模具或载体并固化泡沫以形成具有包含约5至85重量％的磨料颗粒和约350kg / m 3至1200kg / m 3的干密度的开孔结构的固定磨料（19）。

15. 发明申请

WO03082519B1 CONDITIONER AND CONDITIONING METHODS FOR SMOOTH PADS 审中-公开
标题翻译：光滑垫的调节和调节方法
公开(公告)号：WO03082519B1
公开(公告)日：2003-12-24
申请号：PCT/US0309329
申请日：2003-03-25
申请人： THOMAS WEST INC , WEST THOMAS E , WU GUANGWEI , DIETZ DONALD P
发明人： WEST THOMAS E , WU GUANGWEI , DIETZ DONALD P
IPC分类号： B24B53/007 , B24B53/017 , B24B53/12 , B24D3/32 , B24D13/14 , B24B1/00
CPC分类号： B24B53/017 , B24B53/12 , B24D3/32
摘要： Pad conditioners (15) and methods of conditioning pads for applications such as polishing substrates and chemical mechanical planarization of substrates are provided.
摘要翻译：提供了垫调节器（15）和调节垫的方法，用于诸如抛光基板和基板的化学机械平面化的应用。

16. 发明申请

WO2003099518A1 MICROPOROUS POLISHING PAD 审中-公开
标题翻译：微波抛光垫
公开(公告)号：WO2003099518A1
公开(公告)日：2003-12-04
申请号：PCT/IB2003/002123
申请日：2003-05-21
申请人： CABOT MICROELECTRONICS CORPORATION
发明人： PRASAD, Abaneshwar
IPC分类号： B24D3/32
CPC分类号： B24B37/24 , B24D3/32 , B29K2105/041
摘要： The invention provides polishing pads for chemical-mechanical polishing comprising a porous foam and a method for their production. In one embodiment, the porous foam has an average pore size of 50 μm or less, wherein 75% or more of the pores have a pore size within 20 μm or less of the average pore size. In another embodiment, porous foam has an average pore size of 20 μm or less. In yet another embodiment, the porous foam has a mufti-modal pore size distribution. The method of production comprises (a) combining a polymer resin with a supercritical gas to produce a single-phase solution and (b) forming a polishing pad from the single-phase solution, wherein the supercritical gas is generated by subjecting a gas to an elevated temperature and pressure.
摘要翻译：本发明提供了包括多孔泡沫的化学机械抛光用抛光垫及其制造方法。在一个实施方案中，多孔泡沫的平均孔径为50μm以下，其中75％以上的孔具有平均孔径在20μm以下的孔径。在另一个实施方式中，多孔泡沫的平均孔径为20μm以下。在另一个实施方案中，多孔泡沫具有多模式孔径分布。生产方法包括：（a）将聚合物树脂与超临界气体组合以产生单相溶液，和（b）从单相溶液形成抛光垫，其中超临界气体是通过使气体经由升高的温度和压力。

17. 发明申请

WO0228980A3 AGGLOMERATE ABRASIVE GRAIN AND A METHOD OF MAKING THE SAME 审中-公开
标题翻译：研磨磨粒及其制备方法
公开(公告)号：WO0228980A3
公开(公告)日：2003-07-24
申请号：PCT/US0142525
申请日：2001-10-05
申请人： 3M INNOVATIVE PROPERTIES CO
发明人： WOOD WILLIAM P , MCARDLE JAMES L
IPC分类号： B24D3/00 , B24D3/06 , B24D3/32 , B24D18/00 , C04B28/00 , C04B35/00 , C04B35/10 , C04B35/111 , C04B35/44 , C04B35/622 , C04B35/63 , C09K3/14 , B24D3/02 , B24D3/04 , B24D3/28 , B24D3/34 , B24D11/02
CPC分类号： C04B35/00 , B24D3/04 , B24D3/06 , B24D18/00 , C04B35/1115 , C04B35/44 , C04B35/622 , C04B35/62815 , C04B35/62886 , C04B35/6303 , C04B35/6316 , C04B2235/3206 , C04B2235/3218 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3272 , C04B2235/3275 , C04B2235/443 , C04B2235/5427 , C04B2235/5472 , C04B2235/6021 , C04B2235/77 , C09K3/1409 , C09K3/1427 , C09K3/1436 , Y10T428/2982 , Y10T428/2991 , Y10T428/2993 , Y10T428/2996 , Y10T428/2998
摘要： Agglomerate abrasive grain is disclosed. The agglomerate abrasive grain can be incorporated into abrasive products such as coated abrasives, bonded abrasives, non-woven abrasives, and abrasive brushes. A method of making agglomerate abrasive grain is also disclosed.
摘要翻译：公开了聚集磨料颗粒。附聚磨料颗粒可以结合到磨料产品中，例如涂覆磨料，粘结磨料，无纺布磨料和研磨刷。还公开了一种制造附聚磨料颗粒的方法。

