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    • 12. 发明申请
    • TRENCH ISOLATION REGIONS IN IMAGE SENSORS
    • 图像传感器中的分离区域
    • WO2010068249A1
    • 2010-06-17
    • PCT/US2009/006375
    • 2009-12-03
    • EASTMAN KODAK COMPANYSTEVENS, Eric GordonDOAN, Hung Quoc
    • STEVENS, Eric GordonDOAN, Hung Quoc
    • H01L27/146
    • H01L27/14689H01L21/76224H01L27/1463
    • Trenches are formed in a substrate or layer and a solid source doped with one or more dopants is deposited over the image sensor such that the solid source fills the one or more trenches and is disposed on the surface of the substrate. The surface of the image sensor is then planarized so that the solid source remains only in the trenches. A thermal drive operation is performed to cause at least a portion of the one or more dopants in the solid source to diffuse into the portions of the substrate or layer that are immediately adjacent to and surround the sidewall and bottom surfaces of the trenches. The diffused dopant or dopants form passivation regions that passivate the interface between the substrate or layer and the sidewall and bottom surfaces of the trenches.
    • 沟槽形成在衬底或层中,并且掺杂有一种或多种掺杂剂的固体源沉积在图像传感器上,使得固体源填充一个或多个沟槽并且设置在衬底的表面上。 然后将图像传感器的表面平坦化,使得固体源仅保留在沟槽中。 执行热驱动操作以使固体源中的一种或多种掺杂剂的至少一部分扩散到紧邻和围绕沟槽的侧壁和底表面的衬底或层的部分。 扩散掺杂剂或掺杂剂形成钝化区域,其钝化衬底或层与沟槽的侧壁和底表面之间的界面。
    • 13. 发明申请
    • SHALLOW TRENCH ISOLATION REGIONS IN IMAGE SENSORS
    • 图像传感器中的浅层分离区域
    • WO2010068236A1
    • 2010-06-17
    • PCT/US2009/006103
    • 2009-11-13
    • EASTMAN KODAK COMPANYSTEVENS, Eric Gordon
    • STEVENS, Eric Gordon
    • H01L27/146
    • H01L27/1463H01L27/14689
    • An image sensor includes an imaging area that includes a plurality of pixels, with each pixel (500) including a photosensitive charge storage region (618) formed in a substrate. A passivation implantation region (616) contiguously surrounds the side wall and bottom surfaces of each trench in the one or more trench isolation regions. A portion of each passivation implantation region is laterally adjacent to a respective charge storage region and resides only in an isolation gap disposed between the respective charge storage region and a respective trench isolation region and does not substantially reside under the charge storage region. Each passivation implantation region is formed by implanting one or more dopants at a low energy into the side wall and bottom surfaces of each trench after annealing the image sensor and prior to filling the trenches with an insulating material.
    • 图像传感器包括包括多个像素的成像区域,每个像素(500)包括形成在基板中的光敏电荷存储区域(618)。 钝化注入区域(616)连续地围绕所述一个或多个沟槽隔离区域中的每个沟槽的侧壁和底表面。 每个钝化注入区域的一部分横向相邻于相应的电荷存储区域,并且仅驻留在设置在相应的电荷存储区域和相应沟槽隔离区域之间的隔离间隙中,并且基本上不位于电荷存储区域下方。 每个钝化注入区域通过在退火图像传感器之后和在用绝缘材料填充沟槽之前将低能量的一种或多种掺杂剂注入每个沟槽的侧壁和底表面中来形成。