18. 发明申请

WO2003038862A3 PADS FOR CMP AND POLISHING SUBSTRATES 审中-公开
公开(公告)号：WO2003038862A3
公开(公告)日：2003-05-08
申请号：PCT/US2002/034617
申请日：2002-10-29
申请人： THOMAS WEST, INC , WEST, Thomas
发明人： WEST, Thomas
IPC分类号： B24D3/32
摘要： Pads and methods of making the pads for applications such as polishing substrates and chemical mechanical planarization of substrates are provided. The pads are substantially porous and substantially hard for improved polishing and planarization properties. Pads according to some embodiments of the present invention have beneficial properties like those of standard technology porous pads and beneficial properties like those of standard technology hard pads.

19. 发明申请

WO03002299A2 MATERIAL FOR USE IN CARRIER AND POLISHING PADS 审中-公开
标题翻译：用于载体和抛光垫的材料
公开(公告)号：WO03002299A2
公开(公告)日：2003-01-09
申请号：PCT/US0220885
申请日：2002-07-01
申请人： APPLIED MATERIALS INC
发明人： TOLLES ROBERT D
IPC分类号： B24B37/24 , B24B37/26 , B24B37/32 , B24B53/007 , B24B53/017 , B24D3/32 , B24D3/34 , B24D9/08 , B24D13/14 , B24B
CPC分类号： B24B37/24 , B24B37/26 , B24B37/32 , B24B53/017 , B24D3/32 , B24D3/344 , B24D9/08
摘要： A material with a mesh of fibers and a binder material holding the fibers in the mesh can be used on a carrier head or a polishing pad. A polishing apparatus can include a pad cleaner with nozzles to direct jets of cleaning fluid onto the polishing pad and a brush to agitate a surface of the polishing pad.
摘要翻译：可以在载体头或抛光垫上使用具有纤维网和将纤维保持在网中的粘合剂材料的材料。抛光装置可以包括具有喷嘴以将清洁流体喷射到抛光垫上的喷嘴清洁器和刷子以搅动抛光垫的表面。

20. 发明申请

WO0228802A3 CERAMIC AGGREGATE PARTICLES 审中-公开
标题翻译：陶瓷聚合颗粒
公开(公告)号：WO0228802A3
公开(公告)日：2002-08-08
申请号：PCT/US0131397
申请日：2001-10-05
申请人： 3M INNOVATIVE PROPERTIES CO
发明人： MCARDLE JAMES L , CULLER SCOTT R , WOOD WILLIAM P
IPC分类号： B24D3/00 , B24D3/06 , B24D3/32 , B24D18/00 , C04B28/00 , C04B35/00 , C04B35/10 , C04B35/111 , C04B35/44 , C04B35/622 , C04B35/63 , C09K3/14 , B24D3/02 , B24D3/04 , B24D3/28 , B24D3/34 , B24D11/02
CPC分类号： C04B35/00 , B24D3/04 , B24D3/06 , B24D18/00 , C04B35/1115 , C04B35/44 , C04B35/622 , C04B35/62815 , C04B35/62886 , C04B35/6303 , C04B35/6316 , C04B2235/3206 , C04B2235/3218 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3272 , C04B2235/3275 , C04B2235/443 , C04B2235/5427 , C04B2235/5472 , C04B2235/6021 , C04B2235/77 , C09K3/1409 , C09K3/1427 , C09K3/1436 , Y10T428/2982 , Y10T428/2991 , Y10T428/2993 , Y10T428/2996 , Y10T428/2998
摘要： Ceramic aggregate particles comprising a plurality of solid particulates bonded together by ceramic binding material and methods of providing a plurality of such particles having substantially uniform cross-sectional shape are provided. The ceramic aggregate particles may incorporate a high percentage of solid particulates. The ceramic binding material may closely conform to the outermost surfaces of the solid particulates contained within the ceramic aggregate particle. When abrasive particulates are employed as the solid particulates, abrasive articles can be made which provide consistent high cut rates and consistent surface finish over relatively long periods of time.
摘要翻译：提供了包含通过陶瓷粘结材料粘合在一起的多个固体微粒的陶瓷骨料颗粒和提供多个具有基本均匀横截面形状的这种颗粒的方法。陶瓷骨料颗粒可以掺入高百分比的固体颗粒。陶瓷粘合材料可以紧密地与包含在陶瓷聚集体颗粒内的固体颗粒的最外表面相一致。当使用磨料颗粒作为固体颗粒时，可以制造磨料制品，其在相对长的时间段内提供一致的高切割速率和一致的表面光洁度。

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